[특허]Modular deposition system having batch processing and serial thin film deposition

[미국특허] Modular deposition system having batch processing and serial thin film deposition 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	C23C-014/56
출원번호	US-0692367 (1996-08-06)
발명자 / 주소	Washburn Hudson A. Hamilton Jarrett L.
출원인 / 주소	Akashic Memories Corporation
대리인 / 주소	Townsend Townsend & Crew LLP Mark D. Barrish, Esq.
인용정보	피인용 횟수 : 24 인용 특허 : 22

초록 ▼

A flexible, modular thin film deposition machine comprises a number of batch process stations which define a batch process path. At least one of the batch process stations is a thin film deposition station including a serial deposition chamber and an inter-chamber disk transfer mechanism. The disks move in batches along the process path, being individually processed only at the deposition station. Within the serial sputtering chambers of at least one deposition station there is at most partial environmental separation, whereas between different deposition stations the separation is complete. The resulting simplification of the transport mechanism provides for a high throughput rate while simultaneously minimizing contamination of individual thin film layers.

대표청구항 ▼

[ What is claimed is:] [1.] A method for depositing a plurality of thin film layers on each of a plurality of substrates, the method comprising:advancing the substrates in batches along a batch path defined by a plurality of successive batch chambers;maintaining a reduced pressure along the batch path, the batch chambers being sealed together;isolating each batch of the substrates within each of the successive batch chambers by selectively closing valves disposed therebetween;individually transferring substrates from the isolated batches of substrates within said plurality of successive batch chambers to a plurality of deposition chambers disposed off the batch path;maintaining an associated environment within each of the batch chambers adjacent the deposition chambers while advancing the batches of substrates and while individually transferring the substrates; anddepositing the layers on the individual substrates within the deposition chambers.

이 특허에 인용된 특허 (22) 인용/피인용 타임라인 분석

Beardow Terence (Endenfield GB2), Apparatus for sputter coating discs.
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Wirz Peter (Waldernbach DEX) Pfannekuche Heinz-Wilhelm (Hanau DEX) Bathon Thomas (Moembris DEX) Eckert Karl (Nidderau DEX), Apparatus for the production of coatings of uniform thickness profile on substrates, especially by cathode sputtering.
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Zejda Jaroslav (Rodenbach DEX), Cathode sputtering system with axial gas distribution.
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Boys Donald R. (Cupertino CA) Graves Walter E. (San Jose CA), Disk or wafer handling and coating system.
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Stevenson David E. (Northfield MN), Load-lock drum-type coating apparatus.
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Hutchinson Martin A. (Santa Clara CA), Magnetron sputter device using the same pole piece for coupling separate confining magnetic fields to separate targets s.
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Potter Robert I. (San Jose CA), Magnetron sputtering cathode with electrically variable source size and location for coating multiple substrates.
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Hata Tomonobu (Ishikawa JPX), Magnetron sputtering method and apparatus.
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Wolf Bernd (Hanau DEX) Wirz Peter (Waldernbach DEX), Magnetron type sputtering cathode.
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Habermann Wolfgang (Mainz DEX) Anderlohr Axel (Mannheim DEX) Steiner Wolfgang (Friedelsheim DEX), Metal/metal oxide electrode for determing chlorine.
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Chen Tu (Saratoga CA) Yamashita Tsutomu T. (San Jose CA), Method for manufacturing a magnetic disk having reduced bit shift, minimized noise, increased resolution and uniform mag.
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Hurwitt Steven D. (Park Ridge NJ) Aronson Arnold J. (Pomona NY) Van Nutt Charles (Monroe NY), Method of enhancing the performance of a magnetron sputtering target.
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Yamagata Noriaki (Shibukawa JPX) Yoshino Nobuyuki (Shibukawa JPX) Hirai Shuichi (Machida JPX), Method of producing recording media and its apparatus.
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Lauro Michael P. (Lincoln RI) Beaulieu Roland (Tiverton RI) Crissman Everett E. (Woonsocket RI) Loferski Joseph J. (Providence RI) Case Christopher (New Providence NJ), Modular sputtering apparatus.
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Lee Steven N. (Irvine CA), Side lifting tool wafer-boat assembly.
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Hughes John L. (Rodeo CA), Sputter coating source.
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Hedgcoth Virgle L. (1524 Hacienda Pl. Pomona CA 91768), Sputtered magnetic recording disk.
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Abe Katsuo (Yokosuka JPX) Kobayashi Shigeru (Kawasaki JPX) Kamei Tsuneaki (Kanagawa JPX) Tateishi Hideki (Yokohama JPX) Aiuchi Susumu (Yokohama JPX), Sputtering cathode structure for sputtering apparatuses, method of controlling magnetic flux generated by said sputterin.
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Hughes John L. (Rodeo CA) Lawson Eric C. (Sunnyvale CA), Substrate handling and processing system.
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Bourez Allen J. (San Jose CA) Lal Brij B. (San Jose CA) Russak Michael A. (Los Gatos CA), Target assembly having inner and outer targets.
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Kudo Hideo (9-30-2-201 Miwa ; Nagano-shi ; Nagano ; 380 JPX) Tani Shigeru (433-10 Kojima ; Nagano-shiu ; Nagano 381 JPX) Tamaki Yasushi (28-3 Kitajou ; Nagano-shi ; Nagano ; 381 JPX) Ishida Genichi (, Thin film forming method and system.
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Turner Frederick T. (Sunnyvale CA) Hutchinson Martin A. (Santa Clara CA) Shaw R. Howard (Palo Alto CA) Lamont ; Jr. Lawrence T. (Mountain View CA), Wafer coating system.
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이 특허를 인용한 특허 (24) 인용/피인용 타임라인 분석

