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[미국특허] Microwave enhanced CVD system under magnetic field 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-016/00
  • C03C-015/00
출원번호 US-0814993 (1997-03-14)
우선권정보 JP0228083 (1985-10-14)
발명자 / 주소
  • Yamazaki Shunpei,JPX
출원인 / 주소
  • Semiconductor Energy Laboratory Co., Ltd., JPX
대리인 / 주소
    Nixon Peabody LLPCostellia
인용정보 피인용 횟수 : 15  인용 특허 : 111

초록 ▼

An improved chemical vapor deposition or etching is shown in which cyclotron resonance and photo or plasma CVD cooperate to deposit a layer with high performance at a high deposition speed. The high deposition speed is attributed to the cyclotron resonance while the high performance is attributed to

대표청구항 ▼

[ What is claimed is:] [1.]1. A plasma processing apparatus comprising:a resonance chamber;a gas introducing means for introducing a process gas into the resonance chamber;a means for emitting a microwave into the resonance chamber;a means for inducing a magnetic field in the resonance chamber to fo

이 특허에 인용된 특허 (111) 인용/피인용 타임라인 분석

  1. Yamauchi Yutaka (Nara JPX), Amorphous film solar cell.
    상세보기
  2. Yasui Masaru (Yokohama JPX) Kato Kazuhisa (Atusgi JPX), Amorphous silicon photoreceptor with nitrogen and boron.
    상세보기
  3. Tsuge, Kazunori; Tawada, Yoshihisa; Hamakawa, Yoshihiro, Amorphous silicon semiconductor and process for same.
    상세보기
  4. Shufflebotham Paul K. (Fremont CA) Hartsough Larry D. (Berkeley CA) Denison Dean R. (San Jose CA), Apparatus and method for magnetron in-situ cleaning of plasma reaction chamber.
    상세보기
  5. Foster Robert (San Francisco CA) Wang David N. (Cupertino CA) Somekh Sasson (Redwood City CA) Maydan Dan (Los Altos Hills CA), Apparatus and method for magnetron-enhanced plasma-assisted chemical vapor deposition.
    상세보기
  6. Jackson Scott C. (Wilmington DE) Rocheleau Richard E. (Wilmington DE), Apparatus and method for photochemical vapor deposition.
    상세보기
  7. Cann Gordon L. (Laguna Beach CA) Shepard ; Jr. Cecil B. (Laguna Beach CA) McKevitt Frank X. (Anaheim Hills CA), Apparatus and method for plasma deposition.
    상세보기
  8. Yamazaki Shunpei (Tokyo JPX) Tashiro Mamoru (Tokyo JPX) Miyazaki Minoru (Tokyo JPX), Apparatus for chemical vapor deposition and method of film deposition using such deposition.
    상세보기
  9. Hirooka Masaaki (Toride JPX) Ishihara Shunichi (Ebina JPX) Hanna Junichi (Yokohama JPX) Shimizu Isamu (Yokohama JPX), Apparatus for continuously preparing a light receiving element for use in photoelectromotive force member or image-readi.
    상세보기
  10. Shioya Yoshimi (Yokohama JPX) Maeda Mamoru (Tama JPX) Ohyama Yasushi (Kodaira JPX) Takagi Mikio (Kawasaki JPX), Apparatus for plasma chemical vapor deposition.
    상세보기
  11. Gallego JosM. (Ormskirk GB2), Apparatus for the deposition of multi-layer coatings.
    상세보기
  12. Fournier Eugene (Garden City MI) Doehler Joachim (Union Lake MI), Apparatus for the manufacture of photovoltaic devices.
    상세보기
  13. Niwa Kazuo (Yokohama JPX), Apparatus for the treatment of semiconductors.
    상세보기
  14. Nakayama Satoshi (Isehara JPX) Takeuchi Hideaki (Isehara JPX) Murota Junichi (Isehara JPX) Hurukado Tatuhiko (Hachioji JPX) Takeda Shigeru (Hamura JPX) Suzuki Masuo (Fussa JPX) Kurokawa Harushige (Hi, Chemical vapor deposition apparatus.
    상세보기
  15. Brien Guy (Farnham CAX) Cloutier Richard (Granby CAX) Darwall Edward C. D. (Waterloo CAX) Szolgyemy Laszlo (Bromont CAX), Chemical vapor deposition apparatus with manifold enveloped by cooling means.
    상세보기
  16. Mahawili, Imad, Cooled optical window for semiconductor wafer heating.
    상세보기
  17. Gorinas Guy (Annecy FR), Device for the rapid depositing of oxides in thin layers which adhere well to plastic supports.
