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Adaptive control process and system 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G05B-013/02
출원번호 US-0029184 (1998-02-25)
국제출원번호 PCT/US96/15277 (1996-09-25)
§371/§102 date 19980225 (19980225)
국제공개번호 WO-9712300 (1997-04-03)
발명자 / 주소
  • Boiquaye William J. N-O.
대리인 / 주소
    Touw
인용정보 피인용 횟수 : 84  인용 특허 : 12

초록

A system for adaptively controlling a wide variety of complex processes, despite changes in process parameters and despite both sudden and systematic drifts in the process, uses response surfaces described by quadratic equations or polynomials of any order. The system estimates the dynamic component

대표청구항

[ What is claimed is:] [1.]1. A method for adaptively controlling a process operating on a sequence of samples according to a recipe having recipe values, said method comprising the steps of:(a) initializing an adaptive controller by setting initial parameter values and setting nominal recipe values

이 특허에 인용된 특허 (12)

  1. Moulds ; III Clinton W. (Millersville MD) Axelby George S. (North Linthicum MD), Apparatus and method for predictive control of a dynamic system.
  2. Prett David M. (Houston TX) Ramaker Brian L. (Houston TX) Cutler Charles R. (Katy TX), Dynamic matrix control method.
  3. Dong Yang (Cleveland Heights OH) Chizeck Howard J. (Cleveland Heights OH) Khoury James M. (Strongsville OH) Schmidt Robert N. (Cleveland OH), Extended horizon adaptive block predictive controller with an efficient prediction system.
  4. Iino Yutaka (Kawasaki JPX), Hierarchical model predictive control system based on accurate manipulation variable prediction.
  5. Grimble Michael J. (Bridge of Weir GB6) Fairbairn Niall A. (Thornliebank GB6), Industrial control systems.
  6. Krivokapic Zoran (Santa Clara CA) Heavlin William D. (San Francisco CA) Kyser David F. (San Jose CA), Method for setting and adjusting process parameters to maintain acceptable critical dimensions across each die of mass-p.
  7. Iino Yutaka (Kawasaki JPX) Ohya Junko (Kawasaki JPX), Model predictive control apparatus.
  8. Wassick John M. ; McCroskey Patrick S. ; McDonough John J. ; Steckler David K., Model predictive controller.
  9. Mozumder Purnendu K. (Plano TX) Saxena Sharad (Dallas TX) Pu William W. (Plano TX), Multi-variable statistical process controller for discrete manufacturing.
  10. Miyagaki Hisanori (Hitachiota JPX) Sugano Akira (Katsuta JPX) Takita Atsushi (Mito JPX) Toyama Eiji (Ibaraki JPX) Shimizu Katsuhito (Hitachi JPX) Tobita Haruya (Hitachi JPX) Matsumoto Hiroshi (Ibarak, Process controller for controlling a process to a target state.
  11. MacArthur J. Ward (Minneapolis MN) Wahlstedt David A. (Minneapolis MN) Woessner Michael A. (Minneapolis MN) Foslien Wendy K. (Minneapolis MN), Receding horizon based adaptive control having means for minimizing operating costs.
  12. Mozumder Purnendu K. (Plano TX) Barna Gabe G. (Richardson both of TX), System and method for controlling semiconductor wafer processing.

이 특허를 인용한 특허 (84)

