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Method and apparatus for controlling a workpiece in a vacuum chamber 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01J-037/00
출원번호 US-0272981 (1999-03-19)
발명자 / 주소
  • Smick Theodore H.
  • Ryding Geoffrey
  • Farley Marvin
출원인 / 주소
  • Applied Materials, Inc.
대리인 / 주소
    Tennant
인용정보 피인용 횟수 : 30  인용 특허 : 31

초록

An apparatus used to control a workpiece inside a vacuum chamber. The workpiece is supported on a workpiece holder in the vacuum chamber. The workpiece is isolated from the atmosphere outside of the vacuum chamber by differentially pumped vacuum seals and an integral air bearing support. The differe

대표청구항

[ What is claimed is:] [1.] Workpiece scanning apparatus for mechanically reciprocating a workpiece in a vacuum, comprising:a vacuum chamber having a chamber wall;a rotatable member mounted for rotation on the chamber wall about an axis;a rotary vacuum seal between the rotatable member and the chamb

이 특허에 인용된 특허 (31)

  1. Demaray R. Ernest (Oakland CA) Hoffman Vance E. (Los Altos CA) Helmer John C. (Menlo Park CA) Park Young H. (San Ramon CA) Cochran Ronald R. (Mountain View CA), Collimated deposition apparatus and method.
  2. Freytsis Avrum (Swampscott MA) Hertel Richard J. (Boxford MA) Mears Eric L. (Rockport MA), Disk scanning apparatus for batch ion implanters.
  3. Brune Robert A. (Austin TX) Smith Dorsey T. (Austin TX) Ray Andrew M. (Austin TX), End station for a parallel beam ion implanter.
  4. Enge Harald A. (Winchester MA), Focusing apparatus for uniform application of charged particle beam.
  5. Wells Gregory J. (Fairfield CA) Huston Charles K. (Fairfield CA), Frequency modulated selected ion species isolation in a quadrupole ion trap.
  6. Berrian Donald W. (Topsfield MA) Kaim Robert E. (Brookline MA) Vanderpot John W. (Rockport MA), Ion beam scanning method and apparatus.
  7. Nogami Mamoru (Kyoto JPX) Nagai Nobuo (Kyoto JPX), Ion implantation apparatus and method of controlling the same.
  8. Tamai Tadamoto (Tokyo JPX) Murakami Junichi (Ehime JPX), Ion implantation capable of uniformly injecting an ion beam into a substrate.
  9. Hirokawa Suguru (Saijyou JPX) Sinclair Frank (Quincy MA), Ion implantation device.
  10. Robinson William P. (Newberry Park CA) Seliger Robert L. (Agoura CA), Ion implantation system.
  11. Turner Norman L. (Gloucester MA), Ion implantation with variable implant angle.
  12. Kanai Norio (Chofu JPX), Ion implanter.
  13. Armstrong Allen E. (Lexington MA) Benveniste Victor M. (Magnolia MA) Ryding Geoffrey (Manchester MA), Ion implanter target chamber.
  14. Pollock John D. (Rowley MA), Linear gas bearing with integral vacuum seal for use in serial process ion implantation equipment.
  15. Lai Kwok F. (Palo Alto CA), Magnetron sputtering source for low pressure operation.
  16. Guernet Georges (Meylan FR) Lefeuvre Georges (Eybens FR), Method and a device for implantation of particles into a substrate.
  17. Smick Theodore H. ; Ryding Geoffrey ; Farley Marvin, Method and apparatus for controlling a workpiece in a vacuum chamber.
  18. Berrian Donald W. (Topsfield MA) Kaim Robert E. (Brookline MA) Vanderpot John W. (Rockport MA), Method and apparatus for high efficiency scanning in an ion implanter.
  19. King Monroe L. (Austin TX), Method for conducting heat to or from an article being treated under vacuum.
  20. Wada Yuichi (Kofu JPX) Katsuki Jiro (Kofu JPX) Kobayashi Hiroshi (Kofu JPX), Processing apparatus with collimator exchange device.
  21. Hablanian Marsbed (Wellesley MA) Ratnam Asoka (Rockville MD), Single potential ion source.
  22. Shibata, Atsushi; Koike, Takeshi, System for driving rotary member in vacuum.
  23. Robinson Frederick J. L. (Crawley GB2) Wauk ; II Michael T. (Haywards Heath GB2), Systems and methods for ion implantation of semiconductor wafers.
  24. Berkowitz Edward H. (Palo Alto CA), Temperature control of a workpiece under ion implantation.
  25. Day Derek J. (Los Gatos CA) Stahelin Rolf (Schlieren CHX) Provenzale Salvatore (Gebenstorf CHX) Riem Heinrich (Wettingen CHX) Fencl Willi (Kloten CHX), Three terminal ion chambers.
  26. Ryding Geoffrey (Manchester MA), Treating workpieces with beams.
  27. Ryding Geoffrey (Manchester MA), Vacuum chamber for treating workpieces with beams.
  28. Fox ; deceased Wayne L. (5640 Cold Water Dr. late of Castro Valley CA) Fox ; executrix by Rosemary M. (5640 Cold Water Dr. Castro Valley CA 94546), Vacuum-sealed gas-bearing assembly.
  29. Ryding Geoffrey (Manchester MA), Wafer loading apparatus for beam treatment.
  30. Hertel Richard J. (Bradford MA), Wafer orientation system.
  31. Hertel Richard J. (Bradford MA), Wafer transfer system.