Arne W. Ballantine ; Peter A. Emmi ; Walter J. Frey ; Michael J. Gambero ; Neena Garg ; Byeongju Park ; Donald L. Wilson, Apparatus and method for controlling wafer environment between thermal clean and thermal processing.
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Chin,Barry L.; Mak,Alfred W.; Lei,Lawrence Chung Lai; Xi,Ming; Chung,Hua; Lai,Ken Kaung; Byun,Jeong Soo, Atomic layer deposition apparatus.
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Sferlazzo, Piero, Continuous flow deposition system.
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Kempf, Stefan; Schramm, Holger, Continuous system.
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Derderian, Garo J.; Sandhu, Gurtej S., Deposition methods.
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Derderian,Garo J.; Sandhu,Gurtej S., Deposition methods.
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Sandhu,Gurtej S.; Derderian,Garo J.; Blalock,Guy T.; Gilton,Terry L., Deposition methods and apparatuses providing surface activation.
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Bourez, Allen, Dual position DC magnetron assembly.
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Bourez, Allen, Dual position DC magnetron assembly.
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Koguchi, Toshiaki; Watanabe, Kazuhito; Takahashi, Nobuyuki, Heating and cooling apparatus, and vacuum processing apparatus equipped with this apparatus.
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Koguchi,Toshiaki; Watanabe,Kazuhito; Takahashi,Nobuyuki, Heating and cooling apparatus, and vacuum processing apparatus equipped with this apparatus.
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Mercaldi,Garry A., Low selectivity deposition methods.
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Mercaldi,Garry A., Low selectivity deposition methods.
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Nguyen, Tue; Nguyen, Tai Dung; Bercaw, Craig Alan, Method and system for sequential processing in a two-compartment chamber.
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Kawahara, Jun; Haukka, Suvi; Niskanen, Antti; Tois, Eva; Matero, Raija; Suemori, Hidemi; Anttila, Jaako; Mori, Yukihiro, Methods for thin film deposition.
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Klein, Martin P.; Felsenthal, David; Sferlazzo, Piero, Substrate processing pallet and related substrate processing method and machine.
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Klein, Martin P.; Felsenthal, David; Sferlazzo, Piero, Substrate processing pallet and related substrate processing method and machine.
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Bluck, Terry; Hughes, John Les; Lawson, Eric C.; Tanaka, Tatsuru, Substrate processing system.
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Guo, George X.; Wang, Kai-an, Substrate processing system having improved substrate transport system.
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Gong, Yongping; Bunnak, Phuwanai; Loo, Kah Choong; Siangchaew, Krisda, Systems and methods for tuning seed layer hardness in components of magnetic recording systems.
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Poon, Chin Yim; Chiong, Yew Ming; Dorsey, Paul C.; Tanaka, Tatsuru, Systems and methods for uniformly implanting materials on substrates using directed magnetic fields.
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Qixu Chen ; Charles Leu ; Mark Anthony Shows ; Paul Stephen McLeod ; Rajiv Yadav Ranjan, Target shields for improved magnetic properties of a recording medium.
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Klein,Martin P.; Keigler,Arthur; Felsenthal,David, Ultra-thin wafer handling system.
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Doan,Trung Tri, Variable temperature deposition methods.
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IPC	Description
A	생활필수품
A62	인명구조; 소방(사다리 E06C)
A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

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[미국특허] Modular deposition system having batch processing and serial thin film deposition 원문보기