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Vaporization and deposition apparatus 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-016/00
출원번호 US-0927700 (1997-09-11)
발명자 / 주소
  • Somekh Sasson
  • Zhao Jun
  • Dornfest Charles
  • Sajoto Talex
  • Selyutin Leonid
  • Ku Vincent
  • Wang Chris
  • Chang Frank
  • Tang Po
출원인 / 주소
  • Applied Materials, Inc.
대리인 / 주소
    Thomason, Moser & Patterson
인용정보 피인용 횟수 : 123  인용 특허 : 37

초록 ▼

The invention relates to an apparatus and process for the vaporization of liquid precursors and deposition of a film on a suitable substrate. Particularly contemplated is an apparatus and process for the deposition of a metal-oxide film, such as a barium, strontium, titanium oxide (BST) film, on a s

대표청구항 ▼

[ What is claimed is:] [1.]1. A process chamber for depositing a film, comprising:a) a chamber body forming an enclosure having one or more temperature controlled surfaces;b) a lid movably mounted on the chamber body, the lid having a heated main body and an outer temperature controlled collar;c) a

이 특허에 인용된 특허 (37)

  1. Barbee Steven George ; Conti Richard Anthony ; Kostenko Alexander ; Sarma Narayana V. ; Wilson Donald Leslie ; Wong Justin Wai-Chow ; Zuhoski Steven Paul, Apparatus for chemical vapor deposition of aluminum oxide.
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  2. Carver ; Jr. Edward Lawrence ; DeCava David Charles ; Skiptunas Steven, Apparatus for mixing fluids for analysis.
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  3. Wilson Herbert L. (Woodbridge VA) Guiterrez William A. (Woodbridge VA), Apparatus for producing high quality epitaxially grown semiconductors.
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  4. Anderson Milo D. (Fremont CA) Holt Neil L. (Foster City CA) Larsson Peter L. (Los Altos CA) Richardson Anthony R. W. (Los Altos Hills CA), Bulkhead seal.
    상세보기
  5. Zhao Jun (Milpitas CA) Cho Tom (San Francisco CA) Dornfest Charles (Fremont CA) Wolff Stefan (Sunnyvale CA) Fairbairn Kevin (Saratoga CA) Guo Xin S (Mountain View CA) Schreiber Alex (Santa Clara CA) , CVD Processing chamber.
    상세보기
  6. Wang David N. (Cupertino CA) White John M. (Hayward CA) Law Kam S. (Union City CA) Leung Cissy (Union City CA) Umotoy Salvador P. (Pittsburg CA) Collins Kenneth S. (San Jose CA) Adamik John A. (San R, CVD of silicon oxide using TEOS decomposition and in-situ planarization process.
    상세보기
  7. Nagashima Makoto (Tokyo JPX) Nishizato Hiroshi (Chiba JPX) Ono Hirofumi (Shiga JPX), Chemical vapor deposition method and apparatus therefore.
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  8. Baumberger Otto (Carouge CHX) Kalbskopf Reinhard (Vordenwald CHX), Device for depositing a mineral oxide coating on a substrate.
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  9. Kanai Masahiro (Tokyo JPX) Hirooka Masaaki (Toride JPX) Hanna Junichi (Yokohama JPX) Shimizu Isamu (Yokohama JPX) Takeuchi Eiji (Yokohama JPX), Device for forming a deposited film.
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  10. Burian ; deceased Paul D. (late of Elmsford NY by Elissa Burian ; administratrix) Kunz Raymond W. (Monroe CT), Electrically heated facial sauna vapor generating apparatus.
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  18. Chen Aihua ; Umotoy Salvador P., Lid assembly for semiconductor processing chamber.
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  19. Van Buskirk Peter C. ; Bilodeau Steven M. ; Carl ; Jr. Ralph J., Liquid delivery system, heater apparatus for liquid delivery system, and vaporizer.
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  21. Li Ting Kai ; Scott Dane C., Liquid vaporizer system and method.
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  22. Goodson Forrest R. (San Jose CA), Liquid vaporizing process for manufacturing iron oxide.
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  23. Stockel Joseph F. (Rockville MD), Metal-oxide-hydrogen cell with variable conductant heat pipe.
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  25. Kirlin Peter S. (Brookfield) Binder Robin L. (Bethlehem) Gardiner Robin A. (Bethel CT), Method for delivering an involatile reagent in vapor form to a CVD reactor.
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  26. Hock ; Jr. Vincent F. (Champaign IL) Givens John H. (Champaign IL) Suarez Joseph E. (South Burlington VT) Rigsbee James M. (Champaign IL), Method of making mixed metal oxide coated substrates.
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  27. Zhao Jun ; Cho Tom ; Guo Xin Sheng ; Tabata Atsushi,JPX ; Qiao Jianmin ; Schreiber Alex, Method of reducing residue accumulation in CVD chamber using ceramic lining.
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  28. Turner Terry D. (Idaho Falls ID), Multiple source/multiple target fluid transfer apparatus.
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  29. Beach William F. (Bridgewater NJ) Wary John (Noblesville IN) Olson Roger A. (Amery WI), Parylene deposition apparatus including a tapered deposition chamber and dual vacuum outlet pumping arrangement.
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  30. Nause Jeffrey E. ; Hill D. Norman ; Pope Stephen G., Pressurized skull crucible apparatus for crystal growth and related system and methods.
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  31. Seelbach Christian A. (Scottsdale AZ) Ingle William M. (Phoenix AZ) Goetz Carl A. (Scottsdale AZ), Process and apparatus for the low pressure chemical vapor deposition of thin films.
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  32. Kaloyeros Alain E. (Voorheesville NY) Eisenbraun Eric T. (Delmar NY) Zheng Bo (Albany NY), Process and apparatus for the use of solid precursor sources in liquid form for vapor deposition of materials.
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  33. Foster Robert F. (Weston MA) Rebenne Helen E. (Fair Lawn NJ) LeBlanc Rene E. (Branford CT) White Carl L. (Gilbert AZ) Arora Rikhit (Mesa AZ), Semiconductor wafer processing CVD reactor apparatus comprising contoured electrode gas directing means.
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  34. Fong Gary L. ; Lim Vincente ; Sivaramakrishnan Visweswaren, Silicon carbide constant voltage gradient gas feedthrough.
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  35. Esser Keith A. (San Diego CA) Riley Scott W. (Oceanside CA) Warden Laurence (San Diego CA), Solid conductor thermal feedthrough.
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  36. Wang David N. (Cupertino) White John M. (Hayward) Law Kam S. (Union City) Leung Cissy (Union City) Umotoy Salvador P. (Pittsburg) Collins Kenneth S. (San Jose) Adamik John A. (San Ramon) Perlov Ilya , Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planar.
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  37. Ono Hirofumi,JPX, Valve structure for use in a vaporizer.
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