초록 ▼

An apparatus for preventing particulate matter and residue build-up within a vacuum exhaust line of a semiconductor processing device. The apparatus uses RF energy to form excite the constituents of particulate matter exhausted from a semiconductor processing chamber into a plasma state such that th

An apparatus for preventing particulate matter and residue build-up within a vacuum exhaust line of a semiconductor processing device. The apparatus uses RF energy to form excite the constituents of particulate matter exhausted from a semiconductor processing chamber into a plasma state such that the constituents react to form gaseous products that may be pumped through the vacuum line. The apparatus may include a collection chamber structured and arranged to collect particulate matter flowing through the apparatus and inhibiting egress of the particulate matter from the apparatus. The apparatus may further include an electrostatic collector to enhance particle collection in the collection chamber and to further inhibit egress of the particulate matter.

대표청구항 ▼

[What is claimed is:] [1.]a housing for forming a processing chamber, said housing having an exhaust port for exhausting gases from said processing chamber;a substrate support adapted to support a substrate within said processing chamber;a gas distribution system configured to introduce gases into s

[What is claimed is:] [1.]a housing for forming a processing chamber, said housing having an exhaust port for exhausting gases from said processing chamber;a substrate support adapted to support a substrate within said processing chamber;a gas distribution system configured to introduce gases into said processing chamber;a heater configured to heat said substrate;a vacuum system configured to control the pressure within said processing chamber;an exhaust line, coupled to said exhaust port and to said vacuum system, through which gases are exhausted from said processing chamber; anda particle collector, coupled to said exhaust line, for trapping and removing particulate matter present in gases exhausted from said processing chamber to prevent build-up of deposition material within said exhaust line, said particle collector comprising a vessel chamber defining a gas passageway having an inlet and an outlet and a collection area between the inlet and the outlet, the collection area being structured and arranged to collect particulate matter flowing through the gas passageway and to inhibit egress of the particulate matter from the particle collector; and a plasma formation system, operatively coupled to form a plasma within at least a portion of said gas passageway in order to remove particulate matter deposited or trapped within said gas passageway.