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[미국특허] Plasma enhancement apparatus and method for physical vapor deposition 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B05D-003/06
출원번호 US-0468781 (1995-06-06)
발명자 / 주소
  • Sathrum Paul E.
  • Coll Bernard F.
출원인 / 주소
  • Multi-Arc Inc.
대리인 / 주소
    Gifford, Krass,Groh, Sprinkle, Anderson & Citkowdki, P.C.
인용정보 피인용 횟수 : 70  인용 특허 : 101

초록

The present invention provides a plasma enhancement method and apparatus for electric arc vapor deposition. The plasma enhancement apparatus is positioned to act upon plasma generated from a plasma source before the plasma reaches a substrate to be coated by the plasma. The plasma enhancement appara

대표청구항

[ What is claimed is:] [1.] An article manufactured by an electric arc vapor deposition process, said article comprising:(a) a substrate having a surface; and(b) a layer of amorphous carbon arranged on said substrate surface, said amorphous carbon being applied to said substrate surface by electric

이 특허에 인용된 특허 (101) 인용/피인용 타임라인 분석

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  69. Brondum, Klaus; Welty, Richard P.; Richmond, Douglas S.; Jonte, Patrick B.; Thomas, Kurt, Valve component for faucet.
  70. Nomura,Shin; Miura,Takahiro; Kano,Makoto; Mabuchi,Yutaka; Hamada,Takahiro; Murakami,Miki, Valve train for internal combustion engine.

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