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Inflatable compliant bladder assembly 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C25D-017/00
출원번호 US-0201796 (1998-11-30)
발명자 / 주소
  • Lakshmikanthan Jayant
  • Stevens Joe
출원인 / 주소
  • Applied Materials, Inc.
대리인 / 주소
    Thomason, Moser and Patterson LLP
인용정보 피인용 횟수 : 159  인용 특허 : 42

초록

The present invention provides a bladder assembly 130 for use in an electroplating cell 100. The bladder assembly 130 comprises a mounting plate 132, a bladder 136, and an annular manifold 146. One or more inlets 142 are formed in the mounting plate 146 and are coupled to a fluid source 138. The man

대표청구항

[ What is claimed is:] [1.]1. An inflatable bladder assembly for loading a substrate in an electroplating cell, the inflatable bladder assembly comprising:a) a substrate mounting plate comprising one or more fluid inlets;b) an inflatable bladder secured to the substrate mounting plate and in communi

이 특허에 인용된 특허 (42)

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  128. Hoinkis, Mark; Miyazoe, Hiroyuki; Joseph, Eric, Selective sputtering for pattern transfer.
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  143. Park, Seung; Wang, Anchuan, Silicon etch process with tunable selectivity to SiO2 and other materials.
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  146. Huang, Jiayin; Chen, Zhijun; Wang, Anchuan; Ingle, Nitin, Silicon pretreatment for nitride removal.
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  148. Chen, Zhijun; Zhang, Jingchun; Wang, Anchuan; Ingle, Nitin K., Silicon-carbon-nitride selective etch.
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  150. Kim, Hun Sang; Choi, Jinhan; Koseki, Shinichi, Simplified litho-etch-litho-etch process.
  151. Luere, Olivier; Kang, Sean S.; Nemani, Srinivas D., Spacer formation.
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  154. Wang, Xikun; Xu, Lin; Wang, Anchuan; Ingle, Nitin K., Titanium oxide etch.
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  156. Wang, Xikun; Liu, Jie; Wang, Anchuan; Ingle, Nitin K., Tungsten separation.
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  158. Wang, Xikun; Wang, Anchuan; Ingle, Nitin K., V trench dry etch.
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