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Device for transporting flat objects and process for transferring said objects between said device and a processing machine 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • F26B-003/00
출원번호 US-0155746 (1999-01-04)
우선권정보 FR0004173 (1996-04-03)
국제출원번호 PCT/FR97/00587 (1997-04-02)
§371/§102 date 19990104 (19990104)
국제공개번호 WO-9738439 (1997-10-16)
발명자 / 주소
  • Doche Claude,FRX
출원인 / 주소
  • Commissariat a l'Energie Atomique, FRX
대리인 / 주소
    Anderson, Kill & Olick P.C.
인용정보 피인용 횟수 : 26  인용 특허 : 25

초록

The present invention relates to a device and process for transporting flat objects confined in a specific atmosphere. The device comprises at least one assembly provided with several thin, flat cells (31) that open onto a lateral face (33) of said assembly with the cells arranged in parallel and li

대표청구항

[ What is claimed is:] [1.] A device for collectively transporting a plurality of flat objects individually confined in a given atmosphere having at least two modules each of flat form comprising a flat cell of small thickness opening onto a lateral face of said module, with each module being capabl

이 특허에 인용된 특허 (25)

  1. Visser Jan (Eindhoven NLX), Apparatus and method for treating flat substrate under reduced pressure in the manufacture of electronic devices.
  2. Alpenfels William F. (Del Mar CA) Engelhorn Sheldon (Encinitas CA) Manis David J. (Del Mar CA), Apparatus for drying electrophoresis gels.
  3. Bhmer Gudrun (Stuttgart DEX) Gentischer Josef (Remshalden DEX) Lehner Rolf (Esslingen DEX) Modjesch Dieter (Nufringen DEX) Schmutz Wolfgang (Zimmern DEX), Arrangement for storing, transporting and loading substrates.
  4. Kawano Hitoshi (Ise JPX) Okuno Atsushi (Ise JPX) Tsuda Masanori (Ise JPX) Hayashi Mitsuhiro (Ise JPX) Yamashita Teppei (Ise JPX) Murata Masanao (Ise JPX) Tanaka Tsuyoshi (Ise JPX) Morita Teruya (Ise , Article storage house in a clean room.
  5. Yamashita, Teppei; Murata, Masanao; Tanaka, Tsuyoshi; Morita, Teruya; Kawano, Hitoshi; Okuno, Atsushi; Tsuda, Masanori; Hayashi, Mitsuhiro, Closed container to be used in a clean room.
  6. Southworth Peter R. (Mission Viejo CA) Baxter Gregory R. (Orange CA), Conveyor system.
  7. Garric George (Perthes FRX) Lafond Andr (Nemours FRX), Dispatching apparatus with a gas supply distribution system for handling and storing pressurized sealable transportable.
  8. Yamashita Teppei (Ise JPX) Murata Masanao (Ise JPX) Tanaka Tsuyoshi (Ise JPX) Morita Teruya (Ise JPX) Kawano Hitoshi (Ise JPX) Hayashi Mitsuhiro (Ise JPX) Okuno Atsushi (Ise JPX) Nakamura Akio (Ise J, Electronic substrate processing system using portable closed containers and its equipments.
  9. Salzman Philip M. (San Jose CA), Enclosure for load lock interface.
  10. Salzman Philip M. (San Jose CA), Enclosure for load lock interface.
  11. Doche Claude (Claix FRX), Flat box for confining a flat article under a special atmosphere.
  12. Garric George (Perthes FRX) Lafond Andr (Nemours FRX), Fully automated and computerized conveyor based manufacturing line architectures adapted to pressurized sealable transpo.
  13. DeAngelis, Robert L.; Gallagher, Gary M., Gas purge system for isolation enclosure for contamination sensitive items.
  14. Briner Donald R. ; Laramore Christopher D., Isolation chamber transfer apparatus.
  15. Brooks Ray G. (Irving TX) Brooks Timothy W. (Irving TX) Corris C. James (Elkmont AL), Method and apparatus for maintaining clean articles.
  16. Bonora Anthony C. (Menlo Park CA) Guerre Gilles (Les Loges en Josas FRX) Parikh Mihir (San Jose CA) Rosenquist ; Jr. Frederick T. (Redwood City CA) Jain Sudhir (Milpitas CA), Method and apparatus for transferring articles between two controlled environments.
  17. Kannan Chak D. ; Weber Adam Jerome, Method for processing flat panel displays and large wafers.
  18. Garric George (Perthes FRX) Lafond Andr (Nemours FRX), Pressurized interface apparatus for transferring a semiconductor wafer between a pressurized sealable transportable cont.
  19. Garric George (Perthes FRX) Lafond Andr (Nemours FRX), Pressurized sealable transportable containers for storing a semiconductor wafer in a protective gaseous environment.
  20. Thompson Raymon F. (Lakeside MT) Berner Robert W. (Kalispell MT) Curtis Gary L. (Kila MT) Culliton Stephen P. (Kalispell MT) Wright Blaine G. (Whitefish MT), Semiconductor wafer processing system.
  21. McKenna Douglas B. (Wilmington DE), Semiconductor wafer transport container.
  22. Nakajima Toshihiro (Kyoto JPX) Chiba Takatoshi (Kyoto JPX) Nishii Kiyofumi (Kyoto JPX) Sato Toru (Kyoto JPX), Substrate heat treatment apparatus.
  23. Doche Claude (Claix FRX), System for the handling and confinement of flat objects in individual boxes.
  24. Doche Claude (Claix FRX), System for the storage and transportation of flat objects such as extra-flat boxes and its portable rack.
  25. Baseman Robert J. (Brewster NY) Brown Charles A. (Los Gatos CA) Eldridge Benjamin N. (Hopewell Junction NY) Rothman Laura B. (South Kent CT) Wendt Herman R. (San Jose CA) Yeh James T. (Katonah NY) Zi, Vapor drain system.

