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Multi-stage process for the separation/recovery of gases 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B01D-053/22
  • B01D-053/047
출원번호 US-0168899 (1998-10-09)
우선권정보 EP0110012 (1998-06-02)
발명자 / 주소
  • Behling Rolf-Dieter,DEX
  • Peinemann Klaus-Viktor,DEX
  • Ohlrogge Klaus,DEX
  • Wind Jan,DEX
  • da Silva Lidia Barreto,BRX
출원인 / 주소
  • GKSS Forschungszentrum Geesthacht GmbH, DEX
대리인 / 주소
    Sughrue, Mion, Zinn, Macpeak & Seas, PLLC
인용정보 피인용 횟수 : 24  인용 특허 : 20

초록

A process for separating and/or recovering gases from gas and/or gas vapor mixtures includes a membrane separating device to which a gas and/or gas vapor mixture is supplied, the latter being separated in the membrane separating device into a permeate, which is enriched with gas, and a retentate, wh

대표청구항

[ We claim:] [1.]1. A process for the separation and/or recovery of gases from gas and/or gas vapour mixtures by means of a membrane separating device to which the gas and/or gas vapour mixture is supplied, characterised by a multi-stage, simultaneous separation of such gas and/or gas vapour mixture

이 특허에 인용된 특허 (20)

  1. Prasad Ravi, Advanced membrane system for separating gaseous mixtures.
  2. Doshi Kishore J. (Mahopac NY), Enhanced gas separation process.
  3. Doshi Kishore J. (Mahopac NY), Enhanced hydrogen recovery from low purity gas streams.
  4. Xu Jianguo (Fogelsville PA), High pressure feed membrane separation process.
  5. Prasad Ravi (East Amherst NY), High purity membrane nitrogen.
  6. Rao Madhukar B. (Allentown PA) Sircar Shivaji (Wescosville PA) Abrardo Joseph M. (Schnecksville PA) Baade William F. (Breinigsville PA), Hydrocarbon fractionation by adsorbent membranes.
  7. Rao Madhukar B. (Allentown PA) Sircar Shivaji (Wescosville PA) Abrardo Joseph M. (Schnecksville PA) Baade William F. (Breinigsville PA), Hydrogen recovery by adsorbent membranes.
  8. Prasad Ravi (East Amherst NY) Notaro Frank (Amherst NY), Membrane air drying and separation operations.
  9. Baker Richard W. (Palo Alto CA) Wijmans Johannes G. (Menlo Park CA), Membrane fractionation process.
  10. Prasad Ravi (East Amherst NY), Membrane nitrogen with temperature tracking.
  11. Behling Dieter (Hamburg DEX) Hattenbach Karl (Geesthacht DEX) Ohlrogge Klaus (Geesthacht DEX) Peinemann Klaus-Victor (Reinbek DEX) Wind Jan (Barsbttel DEX), Method of removing organic compounds from air/permanent gas mixtures.
  12. Callahan Richard A. (Burlington VT), Multiple stage semi-permeable membrane process and apparatus for gas separation.
  13. Thompson David R. (Grand Island NY), Multistage membrane control system and process.
  14. Friesen Dwayne T. (Bend OR) Newbold David D. (Bend OR) McCray Scott B. (Bend OR) Ray Roderick J. (Bend OR), Organic and inorganic vapor permeation by countercurrent condensable sweep.
  15. Callahan Richard A. (Waitsfield VT), Process and apparatus for producing liquid carbon dioxide.
  16. Fuentes Franois (Paris FRX) Dolle Pierre-Olivier (Levallois-Perret FRX) Willemot Antoine (Sceaux FRX) Barry Lionel (Versailles FRX) Fillet Frederic (Issy les Moulineaux FRX) Gelot Jean-Louis (Elancou, Process and apparatus for separation of a gaseous mixture by successive membranes of different selectivities.
  17. Choe Jung S. (Allentown PA) Auvil Steven R. (Macungie PA) Agrawal Rakesh (Allentown PA), Process for separating components of a gas stream.
  18. Graham Tommy E. (Raleigh NC) MacLean Donald L. (Raleigh NC), Processes.
  19. McNeill John M. (14021 Marquesas Way Marina Del Rey CA 90292), Production of membrane-derived nitrogen from combustion gases.
  20. Prasad Ravi (East Amherst NY) Cook Pauline J. (Kenmore NY), Start-up and shut down processes for membrane systems and membrane systems useful for the same.

