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Endpoint detection with light beams of different wavelengths 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B24B-007/22
  • B24B-049/12
출원번호 US-0300183 (1999-04-27)
발명자 / 주소
  • Swedek Boguslaw
  • Wiswesser Andreas Norbert,DEX
출원인 / 주소
  • Applied Materials, Inc.
대리인 / 주소
    Fish & Richardson
인용정보 피인용 횟수 : 142  인용 특허 : 16

초록 ▼

A chemical mechanical polishing apparatus includes two optical systems which are used serially to determine polishing endpoints. The first optical system includes a first light source to generate a first light beam which impinges on a surface of the substrate, and a first sensor to measure light ref

대표청구항 ▼

[ What is claimed is:] [22.] A method of chemical mechanical polishing, comprising:polishing a first portion of a layer of a substrate;while polishing the first portion, generating a first interference signal by directing a first light beam having a first effective wavelength and measuring light fro

이 특허에 인용된 특허 (16)

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