초록 ▼

The present invention relates to a method of forming a ceramic or ceramic-like coating on a substrate in the absence of oxygen. The method comprises coating the substrate with a solution comprising a solven and one or more preceramic materials selected from the group consisting of hydrogen silsesqui

The present invention relates to a method of forming a ceramic or ceramic-like coating on a substrate in the absence of oxygen. The method comprises coating the substrate with a solution comprising a solven and one or more preceramic materials selected from the group consisting of hydrogen silsesquioxane and hydrolyzed or partially hydrolyzed R.sub.x Si(OR).sub.4-x wherein R is independently selected from the group consisting of alkyl, aryl and unsaturated hydrocarbons and x is 0-2. The solvent is evaporated and a preceramic coating thereby deposited on the substrate. The preceramic coating is then ceramified by heating the coated substrate to a temperature of between about 500 up to about 1000.degree. C. under an inert gas atmosphere to thereby produce a ceramic or ceramic-like coating on the substrate. The process of the invention is useful for forming protective coatings on any substrate prone to oxidation at the temperature necessary for ceramification. The present invention also relates to the formation of additional ceramic coatings on the ceramic or ceramic-like coating formed above.

대표청구항 ▼

[ What is claimed is:] [1.] A coated electronic device formed by a method consisting essentially of:(A) coating the electronic device with a solution consisting essentially of a solvent and hydrogen silsesquioxane resin;(B) evaporating the solvent to deposit a preceramic coating on the electronic de

[ What is claimed is:] [1.] A coated electronic device formed by a method consisting essentially of:(A) coating the electronic device with a solution consisting essentially of a solvent and hydrogen silsesquioxane resin;(B) evaporating the solvent to deposit a preceramic coating on the electronic device;(C) heating the preceramic coating to a temperature of between about 500 up to about 800.degree. C. under an inert gas atmosphere; and(D) applying a passivating coating over the coating of step (C), the passivating coating applied by means of (i) coating the electronic device having the coating of step (C) with a second solution comprising a solvent and a preceramic polymer, (ii) evaporating said solvent to thereby deposit a preceramic coating; and (iii) heating the preceramic coating to a temperature between 200-900.degree. C. under an ammonia or inert gas atmosphere, whereby a dual layer coating is obtained on the electronic device.