초록 ▼

A pattern formed on reticle is raster or step-and-repeat scanned with a charged particle beam and is illuminated in consecutive order, and a pattern image of a sub-field, which is illuminated, is to be formed on a certain position of a radiation sensitive substrate. On the radiation sensitive substr

A pattern formed on reticle is raster or step-and-repeat scanned with a charged particle beam and is illuminated in consecutive order, and a pattern image of a sub-field, which is illuminated, is to be formed on a certain position of a radiation sensitive substrate. On the radiation sensitive substrate whole pattern is projected through stitching the said pattern image. The pattern is to be divided into plural areas A and B which differ in pattern density one another, and the above-described scan boundary is made to coincide with the boundary of these plural areas.

대표청구항 ▼

[ What is claimed is:] [1.] A charged particle beam transfer method, comprising the steps of:(a) forming a pattern to be projected on a magnified reticle, the reticle is divided into plural stripes which have a longer side and a shorter side and where a reticle stage and a substrate stage are moving

[ What is claimed is:] [1.] A charged particle beam transfer method, comprising the steps of:(a) forming a pattern to be projected on a magnified reticle, the reticle is divided into plural stripes which have a longer side and a shorter side and where a reticle stage and a substrate stage are moving continuously along the longer side dimension during projection, each stripe is further divided into plural main fields of the charged particle beam optical system, and the longer side of the main field is the same as the shorter side of the stripe, each main field includes plural sub-fields,(b) scanning the pattern formed on the reticle in raster or step-and-repeat manner with the charged particle beam being to illuminate each sub-field one by one, wherein a pattern image of the illuminated sub-field is formed on a certain position of a radiation sensitive substrate,(c) thus projecting the whole pattern through stitching the pattern images of the sub-fields on the radiation sensitive substrate, rein the above-described pattern is divided into plural areas whose pattern density differs one another; and the boundary of those areas coincide with that of the above-described scanning or of the sub field.