초록 ▼

A substrate is configured with first and second sets of electrodes, where the second set of electrodes is positioned asymmetrically between the first set of electrodes. When a RF voltage is applied to the electrodes sufficient to generate a discharge plasma (e.g., a one-atmosphere uniform glow disch

A substrate is configured with first and second sets of electrodes, where the second set of electrodes is positioned asymmetrically between the first set of electrodes. When a RF voltage is applied to the electrodes sufficient to generate a discharge plasma (e.g., a one-atmosphere uniform glow discharge plasma) in the gas adjacent to the substrate, the asymmetry in the electrode configuration results in force being applied to the active species in the plasma and in turn to the neutral background gas. Depending on the relative orientation of the electrodes to the gas, the present invention can be used to accelerate or decelerate the gas. The present invention has many potential applications, including increasing or decreasing aerodynamic drag or turbulence, and controlling the flow of active and/or neutral species for such uses as flow separation, altering heat flow, plasma cleaning, sterilization, deposition, etching, or alteration in wettability, printability, and/or adhesion.

대표청구항 ▼

[What is claimed is:] [1.](a) a substrate;(b) a first plurality of electrodes configured on the substrate;(c) a second plurality of electrodes configured on the substrate, wherein each electrode in the second plurality is positioned along a first direction between a pair of adjacent electrodes in th

[What is claimed is:] [1.](a) a substrate;(b) a first plurality of electrodes configured on the substrate;(c) a second plurality of electrodes configured on the substrate, wherein each electrode in the second plurality is positioned along a first direction between a pair of adjacent electrodes in the first plurality such that said each electrode is closer to one electrode of the pair of the adjacent electrodes than to another electroed of the pair of adjacent electrodes; and(d) a voltage generator configured to the first and second pluralities of electrodes and adapted to apply a voltage to the first and second pluralities of electrodes to generate a discharge plasma in the gas located on at least one side of the substrate adjacent to one of the pluralities of electrodes, wherein the relative positioning of the first and second pluralities of electrodes along the first direction results in a force being imparted onto the gas parallel to the first direction.