이 특허를 인용한 특허 (30)

  1. Ferrara, Joseph, Adjustable implantation angle workpiece support structure for an ion beam implanter.
  2. Ferrara, Joseph, Adjustable implantation angle workpiece support structure for an ion beam implanter.
  3. Ferrara, Joseph; Mitchell, Robert John, Adjustable implantation angle workpiece support structure for an ion beam implanter.
  4. Mitchell, Robert J., Adjustable implantation angle workpiece support structure for an ion beam implanter utilizing a linear scan motor.
  5. Renau, Anthony; Olson, Joseph C., Bi mode ion implantation with non-parallel ion beams.
  6. Renau, Anthony; Olson, Joseph C., Bi mode ion implantation with non-parallel ion beams.
  7. Krayvitz (Krivts), Igor; Avneri, Israel; Uziel, Yoram; Schlimoff, Natan; Schwartz, Gilad; Madmon, Yochanan, Chamber elements and a method for placing a chamber at a load position.
  8. Berrian, Donald W.; Pollock, John D.; Vanderpot, John W., Hybrid scanning system and methods for ion implantation.
  9. Larsen, Grant Kenji; Purohit, Ashwin; Poitras, Robert A.; Evans, Morgan; Brennan, Damian, Ion beam incidence angle and beam divergence monitor.
  10. Wan, Zhimin; Pollock, John D.; Berrian, Don, Ion implanter and ion implant method thereof.
  11. Kim, Hag Dong, Ion implanter with function of compensating wafer cut angle and ion implantation method using the same.
  12. Tomita, Hiroyuki; Mera, Kazuo, Ion implanting apparatus and sample processing apparatus.
  13. Katsuhito Nishikawa ; Thomas F. Carlos, Linear robot.
  14. Devitt, Andrew J., Method and a device for depositing a film of material or otherwise processing or inspecting, a substrate as it passes through a vacuum environment guided by a plurality of opposing and balanced air bearing lands and sealed by differentially pumped groves and sealing lands in a non-contact manner.
  15. Olson, Joseph C.; Smatlak, Donna L.; Daniel, Paul, Method and apparatus for determining beam parallelism and direction.
  16. Devitt, Andrew J., Method and apparatus for in-line processing and immediately sequential or simultaneous processing of flat and flexible substrates through viscous shear in thin cross section gaps for the manufacture of micro-electronic circuits or displays.
  17. Oleg Siniaguine ; Alex Berger, Method of preventing motion of article in an article holder.
  18. Joseph C. Olson ; Anthony Renau, Methods and apparatus for adjusting beam parallelism in ion implanters.
  19. Olson,Joseph C.; Renau,Anthony, Methods and apparatus for adjusting beam parallelism in ion implanters.
  20. Katsuhito Nishikawa ; Thomas F. Carlos, Particulate free air bearing and seal.
  21. Nakamura, Tsuyoshi; Saji, Nobuhito, Positioning apparatus.
  22. Nakamura,Tsuyoshi; Saji,Nobuhito, Positioning apparatus.
  23. Olson,Joseph C.; Renau,Anthony, Technique for isocentric ion beam scanning.
  24. Reynolds, Gerald Alfred John; Halliday, Jonathan, Vacuum apparatus.
  25. Bruce, Robert William; Grossman, Theodore Robert; Evans, Sr., John Douglas; Pilsner, Brian Harvey, Vacuum coater device and mechanism for supporting and manipulating workpieces in same.
  26. Jang, Tae-Ho; Lee, Jong-Oh, Wafer holding apparatus for ion implanting system.
  27. Mori,Masahumi, Wafer scanning device.
  28. Ota,Kan; Asdigha,Mehran, Work piece transfer system for an ion beam implanter.
  29. Deak, IV,Mihaly, Workpiece support structure for an ion beam implanter featuring spherical sliding seal vacuum feedthrough.
  30. Buonodono, James P.; Esposito, Michael, Workpiece support structure with four degree of freedom air bearing for high vacuum systems.
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