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Step and flash imprint lithography 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B44C-001/22
출원번호 US-0266663 (1999-03-11)
발명자 / 주소
  • Carlton Grant Willson
  • Matthew Earl Colburn
출원인 / 주소
  • Board of Regents, The University of Texas System
대리인 / 주소
    Myers Bigel Sibley & Sajovec, P.A.
인용정보 피인용 횟수 : 335  인용 특허 : 12

초록

A method of forming a relief image in a structure comprising a substrate and a transfer layer formed thereon comprises covering the transfer layer with a polymerizable fluid composition, and then contacting the polymerizable fluid composition with a mold having a relief structure formed therein such

대표청구항

1. A method of forming a relief image in a structure said method comprising:covering the substrate with a polymeric transfer layer to provide a continuous, planar surface thereon; covering the polymeric transfer layer with a polymerizable fluid composition; contacting the polymerizable fluid composi

이 특허에 인용된 특허 (12)

  1. Soane David S. (Piedmont CA), Controlled casting of a shrinkable material.
  2. Parce J. Wallace ; Kopf-Sill Anne R. ; Bousse Luc J., High throughput screening assay systems in microscale fluidic devices.
  3. Bonnebat Claude (Pontault-Combault FRX) Quentin Jean-Pierre (Lyon FRX) Morin Alain (Villeurbanne FRX), Highly oriented thermotropic optical disc member.
  4. Tanigawa Makoto (Kitakatsuragi JPX) Tabuchi Hiroki (Nara JPX) Taniguchi Takayuki (Tenri JPX), Method for forming a fine resist pattern.
  5. Boehnke Ralf-Dieter (Hamburg DEX) Dammann Hans (Tangstedt DEX) Rabe Gert (Pinneberg DEX), Method of forming at least one groove in a substrate layer.
  6. Nelson Robert J. ; Hooper Herbert H. ; Hauser Alan K. ; Singh Sharat ; Williams Stephen J. ; Sassi Alexander P., Microfluidic method for nucleic acid purification and processing.
  7. Chou Stephen Y., Nanoimprint lithography.
  8. Fontana ; Jr. Robert Edward ; Hsiao Richard ; Marinero Ernesto Esteban ; Santini Hugo Alberto Emilio ; Terris Bruce David, Patterned magnetic media and method of making the same using selective oxidation.
  9. Cronin John E. (Milton VT) Farrar ; Sr. Paul A. (Burlington VT) Geffken Robert M. (Burlington VT) Guthrie William H. (Essex Junction VT) Kaanta Carter W. (Colchester VT) Previti-Kelly Rosemary A. (Ri, Plural level chip masking.
  10. Napoli Louis S. (Hamilton Township ; Mercer County NJ) Russell John P. (Pennington NJ), Process for forming a lithographic mask.
  11. Bae Young C. (Pleasanton CA) Soane David S. (Piedmont CA) Crocker Charles (San Francisco CA), Rapid prototype three dimensional stereolithography.
  12. Calhoun Clyde D. ; Delgado Joaquin, Temperature-responsive adhesive article.

이 특허를 인용한 특허 (335)