    상세보기
  18. Suzuki Keizo (Kokubunji JPX) Okudaira Sadayuki (Kokubunji JPX) Nishimatsu Shigeru (Kokubunji JPX) Kanomata Ichiro (Fuchu JPX), Dry etching apparatus.
    상세보기
  19. Okano Haruo (Den-enchofu-honmachi JPX) Horiike Yasuhiro (Tokyo JPX) Sekine Makoto (Yokohama JPX), Dry etching apparatus and method using reactive gases.
    상세보기
  20. Provence John D. (Mesquite TX) Brown Frederick W. (Colleyville TX) Jones John I. (Plano TX), Dual detector system for determining endpoint of plasma etch process.
    상세보기
  21. Hotomi Hideo (Suita JPX), Electrochromic device.
    상세보기
  22. Collins George J. (Ft. Collins CO) Thompson Lance R. (Ft. Collins CO) Rocca Jorge J. (Ft. Collins CO) Boyer Paul K. (Ft. Collins CO), Electron beam induced chemical vapor deposition.
    상세보기
  23. Ishihara Shunichi (Ebina JPX) Saito Keishi (Nabari JPX) Oda Shunri (Tokyo JPX) Shimizu Isamu (Yokohama JPX), Electrophotographic photosensitive member, process and apparatus for the preparation thereof.
    상세보기
  24. Walton Frank J. (Sunnyvale CA), Gas feed for reactive ion etch system.
    상세보기
  25. Saulgeot Claude (Veyrier du Lac FRX), Hard vacuum pump.
    상세보기
  26. Ramaprasad K. R. (Princeton NJ), Hetero-augmentation of semiconductor materials.
    상세보기
  27. Benzing David W. (San Jose CA) Benzing Jeffrey C. (San Jose CA) Boren Arthur D. (San Jose CA) Tang Ching C. (San Francisco CA), In-situ CVD chamber cleaner.
    상세보기
  28. Tam Simon W. (San Francisco CA) Reade Ronald P. (Palo Alto CA) Wong Jerry Y. K. (Union City CA) Wang David N. (Cupertino CA), In-situ photoresist capping process for plasma etching.
    상세보기
  29. Gee James M. (Albuquerque NM) Hargis ; Jr. Philip J. (Albuquerque NM), Laser/plasma chemical processing of substrates.
    상세보기
  30. Gupta Arunava (Madison NJ) West Gary A. (Dover NJ) Beeson Karl W. (Princeton NJ), Light induced chemical vapor deposition of conductive titanium silicide films.
    상세보기
  31. Ehrlich Daniel J. (Lexington MA) Deutsch Thomas F. (Cambridge MA) Osgood Richard M. (Chappaqua NY), Maskless growth of patterned films.
    상세보기
  32. Bersin Richard L. (Orange CT), Method and apparatus for dry processing of substrates.
    상세보기
  33. Yamazaki Shunpei (Tokyo JPX), Method and apparatus for forming non-single-crystal layer.
    상세보기
  34. Izu Masatsugu (Birmingham MI) Ovshinsky Herbert C. (Oak Park MI), Method for continuously producing tandem amorphous photovoltaic cells.
    상세보기
  35. Brodsky Marc H. (Mt. Kisco NY) Scott Bruce A. (Pleasantville NY), Method for depositing silicon films and related materials by a glow discharge in a disiland or higher order silane gas.
    상세보기
  36. Walker Starnes E. (Bartlesville OK), Method for deposition of silicon.
    상세보기
  37. Osada Yoshiyuki (Yokosuka JPX) Tsuda Hisanori (Atsugi JPX) Sano Masafumi (Kawasaki JPX) Omata Satoshi (Tokyo JPX) Takasu Katsuji (Asaka JPX) Hirai Yutaka (Tokyo JPX), Method for forming deposited film.
    상세보기
  38. Ishihara Shunichi (Ebina JPX) Hirooka Masaaki (Nabari JPX) Ohno Shigeru (Yokohama JPX), Method for forming deposition film using Si compound and active species from carbon and halogen compound.
    상세보기
  39. Suzuki Keizo (Hachioji JPX) Hiraiwa Atsushi (Kodaira JPX) Takahashi Shigeru (Hachioji JPX) Nishimatsu Shigeru (Kokubunji JPX) Ninomiya Ken (Tokyo JPX) Okudaira Sadayuki (Ome JPX), Method for growing silicon-including film by employing plasma deposition.
