초록 ▼

An apparatus for supplying a mixture of a treatment liquid and ozone for treatment of a surface of a workpiece, and a corresponding method are set forth. The preferred embodiment of the apparatus comprises a liquid supply line that is used to provide fluid communication between a reservoir containin

An apparatus for supplying a mixture of a treatment liquid and ozone for treatment of a surface of a workpiece, and a corresponding method are set forth. The preferred embodiment of the apparatus comprises a liquid supply line that is used to provide fluid communication between a reservoir containing the treatment liquid and a treatment chamber housing the workpiece. A heater is disposed to heat the workpiece, either directly or indirectly. Preferably, the workpiece is heated by heating the treatment liquid that is supplied to the workpiece. One or more nozzles accept the treatment liquid from the liquid supply line and spray it onto the surface of the workpiece while an ozone generator provides ozone into an environment containing the workpiece.

대표청구항 ▼

[ What is claimed is:] [25.]25. A system for processing a semiconductor wafer, comprising:a process chamber;a rotor assembly in the process chamber, with the rotor having positions for holding a plurality of wafers;a plurality of spray nozzles in the process chamber positioned to spray liquid onto t

[ What is claimed is:] [25.]25. A system for processing a semiconductor wafer, comprising:a process chamber;a rotor assembly in the process chamber, with the rotor having positions for holding a plurality of wafers;a plurality of spray nozzles in the process chamber positioned to spray liquid onto the wafers in the rotor;a process liquid reservoir for holding an aqueous process liquid;a liquid flow line connecting the process liquid reservoir to the spray nozzles in the process chamber;a heater for heating the process liquid in at least one of the reservoir and the liquid flow line; andan ozone gas generator connected to the liquid flow line to deliver ozone gas into process liquid flowing from the process liquid reservoir to the spray nozzles in the chamber.