초록 ▼

The present invention also provides a method for processing a substrate by heating the substrate to a temperature above ambient via UV radiation at a first power level and conditioning the substrate by exposing the substrate to a photochemically (UV) reactive chemical, or a reactive chemical that ca

The present invention also provides a method for processing a substrate by heating the substrate to a temperature above ambient via UV radiation at a first power level and conditioning the substrate by exposing the substrate to a photochemically (UV) reactive chemical, or a reactive chemical that can react with a compound on the surface of the substrate to form a photochemically reactive compound, in the presence of UV radiation at a second power level.

대표청구항 ▼

[ What is claimed is as follows:] [1.] An apparatus for performing UV heating and phototreating steps on a substrate having a front side and a back side comprising:a reaction chamber for receiving and holding the substrate, the reaction chamber comprising a front side and a back side;a UV radiation

[ What is claimed is as follows:] [1.] An apparatus for performing UV heating and phototreating steps on a substrate having a front side and a back side comprising:a reaction chamber for receiving and holding the substrate, the reaction chamber comprising a front side and a back side;a UV radiation source configured to direct radiation at the substrate, where said source delivers a total radiative power, integrated from 0.1 to 1.0 microns of wavelength, of at least 0.3 watts/cm.sup.2 to at least a portion of the substrate; anda control system for controlling the UV radiation source to provide UV output of at least two different time averaged energy levels, a heating level being effective to induce heating of the substrate and a photochemical level being effective to induce said phototreatment.