    상세보기
  40. Nath, Prem; Hoffman, Kevin R.; Laarman, Timothy D., Method for introducing sweep gases into a glow discharge deposition apparatus.
    상세보기
  41. Ovshinsky Stanford R. (Bloomfield Hills MI) Izu Masatsugu (Birmingham MI), Method for optimizing photoresponsive amorphous alloys and devices.
    상세보기
  42. Ishihara Shinichiro (Takatsuki JPX) Kitagawa Masatoshi (Hirakata JPX) Hirao Takashi (Moriguchi JPX), Method for producing an amorphous silicon semiconductor device using a multichamber PECVD apparatus.
    상세보기
  43. Ogumi Zempachi (89-3 ; Matsunoki-cho Shimogamo ; Sakyo-ku ; Kyoto-shi ; Kyoto 606 JPX) Takehara Zenichiro (10-14 ; Nishishimbayashi-cho 6-chome Oe ; Nishikyo-ku ; Kyoto-shi ; Kyoto 610-11 JPX), Method for production of films.
    상세보기
  44. Fujiyama Yasutomo (Kawasaki JPX) Kamiya Osamu (Machida JPX), Method of cleaning apparatus for forming deposited film.
    상세보기
  45. Ueno Tsuyoshi (Fujisawa JPX) Suzuki Katsumi (Tokyo JPX) Hirose Masataka (Hiroshima JPX), Method of forming amorphous silicon film.
    상세보기
  46. Umemura Shizuo (Ibaraki JPX), Method of forming ultrafine patterns.
    상세보기
  47. Yamazaki Shunpei (21-21 Kitakarasuyama 7-chome Setagaya-ku ; Tokyo JPX), Method of making non-crystalline semiconductor layer.
    상세보기
  48. Yamazaki Shunpei (21-21 Kitakarasuyama 7-chome Setagaya-ku ; Tokyo JPX), Method of making non-crystalline semiconductor layer.
    상세보기
  49. Kyel Birol (Hopewell NJ), Methods and apparatus for generating plasmas.
    상세보기
  50. Yamazaki Shunpei (Tokyo JPX), Microwave enhanced CVD system under magnetic field.
    상세보기
  51. Fukuda Takuya (Hitachi JPX) Sato Junji (Hitachi JPX) Kanai Fumiyuki (Hoya JPX) Tsuchiya Atsushi (Hitachi JPX), Microwave plasma processing apparatus.
    상세보기
  52. Sakudo, Noriyuki; Abe, Katsunobu; Tokiguchi, Katsumi; Koike, Hidemi; Okada, Osami, Microwave plasma source having improved switching operation from plasma ignition phase to normal ion extraction phase.
    상세보기
  53. Hatzakis Michael (Chappaqua NY) Paraszczak Juri R. (Pleasantville NY) Robinson Bennett (New York NY), Mixed excitation plasma etching system.
    상세보기
  54. Maydan Dan (Los Altos Hills CA) Somekh Sasson (Redwood City CA) Wang David N. (Cupertino CA) Cheng David (San Jose CA) Toshima Masato (San Jose CA) Harari Isaac (Mountain View CA) Hoppe Peter D. (Sun, Multi-chamber integrated process system.
    상세보기
  55. Cannella Vincent D. (Detroit MI) Izu Masatsugu (Birmingham MI) Hudgens Stephen J. (Southfield MI), Multiple chamber deposition and isolation system and method.
    상세보기
  56. Yamazaki Shunpei (21-21 Kitakarasuyama 7-chome Setagaya-ku ; Tokyo JPX), Non-single-crystalline semiconductor layer on a substrate and method of making same.
    상세보기
  57. Tashiro Mamoru (Tokyo JPX) Urata Kazuo (Tokyo JPX) Yamazaki Shunpei (Tokyo JPX), Photo CVD apparatus, with deposition prevention in light source chamber.
    상세보기
  58. Blum, Samuel E.; Brown, Karen H.; Srinivasan, Rangaswamy, Photo deposition of metals with far UV radiation.
    상세보기
  59. Allred David D. (Troy MI) Walter Lee (Bloomfield Hills MI) Reyes Jaime M. (Birmingham MI) Ovshinsky Stanford R. (Bloomfield Hills MI), Photo-assisted CVD.
    상세보기
  60. Sugioka Shinji (Kawasaki JPX), Photochemical vapor deposition apparatus.
    상세보기
  61. Cuomo Jerome J. (Lincolndale NY) Guarnieri Charles R. (Somers NY), Photoelectric enhanced plasma glow discharge system and method including radiation means.
