초록 ▼

A novel process and apparatus are disclosed for cleaning wastewater containing metal ions in solution, hydrogen peroxide, and high solids, e.g., greater than about 50 mg/l particulate solids. A carbon adsorption column removes hydrogen peroxide in the wastewater feed containing high solids. A chemic

A novel process and apparatus are disclosed for cleaning wastewater containing metal ions in solution, hydrogen peroxide, and high solids, e.g., greater than about 50 mg/l particulate solids. A carbon adsorption column removes hydrogen peroxide in the wastewater feed containing high solids. A chemical precipitation unit removes the metal ions from solution. The process and apparatus remove metal ions such as copper from a high solids byproduct polishing slurry from the chemical mechanical polishing (CMP) of integrated circuit microchips to form an environmentally clean wastewater discharge.

대표청구항 ▼

[ What is claimed is:] [1.]1. A process for removing metal ions from wastewater, comprising:(a) passing a wastewater feed containing hydrogen peroxide and metal ions in solution through a carbon bed, wherein said wastewater feed contains solids sized in the range of about 0.01-1.0 .mu.m in an amount

[ What is claimed is:] [1.]1. A process for removing metal ions from wastewater, comprising:(a) passing a wastewater feed containing hydrogen peroxide and metal ions in solution through a carbon bed, wherein said wastewater feed contains solids sized in the range of about 0.01-1.0 .mu.m in an amount higher than about 50 mg/l to form a carbon bed product stream; and(b) passing said carbon bed product stream from said carbon bed to a chemical precipitation unit for removing said metal ions from solution.