이 특허를 인용한 특허 (24)

  1. Thomas,Eugene R.; Northrop,P. Scott; Hu,Hua, Acid gas disposal method.
  2. Tandon, Kunj; Rapol, Umakant; Barik, Ullash Kumar; Vetrivel, Rajappan, Composite membrane for separation of carbon dioxide.
  3. Smith, Robert Fred; Ball, IV, Will Dexter, Condensation collection system.
  4. Bowser, John, Cyclic membrane separation process.
  5. Nemser, Stuart M., Cyclic membrane separation process.
  6. Ohuchi, Tai; Okabe, Takashi; Asano, Tsuyoshi, Exhaust gas treatment system.
  7. Thomas, Eugene R.; Deckman, Harry W.; Victory, Donald J.; Chance, Ronald R.; Oelfke, Russell H., High-pressure separation of a multi-component gas.
  8. Shah, Minish M.; Schwartz, Joseph M.; Koita, Khushnuma; Dray, Michael J., Integrated process and apparatus for recovery of helium rich streams.
  9. Wascheck,Kenneth J.; Anderson,Charles L., Methane recovery process.
  10. Charles M. Mohr ; Gregory L. Mines ; K. Kit Bloomfield, Method and apparatus for removing non-condensible gas from a working fluid in a binary power system.
  11. Karode, Sandeep K.; Ding, Yong, Method and system for purification of natural gas using membranes.
  12. Naohiko Yamashita JP, Mixed gas concentration regulating method and concentration regulating apparatus.
  13. Strahan,Ronald L., Mobile gas separator system and method for treating dirty gas at the well site of a stimulated gas well.
  14. Strahan, Ronald L., Mobile gas separator system and method for treating dirty gas at the well site of a stimulated well.
  15. Baker, Richard W.; Lokhandwala, Kaaeid A.; Wijmans, Johannes G.; Da Costa, Andre R., Nitrogen removal from natural gas using two types of membranes.
  16. Brazier, Arnaud, Production method using permeation of at least two gaseous fluxes from a gaseous mixture, and a production installation for implementing this method.
  17. Shimamune, Yosuke; Katakami, Akira; Hatada, Akiyoshi; Shima, Masashi; Tamura, Naoyoshi, Semiconductor device and fabrication method thereof.
  18. Shimamune, Yosuke; Katakami, Akira; Hatada, Akiyoshi; Shima, Masashi; Tamura, Naoyoshi, Semiconductor device and fabrication method thereof.
  19. Shimamune, Yosuke; Katakami, Akira; Hatada, Akiyoshi; Shima, Masashi; Tamura, Naoyoshi, Semiconductor device and fabrication method thereof.
  20. Shimamune, Yosuke; Katakami, Akira; Hatada, Akiyoshi; Shima, Masashi; Tamura, Naoyoshi, Semiconductor device and fabrication method thereof.
  21. Shimamune, Yosuke; Katakami, Akira; Hatada, Akiyoshi; Shima, Masashi; Tamura, Naoyoshi, Semiconductor device and fabrication method thereof.
  22. Shimamune, Yosuke; Katakami, Akira; Hatada, Akiyoshi; Shima, Masashi; Tamura, Naoyoshi, Semiconductor device and fabrication method thereof.
  23. Shimamune, Yosuke; Katakami, Akira; Hatada, Akiyoshi; Shima, Masashi; Tamura, Naoyoshi, Semiconductor device and fabrication method thereof.
  24. Shimamune, Yosuke; Katakami, Akira; Hatada, Akiyoshi; Shima, Masashi; Tamura, Naoyoshi, Semiconductor device and fabrication method thereof.
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