초록 ▼

A substrate heater having a chamber, a heating element located in the chamber, and an elevator having a substrate holder. The holder can hold a plurality of planar substrates in a general spaced stacked configuration. The holder can be moved to allow substrates to be inserted and removed from variou

A substrate heater having a chamber, a heating element located in the chamber, and an elevator having a substrate holder. The holder can hold a plurality of planar substrates in a general spaced stacked configuration. The holder can be moved to allow substrates to be inserted and removed from various locations on the holder. In one embodiment the substrates are located very close to each other to accelerate the rate of heat transfer to newly inserted substrates. In another embodiment, the holder has an individual horizontal heater on the elevator for each substrate.

대표청구항 ▼

[What is claimed is:] [1.]a chamber;a heater located in the chamber;an elevator located, at least partially, in the chamber, the elevator having a substrate holding stack and means for moving the substrate holding stack, the substrate holding stack being adapted to hold a plurality of substrates in

[What is claimed is:] [1.]a chamber;a heater located in the chamber;an elevator located, at least partially, in the chamber, the elevator having a substrate holding stack and means for moving the substrate holding stack, the substrate holding stack being adapted to hold a plurality of substrates in a spaced generally open stacked configuration with sides of the substrates directly opposite one another to directly transfer heat between adjacent substrates; andmeans for controlling movement of the elevator such that a newly inserted cold substrate is located at a predetermined location in the stack adjacent to at least one hot substrate already in the stack without moving the stack out of the chamber such that heat can be transferred to the newly inserted cold substrate from both the heater and adjacent substrates in the stack.