$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Vaporizing reactant liquids for chemical vapor deposition film processing 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-016/00
출원번호 US-0574999 (1995-12-19)
발명자 / 주소
  • Sivaramakrishnan Visweswaren
  • White John M.
출원인 / 주소
  • Applied Materials, Inc.
대리인 / 주소
    Dergosits & Noah LLP
인용정보 피인용 횟수 : 35  인용 특허 : 9

초록

The disclosure relates to a vaporizer valve which accepts a carrier gas and a pressurized liquid and forms a mixture of the carrier gas and vaporized liquid. An internal cavity receives the carrier gas through a carrier aperture and the liquid through a liquid aperture, and the mixed gas and vapor a

대표청구항

[ What is claimed is:] [1.]1. A vaporizer for vaporizing a liquid and mixing the vaporized liquid with a carrier gas, the vaporizer comprising:a valve body having a first aperture and a third aperture formed therein, the valve body having a valve seat with a second aperture formed therein;a gas inle

이 특허에 인용된 특허 (9)

  1. Jolly Stuart Talbot (Yardley PA), Accurate control during vapor phase epitaxy.
  2. Foster Robert (San Francisco CA) Wang David N. (Cupertino CA) Somekh Sasson (Redwood City CA) Maydan Dan (Los Altos Hills CA), Apparatus and method for magnetron-enhanced plasma-assisted chemical vapor deposition.
  3. Conger Darrell R. (Portland OR) Posa John G. (Lake Oswego OR) Wickenden Dennis K. (Lake Oswego OR), Apparatus for depositing material on a substrate.
  4. Shibuya Munehiro (Katano) Kitagawa Masatoshi (Hirakata) Kamada Takeshi (Ikeda) Hirao Takashi (Moriguchi) Nishizato Hiroshi (Narita JPX), Apparatus for producing a thin film of tantalum oxide.
  5. Rosler Richard S. (Saratoga CA) East Robert W. (San Jose CA), Chemical vapor deposition reactor and process.
  6. Martin John G. (San Jose CA) Benzing Walter C. (Saratoga CA) Graham Robert (Saratoga CA), Induction heated reactor system for chemical vapor deposition.
  7. Kirlin Peter S. (Brookfield) Binder Robin L. (Bethlehem) Gardiner Robin A. (Bethel CT), Method for delivering an involatile reagent in vapor form to a CVD reactor.
  8. Moriyama, Masashi; Yamahira, Yutaka; Matsuyama, Yuji, Processing liquid supply unit.
  9. Wang David N. (Cupertino) White John M. (Hayward) Law Kam S. (Union City) Leung Cissy (Union City) Umotoy Salvador P. (Pittsburg) Collins Kenneth S. (San Jose) Adamik John A. (San Ramon) Perlov Ilya , Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planar.

이 특허를 인용한 특허 (35)

