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Fabrication of clad hollow cathode magnetron sputter targets 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B21D-039/00
  • C23C-014/02
출원번호 US-0368062 (1999-08-03)
발명자 / 주소
  • Kulkarni Shailesh
  • Lam Raymond K. F.
  • Sica Tony
출원인 / 주소
  • Praxair S.T. Technology, Inc.
대리인 / 주소
    Biederman
인용정보 피인용 횟수 : 44  인용 특허 : 9

초록 ▼

A method is provided for forming clad hollow cathode magnetron sputter targets that are lighter in weight and/or less expensive than monolithic targets. A plate of sputter target material is bonded to a sheet of cladding material that is lighter in weight and/or less expensive than the sputter targe

대표청구항 ▼

[ What is claimed is:] [1.]1. A method of fabricating sputter targets comprising the steps of:bonding a plate of sputter target material to a sheet of cladding material to form a clad target assembly; anddeep drawing the clad target assembly into a clad hollow cathode magnetron sputter target, the c

이 특허에 인용된 특허 (9)

  1. Johnson Howard B. (Cincinnati OH), Alumina and MgO preheatable insulating refractory liners and methods of using.
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  2. Acheson Rees H. (Hill Rd. Alstead NH 03602), Automatic welding apparatus for weld build-up and method of achieving weld build-up.
    상세보기
  3. Yan Yingchao,NLX ; Faber Anne Jans,NLX, Erbium-doped planar waveguide.
    상세보기
  4. Emigh Roger Alan (Post Falls ID) Willett William Bryce (Veradale WA), Metal sputtering target assembly.
    상세보기
  5. Shibamori Seiji (Nikko JPX) Ishida Yoji (Nikko JPX), Method for manufacturing aluminum or aluminum alloy clad steel sheet or strip.
    상세보기
  6. Strothers Susan D. (Spokane WA) Delano Robert G. (Valleyford WA) Steed Garold L. (Spokane WA), Method of manufacturing sputtering target assembly.
    상세보기
  7. Dunlop John A. ; Goldstein Michael ; Feldewerth Gerald B. ; Shim Cari ; Schittny Stephan, Method of reducing sputtering burn-in time, minimizing sputtered particulate, and target assembly therefor.
    상세보기
  8. Eckert John K. ; Farina Jeffrey M. ; Gadda Joseph P. ; Kelly Jeffrey C. ; Thomas John G., Multilayer composite tubular structure and method of making.
    상세보기
  9. Hale John Richard ; Farina Jeffrey M. ; Koehler Philip J. ; Maropis Nicholas, Thermionic cathode with continuous bimetallic wall.
    상세보기

이 특허를 인용한 특허 (44)