    상세보기
  62. McKenna Charles M. (Fishkill NY) Willcox H. Keith (Poughkeepsie NY), Photon enhanced reactive ion etching.
    상세보기
  63. Purdes Andrew J. (Garland TX) Smith Gregory C. (Garland TX), Planarized dielectric deposited using plasma enhanced chemical vapor deposition.
    상세보기
  64. Miyake Kiyoshi (Tsukui JPX) Kimura Shinichiro (Hachioji JPX) Warabisako Terunori (Nishitama JPX), Plasma anodization system.
    상세보기
  65. Matsuo Seitaro (Hachioji JPX) Yoshihara Hideo (Sekimachi JPX) Yamazaki Shinichi (Chofu JPX), Plasma deposition apparatus.
    상세보기
  66. Engle ; Jr. George M. (San Jose CA), Plasma enhanced chemical vapor processing of semiconductive wafers.
    상세보기
  67. Shuskus Alexander J. (West Hartford CT) Cowher Melvyn E. (East Brookfield MA), Plasma enhanced deposition of semiconductors.
    상세보기
  68. Gallagher James P. (Newburgh NY) Schmidt ; Jr. Howard W. (Walden NY), Plasma etch cleaning in low pressure chemical vapor deposition systems.
    상세보기
  69. Yerkes John W. (Granada Hills CA) Avery James E. (Burbank CA), Plasma etching process for the manufacture of solar cells.
    상세보기
  70. Saito Katsuaki (Hitachi JPX) Fukuda Takuya (Hitachi JPX) Ohue Michio (Hitachi JPX) Sonobe Tadasi (Iwaki JPX), Plasma processing apparatus and the method of the same.
    상세보기
  71. Sato Yasue (Kawasaki JPX), Plasma processing apparatus for etching, ashing and film-formation.
    상세보기
  72. Yamazaki Shunpei (Atsugi JPX) Tsuchiya Mitsunori (Atsugi JPX) Kawano Atsushi (Atsugi JPX) Imatou Shinji (Atsugi JPX) Nakashita Kazuhisa (Atsugi JPX) Hamatani Toshiji (Atsugi JPX) Inushima Takashi (At, Plasma processing method and apparatus.
    상세보기
  73. Nakanishi Koichiro (Amagasaki JPX) Ootera Hiroki (Amagasaki JPX) Hanazaki Minoru (Amagasaki JPX) Minami Toshihiko (Amagasaki JPX), Plasma processor.
    상세보기
  74. Tsuchimoto ; Takashi, Plasma processor.
    상세보기
  75. Abe Haruhiko (Itami JPX) Harada Hiroshi (Itami JPX) Denda Masahiko (Itami JPX) Nagasawa Koichi (Itami JPX) Kono Yoshio (Itami JPX), Plasma treating apparatus.
    상세보기
  76. Ishihara Shin-ichiro (Takatsuki JPX), Plasma treating apparatus for gas temperature measuring method.
    상세보기
  77. Kieser Jrg (Albstadt DEX) Sellschopp Michael (Hammersbach DEX) Geisler Michael (Wchtersbach DEX), Plasma treatment apparatus.
    상세보기
  78. Kimura Shin-Ichiro (Hachioji JPX) Murakami Eiichi (Kokubunji JPX) Warabisako Terunori (Tokyo JPX) Miyake Kiyoshi (Kanagawa JPX) Sunami Hideo (Tokyo JPX), Plasma treatment system.
    상세보기
  79. Yamazaki Shunpei (Tokyo JPX) Hayashi Shigenori (Atsugi JPX), Plasma-assisted CVD of carbonaceous films by using a bias voltage.
    상세보기
  80. Seelbach Christian A. (Scottsdale AZ) Ingle William M. (Phoenix AZ) Goetz Carl A. (Scottsdale AZ), Process and apparatus for the low pressure chemical vapor deposition of thin films.
    상세보기
  81. Brors Daniel L. (Los Altos Hills CA), Process for depositing a low resistivity tungsten silicon composite film on a substrate.
    상세보기
  82. Fraas Lewis M. (Malibu CA) Zanio Kenneth R. (Agoura CA) Knechtli Ronald C. (Woodland Hills CA), Process for fabricating heterojunction structures utilizing a double chamber vacuum deposition system.
    상세보기
  83. Ishihara Shunichi (Ebina JPX) Ohno Shigeru (Yokohama JPX) Kanai Masahiro (Tokyo JPX) Oda Shunri (Tokyo JPX) Shimizu Isamu (Yokohama JPX), Process for forming deposited film.