  1. Cadee, Theodorus Petrus Maria; Gilissen, Noud Jan; Vermeulen, Johannes Petrus Martinus Bernardus, Actuator.
  2. GanapathiSubramanian,Mahadevan; Sreenivasan,Sldlgata V., Adaptive shape substrate support method.
  3. Wuister, Sander Frederik; Kruijt-Stegeman, Yvonne Wendela, Alignment and imprint lithography.
  4. Sreenivasan, Sidlgata V; Watts, Michael P. C.; Choi, Byung J.; Voisin, Ronald D., Alignment methods for imprint lithography.
  5. Sreenivasan,Sidlgata V; Watts,Michael P. C.; Choi,Byung Jin; Voisin,Ronald D.; Schumaker,Norman E., Alignment systems for imprint lithography.
  6. Kim, Yong Bum; Kim, Jin Wuk, Apparatus for fabricating flat panel display.
  7. Heidari, Bakak, Apparatus for pattern replication with intermediate stamp.
  8. Choi,Byung Jin; Sreenivasan,Sidlgata V.; Johnson,Stephen C., Apparatus to control displacement of a body spaced-apart from a surface.
  9. Rogers, John A.; Ying, Ming; Bonifas, Andrew; Lu, Nanshu, Appendage mountable electronic devices conformable to surfaces.
  10. Rogers, John A; Ying, Ming; Bonifas, Andrew; Lu, Nanshu, Appendage mountable electronic devices conformable to surfaces.
  11. Cherala,Anshuman; Sreenivasan,Sidlgata V.; Schumaker,Norman E., Applying imprinting material to substrates employing electromagnetic fields.
  12. TeKolste, Robert Dale; Klug, Michael Anthony; Schowengerdt, Brian T., Architectures and methods for outputting different wavelength light out of waveguides.
  13. TeKolste, Robert Dale; Klug, Michael Anthony; Schowengerdt, Brian T., Architectures and methods for outputting different wavelength light out of waveguides.
  14. DiPietro, Richard Anthony; Hart, Mark Whitney; Houle, Frances Anne; Ito, Hiroshi, Aromatic vinyl ether based reverse-tone step and flash imprint lithography.
  15. DiPietro, Richard Anthony; Hart, Mark Whitney; Houle, Frances Anne; Ito, Hiroshi, Aromatic vinyl ether based reverse-tone step and flash imprint lithography.
  16. Meissl, Mario J.; Choi, Byung J., Assembly and method for transferring imprint lithography templates.
  17. Choi, Byung-Jin; Sreenivasan, Sidlgata V., Capillary imprinting technique.
  18. Choi,Byung Jin; Sreenivasan,Sidlgata V.; Watts,Michael P. C., Capillary imprinting technique.
  19. Ghaffari, Roozbeh; Callsen, Gilman; Arora, William J.; Schlatka, Benjamin, Catheter balloon having stretchable integrated circuitry and sensor array.
  20. Cherala, Anshuman; Choi, Byung Jin; Lad, Pankaj B.; Shackleton, Steven C., Chucking system comprising an array of fluid chambers.
  21. Choi,Byung J.; Voisin,Ronald D.; Sreenivasan,Sidlgata V.; Watts,Michael P. C.; Babbs,Daniel; Meissl,Mario J.; Bailey,Hillman; Schumaker,Norman E., Chucking system for modulating shapes of substrates.
  22. Choi,Byung J.; Voisin,Ronald D.; Sreenivasan,Sidlgata V.; Watts,Michael P. C.; Babbs,Daniel; Meissl,Mario J.; Bailey,Hillman; Schumaker,Norman E., Chucking system for modulating shapes of substrates.
  23. Watts,Michael P. C.; Voisin,Ronald D.; Sreenivasan,Sidlgata V., Compliant hard template for UV imprinting.
  24. Rogers,John A.; Menard,Etienne, Composite patterning devices for soft lithography.
  25. Xu, Frank Y., Composition for adhering materials together.
  26. Xu,Frank Y.; Miller,Michael N.; Watts,Michael P. C., Composition for an etching mask comprising a silicon-containing material.
  27. Xu,Frank Y.; Stacey,Nicholas A., Composition to provide a layer with uniform etch characteristics.
  28. Xu, Frank Y.; Miller, Michael N., Composition to reduce adhesion between a conformable region and a mold.
  29. Xu,Frank Y.; Miller,Michael N., Composition to reduce adhesion between a conformable region and a mold.
  30. Willson,C. Grant; Stacey,Nicholas A., Compositions for dark-field polymerization and method of using the same for imprint lithography processes.
  31. Rogers, John; Kim, Dae-Hyeong; Litt, Brian; Viventi, Jonathan, Conformable actively multiplexed high-density surface electrode array for brain interfacing.
  32. Sreenivasan, Sidlgata V.; Choi, Byung-Jin; Voisin, Ronald D., Conforming template for patterning liquids disposed on substrates.
  33. Sreenivasan,Sidlgata V; Choi,Byung J.; Voisin,Ronald D., Conforming template for patterning liquids disposed on substrates.
  34. Brooks, Cynthia B.; LaBrake, Dwayne L.; Khusnatdinov, Niyaz; Miller, Michael N.; Sreenivasan, Sidlgata V.; Lentz, David James; Xu, Frank Y., Critical dimension control during template formation.
  35. Heidari, Babak; Beck, Marc; Riddargrip Beck, legal representative, Helena Eleonora Benedihta, Device and method for large area lithography.
  36. Heidari, Babak; Beck, Marc, Device and method for lithography.
  37. Bailey, Todd C.; Choi, Byung-Jin; Colburn, Matthew E.; Sreenivasan, Sidlgata V.; Willson, Carlton G.; Ekerdt, John G., Device for holding a template for use in imprint lithography.