  1. Brown, Karl M.; Pipitone, John; Mehta, Vineet; Hofmann, Ralf, Apparatus for plasma-enhanced physical vapor deposition of copper with RF source power applied through the workpiece with a lighter-than-copper carrier gas.
    상세보기
  2. Jianxing Li ; Michael R. Pinter ; Steven Wu, Container-shaped physical vapor deposition targets.
    상세보기
  3. Li, Jianxing; Pinter, Michael R.; Wu, Steven, Container-shaped physical vapor deposition targets.
    상세보기
  4. Miller, Steven A.; Gaydos, Mark; Shekhter, Leonid N.; Gulsoy, Gokce, Dynamic dehydriding of refractory metal powders.
    상세보기
  5. Miller, Steven A.; Gaydos, Mark; Shekhter, Leonid N.; Gulsoy, Gokce, Dynamic dehydriding of refractory metal powders.
    상세보기
  6. Subramani,Anantha K.; Vesci,Anthony; Dickerson,Scott, Electroformed sputtering target.
    상세보기
  7. Miller, Steven A.; Kumar, Prabhat; Wu, Richard; Sun, Shuwei; Zimmermann, Stefan; Schmidt-Park, Olaf, Fine grained, non banded, refractory metal sputtering targets with a uniformly random crystallographic orientation, method for making such film, and thin film based devices and products made therefrom.
    상세보기
  8. Ivanov, Eugene Y., High purity target manufacturing methods.
    상세보기
  9. Ford, Robert B.; Michaluk, Christopher A., Hollow cathode target and methods of making same.
    상세보기
  10. Ford,Robert B.; Michaluk,Christopher A., Hollow cathode target and methods of making same.
    상세보기
  11. Melvin K. Holcomb ; William E. Barnes ; Steven L. Bardus, Insert target assembly and method of making same.
    상세보기
  12. Dary, Francois-Charles; Gaydos, Mark; Loewenthal, William; Miller, Steven A.; Rozak, Gary; Volchko, Scott Jeffrey; Zimmermann, Stefan; Stawovy, Michael Thomas, Large-area sputtering targets.
    상세보기
  13. Thiel, James P., MSVD coating process.
    상세보기
  14. Bardos, Ladislav; Barankova, Hana, Magnetron plasma apparatus.
    상세보기
  15. Yamakoshi, Yasuhiro; Mogaki, Kenichi, Method for connecting magnetic substance target to backing plate, and magnetic substance target.
    상세보기
  16. Brown, Karl M.; Pipitone, John; Mehta, Vineet, Method for plasma-enhanced physical vapor deposition of copper with RF source power applied to the target.
    상세보기
  17. Wickersham, Jr., Charles E., Method of bonding sputtering target materials.
    상세보기
  18. Brown, Karl M.; Pipitone, John; Mehta, Vineet, Method of performing physical vapor deposition with RF plasma source power applied to the target using a magnetron.
    상세보기
  19. Miller, Steven A.; Shekhter, Leonid N.; Zimmermann, Stefan, Methods of joining metallic protective layers.
    상세보기
  20. Miller, Steven A.; Shekhter, Leonid N.; Zimmermann, Stefan, Methods of joining metallic protective layers.
    상세보기
  21. Volchko, Scott Jeffrey; Zimmermann, Stefan; Miller, Steven A.; Stawovy, Michael Thomas, Methods of manufacturing high-strength large-area sputtering targets.
    상세보기
  22. Loewenthal, William; Miller, Steven Alfred, Methods of manufacturing large-area sputtering targets.
    상세보기
  23. Miller, Steven A.; Dary, Francois-Charles; Gaydos, Mark; Rozak, Gary, Methods of manufacturing large-area sputtering targets by cold spray.
    상세보기
  24. Volchko, Scott Jeffrey; Loewenthal, William; Zimmermann, Stefan; Gaydos, Mark; Miller, Steven Alfred, Methods of manufacturing large-area sputtering targets using interlocking joints.
    상세보기
  25. Volchko, Scott Jeffrey; Loewenthal, William; Zimmermann, Stefan; Gaydos, Mark; Miller, Steven Alfred, Methods of manufacturing large-area sputtering targets using interlocking joints.
    상세보기
  26. Miller, Steven A.; Kumar, Prabhat; Wu, Rong-chein Richard; Sun, Shuwei; Zimmermann, Stefan; Schmidt-Park, Olaf, Methods of rejuvenating sputtering targets.
    상세보기
  27. Bailey, Robert S.; Holcomb, Melvin K.; Smathers, David B.; Wiemels, Timothy, Non-planar sputter targets having crystallographic orientations promoting uniform deposition.
    상세보기
  28. Okabe, Takeo; Nagasawa, Masaru, Packaging device and packaging method for hollow cathode type sputtering target.
    상세보기
  29. Brown, Karl M.; Pipitone, John; Mehta, Vineet, Physical vapor deposition plasma reactor with RF source power applied to the target and having a magnetron.
    상세보기
  30. Brown,Karl M.; Pipitone,John; Mehta,Vineet; Hofmann,Ralf; Wang,Wei W.; Sherstinsky,Semyon, Physical vapor deposition plasma reactor with VHF source power applied through the workpiece.
    상세보기
  31. Shekhter, Leonid N.; Miller, Steven A.; Haywiser, Leah F.; Wu, Rong-Chein R., Process for preparing metal powders having low oxygen content, powders so-produced and uses thereof.
    상세보기
  32. Scheible, Kathleen; Flanigan, Michael Allen; Yoshidome, Goichi; Allen, Adolph Miller; Pavloff, Cristopher M., Process kit and target for substrate processing chamber.
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  33. Young, Donny; Ritchie, Alan Alexander; Hong, Ilyoung (Richard); Scheible, Kathleen A., Process kit components for titanium sputtering chamber.
    상세보기
  34. Jepson, Peter R., Refractory metal pots.
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  35. Jepson, Peter R., Refractory metal pots.
    상세보기
  36. Yuan, Yongwen; Ivanov, Eugene Y.; Liu, Yang; Frausto, Phil; Miao, Weifang, Silicon sputtering target with special surface treatment and good particle performance and methods of making the same.
    상세보기
  37. Kailasam, Sridhar K.; Powell, Ronald A.; Settles, E. Derryck, Sputter apparatus for producing multi-component metal alloy films and method for making the same.
    상세보기
  38. Hukushima, Atsushi, Sputtering target and manufacturing method thereof.
    상세보기
  39. Wickersham, Jr., Charles E.; Levit, Vladimir; Alexander, P. Todd, Sputtering target and method of fabrication.
    상세보기
  40. Allen, Adolph Miller; Yoon, Ki Hwan; Guo, Ted; Yang, Hong S.; Yu, Sang-Ho, Sputtering target having increased life and sputtering uniformity.
    상세보기
  41. Wickersham, Jr., Charles E.; Levit, Vladimir; Alexander, P. Todd, Tantalum sputtering target and method of fabrication.
    상세보기
  42. Ferrasse, Stephane; Hort, Werner H.; Kim, Jaeyeon; Alford, Frank C., Target designs and related methods for coupled target assemblies, methods of production and uses thereof.
    상세보기
  43. Ritchie, Alan Alexander; Young, Donny; Hong, Ilyoung (Richard); Scheible, Kathleen A.; Kelkar, Umesh, Target for sputtering chamber.
    상세보기
  44. Pigur, Bjoern; Snowman, Alfred, Texture and grain size controlled hollow cathode magnetron targets and method of manufacture.
    상세보기

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