초록 ▼

A fluid heater for a semiconductor device is provided to uniformly heat a gas, for thereby improving uniformity and speed of gas reaction and thus increasing the yield of semiconductor device fabrication. The fluid heater includes a main heater of a helical shape formed of a thermal conductor having

A fluid heater for a semiconductor device is provided to uniformly heat a gas, for thereby improving uniformity and speed of gas reaction and thus increasing the yield of semiconductor device fabrication. The fluid heater includes a main heater of a helical shape formed of a thermal conductor having various radii; a transparent tube, in which the main heater is located, having a plurality of holes at a lower portion thereof; an internal vessel disposed at an outer side of the transparent tube and having a plurality of holes at an upper portion thereof; an external vessel located at an outer side of the internal vessel; flanges placed on the external vessel, the internal vessel and the transparent tube and connecting a fluid inflow tube and the transparent tube and an external heater disposed at an outer wall of the external vessel. Here, the main heater is fabricated in a helical shape which has various radii, so that the fluid is evenly heated by a vortex generated by which the fluid passes through the main heater and also the fluid is heated by direct contact with the heater, thereby having an effect of increasing a temperature of the fluid up to a sufficiently high temperature, for example, a temperature above 600.degree. C.

대표청구항 ▼

[ What is claimed is:] [1.] A fluid heater for a semiconductor device, comprising:an external vessel (401), a bottom of which is connected with a discharge tube (406) of a fluid or a gas;a high temperature valve (441) provided in a predetermined portion of the discharge tube (401b);an internal vesse

[ What is claimed is:] [1.] A fluid heater for a semiconductor device, comprising:an external vessel (401), a bottom of which is connected with a discharge tube (406) of a fluid or a gas;a high temperature valve (441) provided in a predetermined portion of the discharge tube (401b);an internal vessel (405) disposed being distanced from an inner wall and the bottom of the external vessel (403) to have a space where the fluid flows in the external vessel (403), the internal vessel (405) having a plurality of internal vessel holes (405a) at an upper portion thereof;a transparent tube (409) disposed being distanced from an inner wall of the internal vessel (405) to have a space where the fluid flows in the internal vessel (405), the transparent tube (409) having a plurality of transparent tube holes (409a) at a lower portion thereof;a detachable flange (415), one side of which is in contact with the external vessel (403), the internal vessel (405) and the transparent tube (409);a fluid inflow tube (401a)connected with the other side of the flange (415);a main heater (411) provided in the transparent tube (409) and formed of a thermal conductor in a helical type the radius of which varies; andan external heater (413) disposed at an outer wall of the external vessel (403).