    상세보기
  84. Ishihara Shunichi (Ebina JPX) Ohno Shigeru (Yokohama JPX) Kanai Masahiro (Tokyo JPX) Oda Shunri (Tokyo JPX) Shimizu Isamu (Yokohama JPX), Process for forming deposited film.
    상세보기
  85. Hogan Richard H. (Austin TX) Dahm Jonathan C. (Austin TX), Process for improving nitride deposition on a semiconductor wafer by purging deposition tube with oxygen.
    상세보기
  86. Okudaira Sadayuki (Kokubunji JPX) Suzuki Keizo (Kokubunji JPX) Nishimatsu Shigeru (Kokubunji JPX) Kanomata Ichiro (Kokubunji JPX), Process for plasma etching.
    상세보기
  87. Takasaki Kanetake (Tokyo JPX) Takagi Mikio (Kawasaki JPX) Koyama Kenji (Yokosuka JPX), Process of producing a semiconductor device.
    상세보기
  88. Chiba Yuji (Atsugi JPX) Ando Kenji (Kawasaki JPX) Masaki Tatsuo (late of Yokohama JPX by Yoshiko Masaki ; legal successor) Sugata Masao (Yokohama JPX) Osabe Kuniji (Tama JPX) Kamiya Osamu (Machida JP, Reaction apparatus which introduces one reacting substance within a convergent-divergent nozzle.
    상세보기
  89. Cheung David (Foster City CA) Keswick Peter (Newark CA) Wong Jerry (Fremont CA), Reactor chamber self-cleaning process.
    상세보기
  90. Law Kam S. (Union City CA) Leung Cissy (Fremont CA) Tang Ching C. (San Francisco CA) Collins Kenneth S. (San Jose CA) Chang Mei (Cupertino CA) Wong Jerry Y. K. (Union City CA) Wang David Nin-Kou (Cup, Reactor chamber self-cleaning process.
    상세보기
  91. Asmussen Jes (Okemos MI) Hopwood Jeffrey A. (Haslett MI), Resonant radio frequency wave coupler apparatus using higher modes.
    상세보기
  92. Giuliani John F. (Kensington MD) Auerbach Abe (Albany NY), Selective photoinduced condensation technique for producing semiconducting compounds.
    상세보기
  93. Matsuo Seitaro (Hachioji JPX) Muramoto Susumu (Hachioji JPX) Ehara Kohei (Kodaira JPX) Itsumi Manabu (Hoya JPX), Semiconductor device and manufacturing process thereof.
    상세보기
  94. Carlson David E. (Yardley PA), Semiconductor device having a body of amorphous silicon and method of making the same.
    상세보기
  95. Yamazaki Shunpei (Tokyo JPX), Semiconductor device manufacturing method.
    상세보기
  96. Oda Masao (Amagasaki JPX) Kobayashi Toshiyuki (Amagasaki JPX) Kinoshita Yoshimi (Amagasaki JPX), Semiconductor producing apparatus.
    상세보기
  97. Ishida Tomoaki (Itami JPX) Fujiwara Nobuo (Itami JPX) Nishioka Kyusaku (Itami JPX) Akazawa Moriaki (Itami JPX) Shibano Teruo (Itami JPX) Kawai Kenji (Itami JPX), Semiconductor wafer treating device utilizing ECR plasma.
    상세보기
  98. Fujiwara Nobuo (Itami JPX) Kawai Kenji (Itami JPX) Akazawa Moriaki (Itami JPX) Shibano Teruo (Itami JPX) Ishida Tomoaki (Itami JPX) Nishioka Kyusaku (Itami JPX), Semiconductor wafer treating device utilizing a plasma.
    상세보기
  99. Tanaka Takashi (Yamagata JPX) Abe Shigeru (Yamagata JPX), Silicon carbide process tube for semiconductor wafers.
    상세보기
  100. Chen Lee (Poughkeepsie NY) Hendricks Charles J. (Wappingers Falls NY) Mathad Gangadhara S. (Poughkeepsie NY) Poloncic Stanley J. (Wappingers Falls NY), Single wafer plasma etch reactor.
    상세보기
  101. Takahashi Nobuyuki (Fuchu JPX) Kitahara Hiroaki (Fuchu JPX), Substrate processing apparatus.
    상세보기
  102. Ninomiya Ken (Nakano JPX) Suzuki Keizo (Hachioji JPX) Nishimatsu Shigeru (Kokubunji JPX), Surface treatment apparatus.
