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Semiconductor device and method for making the same, electro-optical device using the same and method for making the electro-optical device, and electronic apparatus using the electro-optical device 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-021/00
  • H01L-027/00
출원번호 US-0355777 (1999-08-03)
우선권정보 JP0339199 (1997-12-09)
국제출원번호 PCT/JP98/05525 (1998-12-04)
§371/§102 date 19990803 (19990803)
국제공개번호 WO-9930370 (1999-06-17)
발명자 / 주소
  • Yasukawa Masahiro,JPX
출원인 / 주소
  • Seiko Epson Corporation, JPX
대리인 / 주소
    Oliff & Berridge, PLC
인용정보 피인용 횟수 : 34  인용 특허 : 1

초록

In production of a semiconductor device using an SOI technology by an adhesion method, a thin film with high thermal conductivity is formed between an insulating supporting substrate and a single-crystal silicon film formed thereon to enhance uniformity of a thermal distribution. The single-crystal

대표청구항

[ What is claimed is:] [1.]1. A method for making a semiconductor device comprising:forming a thermally conductive film having a thermal conductivity higher than thermal conductivity of a supporting substrate on one surface of the supporting substrate;forming a first insulating film on the thermally

이 특허에 인용된 특허 (1)

  1. Bruel Michel (Veurey FRX), Process for the production of thin semiconductor material films.

이 특허를 인용한 특허 (34)

  1. Kovsh, Alexey; Gubenko, Alexey; Zhukov, Alexey; Livshits, Daniil; Krestnikov, Igor, Laser source with broadband spectrum emission.
  2. Kovsh, Alexey; Zhukov, Alexey; Livshits, Daniil; Krestnikov, Igor, Laser source with broadband spectrum emission.
  3. Arao, Tatsuya, Liquid crystal display device having gate wiring on interlayer insulting film which is over transistor, and light shielding layer(s).
  4. Okabe, Tohru; Chikama, Yoshimasa, Manufacturing method for display device and display device.
  5. Akimoto, Kengo, Method for manufacturing a capacitor having a yttrium oxide layer.
  6. Suzuki, Koji; Hiramatsu, Masato, Method for manufacturing crystalline semiconductor thin film and thin film transistor.
  7. Yukiya Hirabayashi JP, Method for manufacturing electro-optical device, electro-optical device, and electronic equipment.
  8. Yamazaki, Shunpei; Ohnuma, Hideto; Koyama, Jun, Method for manufacturing semiconductor substrate, display panel, and display device.
  9. Hanaoka, Kazuya; Kimura, Shunsuke, Method for reprocessing semiconductor substrate, method for manufacturing reprocessed semiconductor substrate, and method for manufacturing SOI substrate.
  10. Harada, Masamichi; Gonohe, Narishi, Method of manufacturing film.
  11. Hirakata,Yoshiharu; Satake,Rumo, Method of manufacturing liquid crystal display device.
  12. Asahi, Toshiyuki; Karashima, Seiji; Ichiryu, Takashi; Nakatani, Seiichi; Nishiyama, Tousaku, Module with a built-in component, and electronic device with the same.
  13. Odaka, Kazuhiro; Numata, Yuichi, OLED display panel.
  14. Bjorkman,Claes; West,Lawrence C.; Maydan,Dan; Broydo,Samuel, Optical ready substrates.
  15. Bj철rkman,Claes; West,Lawrence C.; Maydan,Dan; Broydo,Samuel, Optical ready substrates.
  16. West,Lawrence C.; Bj철rkman,Claes; Maydan,Dan; Broydo,Samuel, Optical ready wafers.
  17. Kovsh, Alexey; Gubenko, Alexey; Krestnikov, Igor; Livshits, Daniil; Mikhrin, Sergey, Optical transmission system.
  18. Chang,Yi Cheng, Organic light emitting diode display and fabrication method thereof.
  19. McInerney,John G.; Wojcik,Gregory L.; West,Lawrence C., Pulsed quantum dot laser system with low jitter.
  20. Ohnuma, Hideto; Hanaoka, Kazuya, Reprocessing method of semiconductor substrate, manufacturing method of reprocessed semiconductor substrate, and manufacturing method of SOI substrate.
  21. West, Lawrence C.; Wojcik, Gregory L.; Leon, Francisco A.; Cho, Yonah; Goebel, Andreas, Ridge technique for fabricating an optical detector and an optical waveguide.
  22. H철lzl,Robert; Dantz,Dirk; Huber,Andreas; Lambert,Ulrich; Wahlich,Reinhold, SOI wafer and process for producing it.
  23. Thomas, Danielle A., Scratch protection for direct contact sensors.
  24. Ogihara,Mitsuhiko; Fujiwara,Hiroyuki; Sakuta,Masaaki; Abiko,Ichimatsu, Semiconductor apparatus having adhesion layer and semiconductor thin film.
  25. Takafuji,Yutaka; Itoga,Takashi, Semiconductor device.
  26. Saitoh, Naoto, Semiconductor integrated circuit device.
  27. Gubenko, Alexey; Kovsh, Alexey; Wojcik, Greg; Livshits, Daniil; Krestnikov, Igor; Mikhrin, Sergey, Semiconductor laser with low relative intensity noise of individual longitudinal modes and optical transmission system incorporating the laser.
  28. West, Lawrence C.; Mayden, Dan, Serial routing of optical signals.
  29. Wada,Yuichi; Leon,Francisco A., Solution to thermal budget.
  30. Maruyama, Yasushi; Takatsu, Susumu, Substrate connection structure and projector.
  31. Tanabe, Hiroshi, Thin film transistor.
  32. Tanabe, Hiroshi, Thin film transistor and method for fabricating same.
  33. Tanabe, Hiroshi, Thin film transistor and method for fabricating same.
  34. Grespan, Silvio; Feinstein, Casey; Sung, Kuo-Hua; Zhong, John Z., Thin glass for touch panel sensors and methods therefor.
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