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Method for making a thin film of solid material 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-021/30
  • H01L-021/46
출원번호 US-0463976 (2000-02-14)
우선권정보 FR0010288 (1997-08-12)
국제출원번호 PCT/FR98/01789 (1998-08-11)
§371/§102 date 20000214 (20000214)
국제공개번호 WO-9908316 (1999-02-18)
발명자 / 주소
  • Aspar Bernard,FRX
  • Bruel Michel,FRX
출원인 / 주소
  • Commissariat A l'Energie Atomique, FRX
대리인 / 주소
    Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
인용정보 피인용 횟수 : 157  인용 특허 : 11

초록

The annealing step is carried out to a thermal budget made in relation to the thermal budget of the ionic implantation step and possibly other thermal budgets inferred for other steps, in order to provide said cleavage of the substrate.

대표청구항 ▼

[ What is claimed is:] [1.]1. A method of manufacturing a thin film of solid material that includes at least the following steps:a step of ionic implantation through one face of a substrate of the solid material using ions capable of creating in the volume of the substrate, and at a depth close to t

이 특허에 인용된 특허 (11)

  1. Henley Francois J. ; Cheung Nathan W., Controlled cleaning process.
    상세보기
  2. Henley Francois J. ; Cheung Nathan, Controlled cleavage process and device for patterned films.
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  3. Henley Francois J. ; Cheung Nathan, Controlled cleavage process using pressurized fluid.
    상세보기
  4. Henley Francois J. ; Cheung Nathan, Controlled cleavage process using pressurized fluid.
    상세보기
  5. Henley Francois J. ; Cheung Nathan W., Method for controlled cleaving process.
    상세보기
  6. Bruel Michel,FRX, Method for inserting a gaseous phase in a sealed cavity by ion implantation.
    상세보기
  7. Bruel Michel (Veurey FRX), Method for placing semiconductive plates on a support.
    상세보기
  8. Henley Francois J. ; Cheung Nathan W., Pressurized microbubble thin film separation process using a reusable substrate.
    상세보기
  9. Bruel Michel (Veurey FRX), Process for the production of a relief structure on a semiconductor material support.
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  10. Bruel Michel (Veurey FRX), Process for the production of thin semiconductor material films.
    상세보기
  11. Henley Francois J. ; Cheung Nathan W., Reusable substrate for thin film separation.
    상세보기

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