$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Apparatus and method for transporting substrates 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B65G-049/07
출원번호 US-0089752 (1998-06-02)
발명자 / 주소
  • Hendrickson Ruth Ann
  • Van der Meulen Peter F.
출원인 / 주소
  • Brooks Automation Inc.
대리인 / 주소
    Perman & Green, LLP
인용정보 피인용 횟수 : 44  인용 특허 : 17

초록

A method and apparatus for substrate processing at lower cost than existing processing systems are disclosed, which by implementing an arrangement using load locks of smaller dimensions or of a non-indexing type, as compared to existing large dimension or indexing load locks, along with a substrate

대표청구항

[ What is claimed is:] [1.]1. A method of transporting substrate into and out of a load lock having a plurality of substrate holding locations in a substrate processing apparatus, comprising the steps of:removing a first substrate to be processed from a first substrate holding location in said load

이 특허에 인용된 특허 (17)

  1. Lin Zhihong J. ; Wang Chongyang, Apparatus, method and medium for enhancing the throughput of a wafer processing facility using a multi-slot cool down ch.
  2. Yokoyama Natsuki,JPX ; Kawamoto Yoshifumi,JPX ; Murakami Eiichi,JPX ; Uchida Fumihiko,JPX ; Mizuishi Kenichi,JPX ; Kawamura Yoshio,JPX, Fabrication system and method having inter-apparatus transporter.
  3. Sieradzki Manny (Gloucester MA), High speed movement of workpieces in vacuum processing.
  4. Eror Miroslav (Old Tappan NJ) Biehl Richard E. (Pearl River NY), Method and apparatus for handling and processing wafer-like materials.
  5. Kempf Stefan (Alzenau DEX), Method and apparatus for the step-by-step and automatic loading and unloading of a coating apparatus.
  6. Nakagawa Yoshinori (Numazu JPX) Mitani Shinichi (Numazu JPX) Kobayashi Takehiko (Mishima JPX) Honda Takaaki (Yokohama JPX), Method for multichamber sheet-after-sheet type treatment.
  7. Begin Robert G. (Montecito CA) Clarke Peter J. (Santa Barbara CA), Method for processing semi-conductor wafers in a multiple vacuum and non-vacuum chamber apparatus.
  8. Akimoto Masami (Kumamoto JPX) Yoshioka Kazutoshi (Kumamoto JPX) Iida Naruaki (Kumamoto JPX), Method for processing wafer-shaped substrates.
  9. Zajac John (San Jose CA) Mirkovich Ninko T. (Novato CA) Rathmann Thomas M. (Rohnert Park CA) Lachenbruch Roger B. (Petaluma CA), Modular article processing machine and method of article handling therein.
  10. Boitnott Charles A. ; Caughran James W. ; Egbert Steve, Modular process system.
  11. Otsuki Hayashi (Nirasaki JPX) Deguchi Yoichi (Machida JPX), Processing method and apparatus thereof.
  12. Morimoto Toru (Kyoto JPX) Hashinoki Kenji (Kyoto JPX) Hamada Tetsuya (Kyoto JPX) Kamei Kenji (Kyoto JPX), Substrate processing apparatus and method.
  13. Harada Junji (Kumamoto JPX) Harada Ichiro (Kumamoto JPX) Nakamura Koji (Kumamoto JPX), Substrate processing method and substrate processing apparatus.
  14. Lucas Brian Mark (Marblehead MA), Time optimal trajectory for cluster tool robots.
  15. Hiroki Tutomu (Yamanashi JPX), Vacuum processing apparatus.
  16. Hertel Richard J. (Bradford MA) Delforge Adrian C. (Rockport MA) Mears Eric L. (Rockport MA) MacIntosh Edward D. (Gloucester MA) Jennings Robert E. (Nethuen MA) Bhargava Akhil (Reading MA), Wafer transfer system.
  17. Toshima Masato, Wafer transfer system and method of using the same.

이 특허를 인용한 특허 (44)