  1. Choi, Kenric T.; Narwankar, Pravin K.; Kher, Shreyas S.; Nguyen, Son T.; Deaton, Paul; Ngo, Khai; Chhabra, Paul; Ouye, Alan H.; Wu, Dien-Yeh (Daniel), Ampoule for liquid draw and vapor draw with a continuous level sensor.
  2. Chen, Ling; Ku, Vincent W.; Chung, Hua; Marcadal, Christophe; Ganguli, Seshadri; Lin, Jenny; Wu, Dien Yeh; Ouye, Alan; Chang, Mei, Apparatus and method for generating a chemical precursor.
  3. Chen, Ling; Ku, Vincent W.; Chung, Hua; Marcadal, Christophe; Ganguli, Seshadri; Lin, Jenny; Wu, Dien Yeh; Ouye, Alan; Chang, Mei, Chemical precursor ampoule for vapor deposition processes.
  4. Cuvalci, Olkan; Wu, Dien-Yeh; Yuan, Xiaoxiong, Chemical precursor ampoule for vapor deposition processes.
  5. Marsh, Eugene P.; Atwell, David R., Chemical vaporizer for material deposition systems and associated methods.
  6. Marsh, Eugene P.; Atwell, David R., Chemical vaporizer for material deposition systems and associated methods.
  7. Liu, Benjamin Y. H.; Dinh, Thuc M.; Ma, Yamin, Fine droplet atomizer for liquid precursor vaporization.
  8. Chen, Ling; Ku, Vincent; Wu, Dien-Yeh; Chung, Hua; Ouye, Alan; Nakashima, Norman; Chang, Mei, Gas delivery apparatus for atomic layer deposition.
  9. Larson,Dean J.; Kadkhodayan,Babak; Wu,Di; Takeshita,Kenji; Yen,Bi Ming; Su,Xingcai; Denty, Jr.,William M.; Loewenhardt,Peter, Gas distribution system with tuning gas.
  10. Otsuki, Hayashi; Miura, Yutaka, Gas processing apparatus, gas processing method and integrated valve unit for gas processing apparatus.
  11. Murata, Akira, Gas treatment apparatus, gas treatment method, and storage medium.
  12. Ngo, Khai; Nguyen, Son; Ulloa, Ernesto, In-situ monitor of injection valve.
  13. Xia,Li Qun; Xu,Huiwen; Witty,Derek R.; M'Saad,Hichem, In-situ oxide capping after CVD low k deposition.
  14. Kouketsu, Masayuki; Itafuji, Hiroshi, Liquid control apparatus.
  15. Kouketsu, Masayuki; Itafuji, Hiroshi; Okada, Masayo, Liquid control device and mesh-like body assembly applied thereto.
  16. Miyamoto,Hideaki; Nishida,Wataru; Shimizu,Tetsuo, Liquid material evaporation apparatus for semiconductor manufacturing.
  17. Miyamoto, Hideaki; Nishikawa, Ichiro, Liquid material vaporization apparatus.
  18. Nishizato, Hiroshi; Miyamoto, Hideaki, Method and an apparatus for mixing and gasifying a reactant gas-liquid mixture.
  19. Ganguli, Seshadri; Chen, Ling; Ku, Vincent W., Method and apparatus for providing precursor gas to a processing chamber.
  20. Ganguli,Seshadri; Chen,Ling; Ku,Vincent W., Method and apparatus for providing precursor gas to a processing chamber.
  21. Chen,Ling; Ku,Vincent W.; Chung,Hua; Marcadal,Christophe; Ganguli,Seshadri; Lin,Jenny; Wu,Dien Yeh; Ouye,Alan; Chang,Mei, Method and apparatus of generating PDMAT precursor.
  22. Liu, Benjamin Y. H., Method for liquid precursor atomization.
  23. Ganguli, Seshadri; Chen, Ling; Ku, Vincent W., Method for providing gas to a processing chamber.
  24. Annapragada, Rao V.; Turmel, Odette; Takeshita, Kenji; Zheng, Lily; Choi, Thomas S.; Pirkle, David R., Method for providing uniform removal of organic material.
  25. Park, Sohyun; Zhu, Wen H.; Huang, Tzu-Fang; Xia, Li-Qun; M'Saad, Hichem, Oxide-like seasoning for dielectric low k films.
  26. Park,Sohyun; Zhu,Wen H.; Huang,Tzu Fang; Xia,Li Qun; M'Saad,Hichem, Oxide-like seasoning for dielectric low k films.
  27. Kojima,Yasuhiko; Mori,Hiroyuki; Ono,Hirofumi, Semiconductor manufacturing system having a vaporizer which efficiently vaporizes a liquid material.
  28. Lakshmanan,Annamalai; Raj,Daemian; Schmitt,Francimar; Kim,Bok Hoen; Balasubramanian,Ganesh, Situ oxide cap layer development.
  29. Larson, Dean J.; Kadkhodayan, Babak; Wu, Di; Takeshita, Kenji; Yen, Bi-Ming; Su, Xingcai; Denty, Jr., William M.; Loewenhardt, Peter, Uniform etch system.
  30. Larson,Dean J.; Kadkhodayan,Babak; Wu,Di; Takeshita,Kenji; Yen,Bi Ming; Su,Xingcai; Denty, Jr.,William M.; Loewenhardt,Peter, Uniform etch system.
  31. Kojima, Yasuhiko; Hoshino, Tomohisa, Vaporizer and processor.
  32. Toda, Masayuki; Kusuhara, Masaki; Umeda, Masaru; Fukagawa, Mitsuru, Vaporizer and various devices using the same and an associated vaporizing method.
  33. Sivaramakrishnan, Visweswaren; White, John M., Vaporizing reactant liquids for chemical vapor deposition film processing.
  34. Sivaramakrishnan,Visweswaren; White,John M., Vaporizing reactant liquids for chemical vapor deposition film processing.
  35. Sivaramakrishnan,Visweswaren; White,John; Ishikawa,Koichi; Miyamoto,Hideaki; Kawano,Takeshi, Vaporizing reactant liquids for chemical vapor deposition film processing.
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로