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Method and apparatus for removing coatings and oxides from substrates 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B24B-001/00
  • B24C-001/00
출원번호 US-0455139 (1999-12-06)
발명자 / 주소
  • Neese Edward D.
  • Kullen Peter S.
  • Valentine Eugene
출원인 / 주소
  • International Processing Systems, Inc.
대리인 / 주소
    Webb Ziesenheim Logsdon Orkin & Hanson, P.C.
인용정보 피인용 횟수 : 15  인용 특허 : 17

초록

A method and apparatus for removing coatings and oxides from substrates that includes a conveyor for moving a substrate in a first direction, at least one nozzle positioned away from the conveyor in position to direct the stream of fluid toward the conveyor and a high pressure fluid supply in fluid

대표청구항

[ What is claimed is:] [1.]1. A method for removing a coating on a substrate, comprising the steps of:(a) providing a pressurized fluid to a stationary nozzle;(b) directing the pressurized fluid from the nozzle in a high velocity fluid stream toward a moving object having a coating, wherein the velo

이 특허에 인용된 특허 (17)

  1. Hashish Mohamed (Kent WA) Marvin Mark (Tacoma WA), Abrasive swivel assembly and method.
  2. Hashish Mohamed Ahmed (Bellevue WA) Crowe David Arthur (Webster NY) Armstrong Neil Dean (Greece NY), Abrasive-liquid polishing and compensating nozzle.
  3. Elliott Charles P. (Acton CAX), Blast cleaning apparatus and method with laterally moving conveyor.
  4. Goenka Lakhi Nandlal, CO.sub.2 cleaning system and method.
  5. Palmer ; Jr. Charles E. (Plum Boro PA), Cleaning method and apparatus.
  6. Sekiya, Teruo; Kimura, Tomoaki, Descaling rolled material.
  7. Saikin Joel L. (Chesterton IN), Descaling system for use in the manufacture of steel and corresponding method.
  8. Verry Philippe (Meylan FRX), Erosion of a solid surface with a cavitating liquid jet.
  9. Imai Isao (Yokohama JPX) Hirata Hiromasa (Yokohama JPX) Kawanami Takao (Tokai JPX) Omura Yasuhiro (Tokai JPX), Mechanical descaling device.
  10. Cole John M. (West Bloomfield MI) Bessey Charles M. (Plymouth Township Wayne County MI), Method and apparatus for descaling metal strip.
  11. Klingel Hans,DEX, Method and machine tool for cutting workpieces.
  12. Cryer Michael A. (Byron GA) Danielson William D. (Decatur GA) Babb Robert A. (Warner Robins GA), Method and system for cleaning a surface with CO2 pellets that are delivered through a temperature control.
  13. Lloyd Daniel L. (Mason OH), Method for removal of surface coatings.
  14. Noe Rolf (Mulheim DEX) Noe Andreas (Mulheim DEX) Baukloh Dieter (Duisburg DEX), Method of and process for cold-rolling of stainless-steel and titanium-alloy strip.
  15. Tada Masuo (Yao JPX) Hata Takeki (Kobe JPX) Fukumoto Takaaki (Itami JPX) Ohmori Toshiaki (Itami JPX), Processing apparatus for semiconductor wafers.
  16. Nijland Everardus J. (Hoogeveen NLX) Maas Wilhelmus J. J. (Someren NLX), Suction attachment, spray member suitable for in such a suction attachment, and vacuum cleaner provided with such a suct.
  17. Bowers Charles W., Wafer cassette cleaning using carbon dioxide jet spray.

이 특허를 인용한 특허 (15)

  1. Lewis, Paul E.; Ahmadi, Goodarz; Tannous, Adel George; Makhamreh, Khalid; Compton, Keith H., Apparatus for cleaning surfaces substantially free of contaminants.
  2. Obrachta, Kevin Lyle; Wadsworth, Mark Anthony, Method and apparatus for abrasive stream perforation.
  3. Collier,Ronald E.; Zagrebelny,Andrey, Method and system for cleaning a polishing pad.
  4. Chi, Pei-Wen; Lu, Hsueh-Chin; Liao, Shin Hsien; Liang, Hung-Hsin, Method for semiconductor manufacturing.
  5. Ahmadi, Goodarz; Lewis, Paul E.; Tannous, Adel George; Makhamreh, Khalid; Compton, Keith H., Methods for cleaning surfaces substantially free of contaminants.
  6. Ahmadi, Goodarz; Lewis, Paul E.; Tannous, Adel George; Makhamreh, Khalid, Methods for cleaning utilizing multi-stage filtered carbon dioxide.
  7. Boumerzoug,Mohamed; Tannous,Adel George, Methods for residue removal and corrosion prevention in a post-metal etch process.
  8. Boumerzoug, Mohamed; Tannous, Adel George; Makhamreh, Khalid, Methods for resist stripping and cleaning surfaces substantially free of contaminants.
  9. Boumerzoug,Mohamed; Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and cleaning surfaces substantially free of contaminants.
  10. Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants.
  11. Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants.
  12. Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants.
  13. Kim,Jong Bok; Choi,Seung Lyong, Polishing pad cleaner and chemical mechanical polishing apparatus comprising the same.
  14. Kelson, Arnold A., Waterjet removal of coverings from tangled wire and loose coils.
  15. Kelson, Arnold A., Waterjet removal of coverings from tangled wire and loose coils.

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