  1. Wojsznis, Wilhelm K.; Blevins, Terrence L., Adaptive feedback/feedforward PID controller.
  2. Wojsznis,Wilhelm K.; Blevins,Terrence L.; Nixon,Mark J.; Wojsznis,Peter, Adaptive multivariable process controller using model switching and attribute interpolation.
  3. Paik,Young J., Adjusting manufacturing process control parameter using updated process threshold derived from uncontrollable error.
  4. Denison, David R.; Lewis, Marty James; Wojsznis, Peter; Mehta, Ashish, Analytical server integrated in a process control network.
  5. Pannese, Patrick D., Applications of neural networks.
  6. Schwarm,Alexander T., Automated design and execution of experiments with integrated model creation for semiconductor manufacturing tools.
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  8. Arackaparambil,John F.; Chi,Tom; Chow,Billy; D'Souza,Patrick M.; Hawkins,Parris; Huang,Charles; Jensen,Jett; Krishnamurthy,Badri N.; Kulkarni,Pradeep M.; Kulkarni,Prakash M.; Lin,Wen Fong; Mohan,Shan, Computer integrated manufacturing techniques.
  9. Turner, Paul; Guiver, John P.; Lines, Brian; Treiber, S. Steven, Computer method and apparatus for constraining a non-linear approximator of an empirical process.
  10. Turner, Paul; Guiver, John P.; Lines, Brian; Treiber, S. Steven, Computer method and apparatus for constraining a non-linear approximator of an empirical process.
  11. Thiele,Dirk; Blevins,Terry; Ottenbacher,Ron; Wojsznis,Wilhelm, Configuration and viewing display for an integrated model predictive control and optimizer function block.
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  13. Wojsznis, Peter; Blevins, Terrence Lynn; Wojsznis, Wilhelm K., Continuously scheduled model parameter based adaptive controller.
  14. Paik,Young Joseph, Control of chemical mechanical polishing pad conditioner directional velocity to improve pad life.
  15. Lam,Hieu A.; Yue,Hongyu, Controlling a material processing tool and performance data.
  16. Shanmugasundram, Arulkumar; Parikh, Suketu A., Copper wiring module control.
  17. Shanmugasundram, Arulkumar P.; Schwarm, Alexander T., Dynamic metrology schemes and sampling schemes for advanced process control in semiconductor processing.
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  21. Chi, Yueh-Shian; Hawkins, Parris C M; Huang, Charles Q., Dynamic subject information generation in message services of distributed object systems.
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  24. Krishnamurthy,Badri N.; Hawkins,Parris C. M., Experiment management system, method and medium.
  25. Shanmugasundram, Arulkumar P.; Schwarm, Alexander T.; Prabhu, Gopalakrishna B., Feedback control of a chemical mechanical polishing device providing manipulation of removal rate profiles.
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  27. Shanmugasundram, Arulkumar P.; Schwarm, Alexander T.; Iliopoulos, Ilias; Parkhomovsky, Alexander; Seamons, Martin J., Feedback control of plasma-enhanced chemical vapor deposition processes.
  28. Paik,Young Joseph, Feedforward and feedback control for conditioning of chemical mechanical polishing pad.
  29. Chi, Yuehshian T.; Hawkins, Parris C. M.; Jin, Qiaolin, Generic interface builder.
  30. Wojsznis,Wilhelm; Blevins,Terry; Nixon,Mark, Integrated model predictive control and optimization within a process control system.
  31. Shanmugasundram,Arulkumar P.; Schwarm,Alexander T., Integrating tool, module, and fab level control.
  32. Reiss,Terry P.; Shanmugasundram,Arulkumar P.; Schwarm,Alexander T., Integration of fault detection with run-to-run control.
  33. Liang, Jui-Ming; Wang, Pei-Jen, Intelligent control method for injection machine.
  34. Cambon, Alexander Carswell; Wunderlin, William Joseph; Heydt, Todd Mark; Kemp, Douglas Charles, Internet based supplier process reliability system.
  35. Oren, Avraham; Hartman, Yehuda; Fisher, Yossi, Knowledge tree medical enablement.
  36. Goldman, Arnold J.; Fisher, Joseph; Hartman, Jehuda; Sarel, Shlomo, Knowledge-engineering protocol-suite.
  37. Rietman, Edward A.; Card, Jill P., Large scale process control by driving factor identification.
  38. Rossi,Giammarco; Gastaldi,Luigi; Montangero,Paolo; Riva,Ezio, Method and a system for evaluating aging of components, and computer program product therefor.
  39. Cherry,Gregory A.; Adams, III,Ernest D., Method and apparatus for assessing controller performance.
  40. Mehta, Ashish; Wojsznis, Peter; Lewis, Marty J.; Jundt, Larry O.; Pettus, Nathan W., Method and apparatus for intelligent control and monitoring in a process control system.
