초록 ▼

An irradiation electron beam emitted from an electron gun is deflected by an energy filter, and passes through a first projective lens and an objective lens, and then irradiated onto a sample to produce secondary electrons. The secondary electron beam accelerated by a negative voltage applied to the

An irradiation electron beam emitted from an electron gun is deflected by an energy filter, and passes through a first projective lens and an objective lens, and then irradiated onto a sample to produce secondary electrons. The secondary electron beam accelerated by a negative voltage applied to the sample passes through the objective lens and the first projective lens, and deflected by the energy filter to be energy dispersed. Only the secondary electrons having a specified energy pass through energy selecting aperture, and further pass through a second projective lens to form a projected image of the secondary electrons on an imager. Such an electron-optical system may be used for dimension evaluation or inspection of semiconductor substrates.

대표청구항 ▼

[ What is claimed is:] [1.]1. A projecting type charged particle microscope, comprising:a charged particle gun for emitting a charged particle beam,an energy filter for deflecting the charged particle beam to direct said beam to a sample and energy-dispersing the charged particle beam,a first projec

[ What is claimed is:] [1.]1. A projecting type charged particle microscope, comprising:a charged particle gun for emitting a charged particle beam,an energy filter for deflecting the charged particle beam to direct said beam to a sample and energy-dispersing the charged particle beam,a first projective lens arranged between the sample and the energy filter for projecting the charged particle beam on the sample to emit charged particles therefrom and focusing and making the charged particles incident on the energy filter, anda second projective lens for projecting the energy-dispersed charged particles on a plane, an imager arranged in the plane for imaging the charged particles projected by the second projective lens, the first projective lens, the energy filter and the second projective lens being stacked and arranged in a direction substantially perpendicular to a surface of the sample.