IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0302008
(1999-04-27)
|
발명자
/ 주소 |
|
대리인 / 주소 |
|
인용정보 |
피인용 횟수 :
3 인용 특허 :
3 |
초록
▼
A scrubber for removal of contaminants from gas by liquid contact. The scrubber has a gas and liquid tight containment walls, to contain a gas stream through the scrubber, and to allow recirculation of scrubbing liquid, without the need for external power. A plurality of preferably annular, downward
A scrubber for removal of contaminants from gas by liquid contact. The scrubber has a gas and liquid tight containment walls, to contain a gas stream through the scrubber, and to allow recirculation of scrubbing liquid, without the need for external power. A plurality of preferably annular, downwardly extending underflow weirs arc provided to define therebetween a series of gas compartments. Preferably annular, upwardly extending overflow baffles are provided between adjacent underflow weirs, and liquid compartments are defined between the inner surface of an outer wall and the first overflow baffle, and between successive overflow baffles, if present. A charge of scrubbing liquid is provided, and gas is directed into the scrubber through an inlet nozzle, under the first underflow weir, over the first overflow baffle, and thence under the next underflow weir. Preferably, a mass transfer packing is provided in a tower after the last underflow weir, and more preferably, a final liquid level is maintained to allow flooding of the lower reaches of the mass transfer packing while gas is passed therethrough with sufficient velocity to attain efficient mass transfer. Mesh pad mist eliminators can also be provided before the clean gas exits the scrubber vessel. Alternately, parallelepiped shaped gas tight scrubbing units can be provided, containing a plurality of underflow weirs each followed by overflow baffles, where the overflow baffles include, near the bottom, liquid return apertures. The charge liquid can be changed by draining the scrubbing vessel and providing fresh scrubbing liquid.
대표청구항
▼
[What is claimed is:] [17.](a) providing scrubber vessel, said scrubbed vessel comprising(1) a plurality of gas compartments, said gas compartments described by the sequence G.sub.1, G.sub.2 . . . G.sub.N, where N is a positive integer;(2) a plurality of liquid compartments X, said liquid compartmen
[What is claimed is:] [17.](a) providing scrubber vessel, said scrubbed vessel comprising(1) a plurality of gas compartments, said gas compartments described by the sequence G.sub.1, G.sub.2 . . . G.sub.N, where N is a positive integer;(2) a plurality of liquid compartments X, said liquid compartments described by the sequence W.sub.1, W.sub.2, . . . W.sub.x, where X is a positive integer;(3) wherein said liquid compartments are defined by a adjacent overflow baffles, in a sequence of overflow baffles, and wherein said gas compartments are defined by adjacent underflow weirs, in a sequence of underflow weirs, and wherein(A) said sequence of underflow weirs comprise a sequence of underflow weirs from a first underflow weir UW.sub.1, through an Nth underflow weir UW.sub.N, and corresponding to a number N of gas compartments, and(B) said sequence of overflow baffles comprise a sequence of overflow baffles from a first overflow baffle BO.sub.1 through to an Nth overflow baffle BO.sub.N, where N is a positive integer, each of said overflow baffles following, with respect to liquid flow, one of said underflow weirs in said sequence of underflow weirs UW.sub.1 to UW.sub.N ; and(4) a gas-tight and liquid tight casing, said casing having a tank bottom portion, and further comprising(A) a contaminated a gas inlet before said first underflow weir UW.sub.1, and(B) a clean gas outlet after said last underflow weir UW.sub.N ;(C) and wherein each of said overflow baffles extends upwardly from said tank bottom portion, to a point above said lower end portion of an adjacent, gas flow upstream, underflow weir, to an upper end portion, and wherein each of said overflow baffles further comprises, at or near the bottom thereof, one or more liquid passageways, said passageways sized to allow flow of said scrubbing liquid therethrough(b) charging said scrubber vessel with an initial charge of scrubbing liquid;(c) directing a gas stream to be scrubbed through said gas inlet, to pressurize said first gas compartment G.sub.1, and then allowing a portion of gas to escape past said first underflow weir UW.sub.1 and into said second gas compartment G.sub.2 of said plurality of gas compartments, and thence sequentially through each of said gas compartments to the last of said gas compartments G.sub.N by alternately traveling under the then next underflow weir UW and over the then next overflow baffles OB;(d) directing said gas stream outward through said clean gas outlet.
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