    상세보기
  103. Ogami Nobutoshi (Shiga JPX) Kitagawa Masaru (Shiga JPX), Surface treatment apparatus.
    상세보기
  104. Wang David N. (Cupertino) White John M. (Hayward) Law Kam S. (Union City) Leung Cissy (Union City) Umotoy Salvador P. (Pittsburg) Collins Kenneth S. (San Jose) Adamik John A. (San Ramon) Perlov Ilya , Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planar.
    상세보기
  105. Moslehi Mehrdad M. (Palo Alto CA) Saraswat Krishna C. (Santa Clara County CA), Thermal/microwave remote plasma multiprocessing reactor and method of use.
    상세보기
  106. Kubacki Ronald M. (10296 Alpine ; #C Cupertino CA 95014), Thin film deposition apparatus using an RF glow discharge.
    상세보기
  107. Gutermann Alfons (Freigericht DEX) Herzog Heinz (Karlstein DEX) Mohn Heinrich (Gelnhausen DEX) Schlke Karl A. (Neuberg DEX), Transparent fused silica bell for purposes relating to semiconductor technology.
    상세보기
  108. Giorgi ; Tiziano A. ; DELLA Porta ; Paolo, Vacuum pumping system and method of use.
    상세보기
  109. Nishida Keijiro (Nimomiya JPX) Kakei Mitsuo (Tokyo JPX) Kamiya Osamu (Yokohama JPX) Sekimura Nobuyuki (Yokohama JPX), Vapor deposition apparatus.
    상세보기
  110. Takagi, Mikio; Takasaki, Kanetake; Koyama, Kenji, Vapor phase growth method.
    상세보기
  111. Inoue Yosuke (Ibaraki JPX) Suzuki Takaya (Katsuta JPX) Okamura Masahiro (Tokyo JPX) Akiyama Noboru (Hitachi JPX) Fujita Masato (Yamanashi JPX) Tochikubo Hiroo (Tokyo JPX) Iida Shinya (Tama JPX), Vapor phase growth on semiconductor wafers.
    상세보기

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  2. Kapoor, Bikram; Karim, M. Ziaul; Wang, Anchuan, Hydrogen assisted HDP-CVD deposition process for aggressive gap-fill technology.
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  3. Tan, Zhengquan; Li, Dongqing; Zygmunt, Walter; Ishikawa, Tetsuya, Hydrogen assisted undoped silicon oxide deposition process for HDP-CVD.
    상세보기
  4. Karim,M. Ziaul; Li,DongQing; Byun,Jeong Soo; Pham,Thanh N., In-situ-etch-assisted HDP deposition.
    상세보기
  5. Karim,M. Ziaul; Li,DongQing; Byun,Jeong Soo; Pham,Thanh N., In-situ-etch-assisted HDP deposition using SiF.
    상세보기
  6. Karim, M. Ziaul; Li, DongQing; Byun, Jeong Soo; Pham, Thanh N., In-situ-etch-assisted HDP deposition using SiF4 and hydrogen.
    상세보기
  7. Hong, Sukwon; Tran, Toan; Mallick, Abhijit; Liang, Jingmei; Ingle, Nitin K., Low shrinkage dielectric films.
    상세보기
  8. Mungekar, Hemant P.; Wu, Jing; Lee, Young S.; Wang, Anchuan, Low wet etch rate silicon nitride film.
    상세보기
  9. Lin, Hui-Chu, Method for forming silicon oxide layer.
    상세보기
  10. Hogan, Timothy J.; Taylor, Timothy A., Method for improving ash rate uniformity in photoresist ashing process equipment.
    상세보기
  11. Karim, M. Ziaul; Moghadam, Farhad K.; Salimian, Siamak, Methods and systems for high-aspect-ratio gapfill using atomic-oxygen generation.
    상세보기
  12. Mungekar,Hemant P.; Lee,Young S; Vellaikal,Manoj; Greig,Karen; Kapoor,Bikram, Oxygen plasma treatment for enhanced HDP-CVD gapfill.
    상세보기
  13. Ishikawa, Hiraku, Plasma processing method and semiconductor device.
    상세보기
  14. Nemani,Srinivas D.; Lee,Young S., Silicon oxide gapfill deposition using liquid precursors.
    상세보기
  15. Rasheed,Muhammad M.; Kim,Steven H, Use of enhanced turbomolecular pump for gapfill deposition using high flows of low-mass fluent gas.
    상세보기

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