  1. Soucy, Alan J.; Castantini, James S., Apparatus and methods for handling semiconductor wafers.
  2. Dickinson, John, Atmospheric robot handling equipment.
  3. Wood, Keith Freeman; Rodnick, Matthew Jonathon, Buffer station for thermal control of semiconductor substrates transferred therethrough and method of transferring semiconductor substrates.
  4. Inagawa,Makoto; Hosokawa,Akihiro, Chamber for uniform heating of large area substrates.
  5. Ishikawa, Tetsuya; Roberts, Rick J.; Armer, Helen R.; Volfovski, Leon; Pinson, Jay D.; Rice, Michael; Quach, David H.; Salek, Mohsen S.; Lowrance, Robert; Backer, John A.; Weaver, William Tyler; Carlson, Charles; Wang, Chongyang; Hudgens, Jeffrey; Herchen, Harald; Lue, Brian, Cluster tool architecture for processing a substrate.
  6. Rudolph A. Garriga, Cluster tool architecture for sulfur trioxide processing.
  7. Volfovski, Leon; Ishikawa, Tetsuya, Cluster tool substrate throughput optimization.
  8. Ishikawa,Tetsuya; Roberts,Rick, Coat/develop module with shared dispense.
  9. Krupyshev, Alexander G.; Drew, Mitchell, Compact processing apparatus.
  10. Butterfield,Paul D.; Chen,Liang Yuh; Hu,Yongqi; Manens,Antoine P.; Mavliev,Rashid; Tsai,Stan D.; Liu,Feng Q.; Wadensweiler,Ralph, Conductive polishing article for electrochemical mechanical polishing.
  11. White, John M.; Verplancken, Donald; Kurita, Shinichi, Electronic device manufacturing chamber method.
  12. Hosokawa, Akihiro, End effector assembly.
  13. Blonigan, Wendell T.; Matsumoto, Takayuki; Sterling, William N.; Leung, Billy C., End effector assembly for supporting a substrate.
  14. Meulen, Peter van der, Linear semiconductor processing facilities.
  15. van der Meulen, Peter, Linear semiconductor processing facilities.
  16. Ettinger, Gary C.; Khau, Michael E.; Shin, Ho Seon, Methods and apparatus for drying a substrate.
  17. van der Meulen, Peter, Mid-entry load lock for semiconductor handling system.
  18. van der Meulen,Peter, Mid-entry load lock for semiconductor handling system.
  19. Bagley, William A.; Ramirez, Ericka M.; Wolgast, Stephen C., Pedestal for flat panel display applications.
  20. Sundar, Satish; Matthews, Ned G., Pneumatically actuated flexure gripper for wafer handling robots.
  21. Bagley, William A.; Ramirez, Ericka M.; Wolgast, Stephen C., Pre-heating and load lock pedestal material for high temperature CVD liquid crystal and flat panel display applications.
  22. Saeki, Hiroaki; Matsushima, Keiichi; Asakawa, Teruo; Narushima, Masaki, Processing apparatus.
  23. Matsushita, Minoru; Kodashima, Yasushi; Kumai, Toshikazu, Processing apparatus, transferring apparatus and transferring method.
  24. Cox, Damon; Elliott, Martin R.; Pencis, Chris; Hudgens, Jeffrey C.; Rice, Michael Robert, Robot for handling semiconductor wafers.
  25. Martin R. Elliott ; Jeffrey C. Hudgens ; Chris Pencis ; Damon Cox, Robot for handling semiconductor wafers.
  26. van der Meulen, Peter, Semiconductor manufacturing systems.
  27. Cho,Sungmin; Reimer,Peter; Seidl,Vincent, Semiconductor substrate damage protection system.
  28. van der Meulen, Peter; Kiley, Christopher C; Pannese, Patrick D.; Ritter, Raymond S.; Schaefer, Thomas A., Semiconductor wafer handling and transport.
  29. van der Meulen, Peter; Kiley, Christopher C; Pannese, Patrick D.; Ritter, Raymond S.; Schaefer, Thomas A., Semiconductor wafer handling and transport.
  30. van der Meulen, Peter; Kiley, Christopher C.; Pannese, Patrick D.; Ritter, Raymond S.; Schaefer, Thomas A., Semiconductor wafer handling transport.
  31. van der Meulen, Peter, Stacked process modules for a semiconductor handling system.
  32. van der Meulen,Peter, Stacked process modules for a semiconductor handling system.
  33. Rice, Mike; Hudgens, Jeffrey; Carlson, Charles; Weaver, William Tyler; Lowrance, Robert; Englhardt, Eric; Hruzek, Dean C.; Silvetti, Dave; Kuchar, Michael; Katwyk, Kirk Van; Hoskins, Van; Shah, Vinay, Substrate processing sequence in a cartesian robot cluster tool.
  34. Nguyen, Andrew; Schneider, Gerhard; Hosokawa, Akihiro; Matsumoto, Takayuki, Substrate support.
  35. Kurita, Shinichi; Anwar, Suhail; Kiyotake, Toshio, Substrate support bushing.
  36. Kurita, Shinichi; Anwar, Suhail; Kiyotake, Toshio, Substrate support bushing.
  37. Aggarwal, Ravinder; Kusbel, Jim; Alexander, Jim, System for the improved handling of wafers within a process tool.
  38. Kurita, Shinichi; Beer, Emanuel; Nguyen, Hung T.; Blonigan, Wendell T., Transfer chamber for vacuum processing system.
  39. Kobayashi, Kenji, Transferring device and transferring method.
  40. Saeki,Hiroaki; Narushima,Masaki; Osawa,Tetsu; Taniyama,Yasushi; Hagiwara,Shuuji, Untreated body transfer device and semiconductor manufacturing device with the untreated body transfer device.
  41. Ozawa,Jun; Hirose,Jun; Narushima,Masaki, Vacuum process system.
  42. Ozawa,Jun; Hirose,Jun; Narushima,Masaki, Vacuum process system.
  43. Soraoka,Minoru; Yoshioka,Ken; Kawasaki,Yoshinao, Vacuum processing apparatus and semiconductor manufacturing line using the same.
  44. Oono, Takeshi; Nakata, Kenji; Okiguchi, Shoji; Ueno, Tooru; Oomae, Hidehiro; Minami, Shigeharu; Kai, Yoshitaka, Vacuum processing apparatus and vacuum processing method.
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로