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[미국특허] Method and apparatus for producing a uniform density plasma above a substrate 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-014/34
출원번호 US-0856335 (1997-05-14)
발명자 / 주소
  • Tanaka Yoichiro
  • Hong Liubo
  • Wada Yuichi,JPX
출원인 / 주소
  • Applied Materials, Inc.
대리인 / 주소
    Konrad, Raynes & Victor, LLP
인용정보 피인용 횟수 : 16  인용 특허 : 72

초록 ▼

An apparatus and method for processing a substrate in the presence of a plasma, the apparatus including: a chamber enclosing a region maintained at a low pressure; a substrate support disposed in the region and having a substantially horizontal substrate support surface for supporting a substrate; a

대표청구항 ▼

[What is claimed is:] [1.]a chamber defining a chamber axis;a source of deposition material;a substrate support disposed in said chamber and having a substrate support surface adapted to support a substrate that has an exposed surface, said substrate support surface being axially displaced from said

이 특허에 인용된 특허 (72) 인용/피인용 타임라인 분석

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  65. Collins Kenneth S. (San Jose CA) Roderick Craig A. (San Jose CA) Trow John R. (Santa Clara CA) Yang Chan-Lon (Los Gatos CA) Wong Jerry Y. (Fremont CA) Marks Jeffrey (San Jose CA) Keswick Peter R. (Ne, Silicon scavenger in an inductively coupled RF plasma reactor.
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  72. Matsuoka Morito (Katsuta JPX) Ono Ken\ichi (Mito JPX), Thin film forming apparatus and ion source utilizing plasma sputtering.
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  2. Nulman, Jaim; Edelstein, Sergio; Subramani, Mani; Xu, Zheng; Grunes, Howard E.; Tepman, Avi; Forster, John C.; Gopalraja, Praburam, Coils for generating a plasma and for sputtering.
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  3. Brcka, Jozef, Etch system with integrated inductive coupling.
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  4. Gopalraja, Praburam; Xu, Zheng; Rosenstein, Michael; Forster, John C., Feedthrough overlap coil.
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  6. Klein, Michael Sigmund; Witherell, Charles Eichhorn, Implantable biodegradable wound closure device.
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  8. Mehrdad M. Moslehi ; Ajit P. Paranjpe, Inductively-coupled-plasma ionized physical-vapor deposition apparatus, method and system.
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  10. Bhatnagar, Ashish; Murugesh, Laxman; Gopalakrishnan, Padma, Localized surface annealing of components for substrate processing chambers.
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