  41. Miller, Michael L.; Wang, Qingsu, Method and apparatus for updating a manufacturing model based upon fault data relating to processing of semiconductor wafers.
  42. Yue,Hongyu; Wiseman,Joseph William, Method and system for run-to-run control.
  43. Zhu, Yada; He, Jingrui; Baseman, Robert Jeffrey, Method and system for wafer quality predictive modeling based on multi-source information with heterogeneous relatedness.
  44. Goldman, Arnold J.; Hartman, Jehuda; Fisher, Joseph; Sarel, Shlomo, Method and tool for data mining in automatic decision making systems.
  45. Rai, Man Mohan; Madavan, Nateri K., Method for constructing composite response surfaces by combining neural networks with other interpolation or estimation techniques.
  46. Adomaitis, Raymond A., Method for controlling uniformity of thin films fabricated in processing systems.
  47. Goldman, Arnold J.; Hartman, Jehuda; Fisher, Joseph; Sarel, Shlomo, Method for global automated process control.
  48. Schwarm,Alexander T.; Shanmugasundram,Arulkumar P.; Pan,Rong; Hernandez,Manuel; Mohammad,Amna, Method of feedback control of sub-atmospheric chemical vapor deposition processes.
  49. Kokotov,Yuri; Entin,Efim; Seror,Jacques; Fisher,Yossi; Sarel,Shalomo; Shanmugasundram,Arulkumar P.; Schwarm,Alexander T.; Paik,Young Jeen, Method, system and medium for controlling manufacture process having multivariate input parameters.
  50. Al Bayati,Amir; Adibi,Babak; Foad,Majeed; Somekh,Sasson, Method, system and medium for controlling semiconductor wafer processes using critical dimension measurements.
  51. Shanmugasundram,Arulkumar P.; Armer,Helen; Schwarm,Alexander T., Method, system and medium for process control for the matching of tools, chambers and/or other semiconductor-related entities.
  52. Schwarm,Alexander T.; Shanmugasundram,Arulkumar P.; Seror,Jacques; Kokotov,Yuri; Entin,Efim, Method, system, and medium for handling misrepresentative metrology data within an advanced process control system.
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  61. Thiele,Dirk; Wojsznis,Wilhelm K., On-line adaptive model predictive control in a process control system.
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  63. Paik,Young J., Process control by distinguishing a white noise component of a process variance.
  64. Paik,Young Jeen, Process control by distinguishing a white noise component of a process variance.
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  66. Caldwell,John; Blevins,Terrence L.; Wojsznis,Peter; Wojsznis,Wilhelm K., Process model identification in a process control system.
  67. Markle,Richard J.; Sonderman,Thomas J., Secondary process controller for supplementing a primary process controller.
  68. Padhi,Deenesh; Gandikota,Srinivas; Naik,Mehul; Parikh,Suketu A.; Dixit,Girish A., Selective metal encapsulation schemes.
  69. Blevins, Terrence L.; Wojsznis, Wilhelm K.; McMillan, Gregory K.; Wojsznis, Peter, Self-diagnostic process control loop for a process plant.
  70. Blevins, Terrence L.; Wojsznis, Wilhelm K.; McMillan, Gregory K.; Wojsznis, Peter, Self-diagnostic process control loop for a process plant.
  71. van der Meulen, Peter, Semiconductor manufacturing systems.
  72. Jaim Nulman, Semiconductor processing techniques.
  73. Lyon, Richard C., Semiconductor processing techniques.
  74. Kulczyk, Konrad; Palmer, Anthony; Ewing, James, Signal processing method and apparatus.
  75. Wojsznis, Wilhelm K.; Blevins, Terrence L., State based adaptive feedback feedforward PID controller.
  76. Wojsznis,Wilhelm K.; Blevins,Terrence L., State based adaptive feedback feedforward PID controller.
  77. Goldman,Arnold J.; Fisher,Joseph; Hartman,Jehuda; Sarel,Shlomo, Strategic method for process control.
  78. Goldman, Arnold J.; Hartman, Jehuda; Fisher, Joseph; Sarel, Shlomo, System and method for monitoring process quality control.
  79. Bernstein, Kerry; Watts, Josef S.; Williams, Richard Q., System and method for target-based compact modeling.
  80. Schwarm,Alexander T., System, method, and medium for monitoring performance of an advanced process control system.
  81. Surana,Rahul; Zutshi,Ajoy, Technique for process-qualifying a semiconductor manufacturing tool using metrology data.
  82. Jacques,Robert, Tuning control parameters of vibration reduction and motion control systems for fabrication equipment and robotic systems.
  83. Molnar,Charles J., Versatile wafer refining.
  84. Cordova, Sherry; Doyle, Terry L.; Kroupnova, Natalia; Lobovski, Evgueni; Louneva, Inna; Lyon, Richard C.; Nishimura, Yukari; Nolet, Clari; Reiss, Terry; Toh, Woon Young; Wilmer, Michael E., Wafer fabrication data acquisition and management systems.
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