초록 ▼

This invention provides a cerium oxide abrasive with which the surfaces of substrates such as SiO.sub.2 insulating films can be polished at a high rate without causing scratches. The abrasive of the present invention comprises a slurry comprising cerium oxide particles whose primary particles have a

This invention provides a cerium oxide abrasive with which the surfaces of substrates such as SiO.sub.2 insulating films can be polished at a high rate without causing scratches. The abrasive of the present invention comprises a slurry comprising cerium oxide particles whose primary particles have a diameter of from 10 nm to 600 nm and a median diameter of from 30 nm to 250 nm and slurry particles have a median diameter of from 150 nm to 600 nm and a maximum diameter of 3,000 nm or smaller, the cerium oxide particles being dispersed in a medium.

대표청구항 ▼

[ What is claimed is:] [1.]1. A cerium oxide abrasive comprising a slurry containing cerium oxide particles comprising plural primary particles wherein:said primary particles consist essentially of cerium oxide;said primary particles have a median diameter of from 30 nm to 250 nm;said cerium oxide p

[ What is claimed is:] [1.]1. A cerium oxide abrasive comprising a slurry containing cerium oxide particles comprising plural primary particles wherein:said primary particles consist essentially of cerium oxide;said primary particles have a median diameter of from 30 nm to 250 nm;said cerium oxide particles have a median diameter of from 150 nm to 600 nm; andsaid cerium oxide particles are obtained by pulverizing cerium oxide obtained by firing cerium carbonate,wherein said primary particles have a structural parameter Y, representing an isotropic microstrain in analysis by the powder X-ray Rietvelt method (RIETAN-94), of from 0.01 to 0.70.