이 특허를 인용한 특허 (26)

  1. Claude Doche FR, Adapter device for carrier pods containing at least one flat object in an ultraclean atmosphere.
  2. Berger, Alexander J.; Kretz, Frank E., Alignment of semiconductor wafers and other articles.
  3. Berger, Alexander J.; Kretz, Frank E., Alignment of semiconductor wafers and other articles.
  4. Berger,Alexander J.; Kretz,Frank E., Alignment of semiconductor wafers and other articles.
  5. Kim, Bong-Ho, Apparatus for purge to prevent airborne molecular contaminant (AMC) and natural oxide.
  6. Berger, Alexander J.; Kretz, Frank E.; Casarotti, Sean A., Article holders and article positioning methods.
  7. Kretz, Frank E.; Berger, Alexander J.; Casarotti, Sean A., Article holders with sensors detecting a type of article held by the holder.
  8. Kretz,Frank E.; Berger,Alexander J.; Casarotti,Sean A., Article holders with sensors detecting a type of article held by the holder.
  9. Kretz, Frank E.; Berger, Alexander J.; Casarotti, Sean A., Articles holders with sensors detecting a type of article held by the holder.
  10. Babbs, Daniel; Fosnight, William, Carrier gas system and coupling substrate carrier to a loadport.
  11. Davidson,Ronald A., Closed cassette and method for heat treating glass sheets.
  12. Fukazawa,Hiroshi; Fukushima,Masazumi; Yamamoto,Makoto, Conveying system.
  13. Casarotti, Sean A.; Berger, Alexander J.; Kretz, Frank E., Detection and handling of semiconductor wafer and wafer-like objects.
  14. Casarotti, Sean A.; Berger, Alexander J.; Kretz, Frank E., Detection and handling of semiconductor wafers and wafer-like objects.
  15. Casarotti,Sean A.; Berger,Alexander J.; Kretz,Frank E., Detection and handling of semiconductor wafers and wafer-like objects.
  16. Casarotti,Sean A.; Berger,Alexander J.; Kretz,Frank E., Detection and handling of semiconductor wafers and wafers-like objects.
  17. Shah, Vinay; Elliott, Martin R.; Hudgens, Jeffrey C.; Englhardt, Eric Andrew, Methods and apparatus for identifying small lot size substrate carriers.
  18. Roland Bernard FR; Eric Chevalier FR, Mini-environment control system and method.
  19. Chiu,Ming Chien, Photomask positioning apparatus.
  20. Beckhart,Gordon Haggott; Conarro,Patrick Rooney; Farivar Sadri,Kamran Michael, Semiconductor cassette reducer.
  21. Babbs, Daniel; Fosnight, William; May, Robert C.; Weaver, William, Side opening unified pod.
  22. Babbs, Daniel; Fosnight, William; May, Robert C.; Weaver, William, Side opening unified pod.
  23. Persoon, Johannes Antonius Hendricus Wilhelmus Gerardus; Engelen, Andreas Theodorus; Lichtenegger, Siegfried; Van Dooren, Petrus Henricus Joannes, Slider bearing for use with an apparatus comprising a vacuum chamber.
  24. Gambe, Masahiko, Storage container.
  25. Sakiya, Fumio; Sakata, Katsunori, Storage container, shutter opening/closing unit of storage container, and wafer stocker using storage container and shutter opening/closing unit.
  26. Grant, Robert W.; Petrone, Benjamin J.; Mumbauer, Paul D., Systems and methods for achieving isothermal batch processing of substrates used for the production of micro-electro-mechanical-systems.
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