  38. Gehoski,Kathy A.; Dauksher,William J.; Le,Ngoc V.; Resnick,Douglas J., Direct imprinting of etch barriers using step and flash imprint lithography.
  39. Weller, Dieter; Klemmer, Timothy J.; Lee, Kim Y., Discrete track magnetic media with domain wall pinning sites.
  40. Klug, Michael Anthony; Schowengerdt, Brian T.; Miller, Michael Nevin; Singh, Vikramjit; Peroz, Christophe; St. Hilaire, Pierre; Sun, Jie, Display system with optical elements for in-coupling multiplexed light streams.
  41. Sreenivasan,Sidlgata V., Eliminating printability of sub-resolution defects in imprint lithography.
  42. Rafferty, Conor; Dalal, Mitul, Embedding thin chips in polymer.
  43. Nimmakayala, Pawan Kumar; Choi, Byung-Jin; Rafferty, Tom H.; Schumaker, Philip D., Enhanced multi channel alignment.
  44. Wang,David C.; Xu,Frank Y., Etching technique to planarize a multi-layer structure.
  45. Arora, William J.; Ghaffari, Roozbeh, Extremely stretchable electronics.
  46. Arora, William J.; Ghaffari, Roozbeh, Extremely stretchable electronics.
  47. Arora, William J.; Ghaffari, Roozbeh, Extremely stretchable electronics.
  48. Takeuchi, Yoshiyuki, Film-forming composition for imprinting, method of manufacturing a structure, and structure.
  49. Kim, Ho-Su; Song, Tae-Joon; Kwon, Dhang; Cho, Hang-Sup; Cho, Seong-Pil; Jang, Doo-Hee, Flat panel display device and method of fabricating the same.
  50. Elolampi, Brian; Ghaffari, Roozbeh; de Graff, Bassel; Arora, William; Hu, Xiaolong, Flexible electronic structure.
  51. Chen, Yanfeng; Ge, Haixiong; Li, Zhiwei; Yuan, Changsheng; Lu, Minghui, Flexible nanoimprint mold, method for fabricating the same, and mold usage on planar and curved substrate.
  52. Chen, Yanfeng; Ge, Haixiong; Li, Zhiwei; Yuan, Changsheng; Lu, Minghui, Flexible nanoimprint mold, method for fabricating the same, and mold usage on planar and curved substrate.
  53. Chen, Yanfeng; Ge, Haixiong; Li, Zhiwei; Yuan, Changsheng; Lu, Minghui, Flexible nanoimprint mold, method for fabricating the same, and mold usage on planar and curved substrate.
  54. Choi, Byung J.; Sreenivasan, Sidlgata V., Flexure based macro motion translation stage.
  55. Choi, Byung Jin; Meissl, Mario J.; Sreenivasan, Sidlagata V.; Watts, Michael P. C., Formation of discontinuous films during an imprint lithography process.
  56. Choi,Byung Jin; Meissl,Mario J.; Sreenivasan,Sidlagata V.; Watts,Michael P. C., Formation of discontinuous films during an imprint lithography process.
  57. Sreenivasan, Sidlgata V.; Watts, Michael P. C., Forming a layer on a substrate.
  58. Eldridge, Benjamin N.; Wenzel, Stuart W., Forming tool for forming a contoured microelectronic spring mold.
  59. Watts, Michael P. C., Functional patterning material for imprint lithography processes.
  60. Cao, Han; Tegenfeldt, Jonas O.; Chou, Stephen; Austin, Robert H., Gradient structures interfacing microfluidics and nanofluidics.
  61. Cao, Han; Tegenfeldt, Jonas O.; Chou, Stephen; Austin, Robert H., Gradient structures interfacing microfluidics and nanofluidics, methods for fabrication and uses thereof.
  62. Cao,Han; Tegenfeldt,Jonas O.; Chou,Stephen; Austin,Robert H., Gradient structures interfacing microfluidics and nanofluidics, methods for fabrication and uses thereof.
  63. Choi, Byung Jin; Sreenivasan, Sidlgata V.; Johnson, Stephen C., High precision orientation alignment and gap control stages for imprint lithography processes.
  64. Lu, Xiaoming; Schumaker, Philip D., High throughput imprint based on contact line motion tracking control.
  65. Sreenivasan, Sidlgata V.; Choi, Byung J.; Colburn, Matthew; Bailey, Todd, High-resolution overlay alignment methods for imprint lithography.
  66. Rogers, John A.; Kim, Dae-Hyeong; Omenetto, Fiorenzo; Kaplan, David L.; Litt, Brian; Viventi, Jonathan; Huang, Yonggang; Amsden, Jason, Implantable biomedical devices on bioresorbable substrates.
  67. Rogers, John A.; Kim, Dae-Hyeong; Omenetto, Fiorenzo; Kaplan, David L.; Litt, Brian; Viventi, Jonathan; Huang, Yonggang; Amsden, Jason, Implantable biomedical devices on bioresorbable substrates.
  68. Voisin, Ronald D., Imprint alignment method, system and template.
  69. Voisin, Ronald D., Imprint alignment method, system, and template.
  70. Butler, Hans; Vermeulen, Johannes Petrus Martinus Bernardus; Van Der Wijst, Marc Wilhelmus Maria; Starreveld, Jeroen Pieter; De Hoon, Cornelius Adrianus Lambertus; Debiesme, Francois Xavier, Imprint lithographic apparatus and imprint lithographic method.
  71. De Schiffart, Catharinus; Renkens, Michael Jozef Mathijs; Van Schothorst, Gerard; Jeunink, Andre Bernardus; Van Baars, Gregor Edward; Wuister, Sander Frederik; Kruijt-Stegeman, Yvonne Wendela; Jansen, Norbert Erwin Therenzo; Hardeman, Toon; De Fockert, George Arie Jan; Dijksman, Johan Frederik, Imprint lithography.
  72. Den Boef, Arie Jeffrey, Imprint lithography.
  73. Den Boef, Arie Jeffrey; Banine, Vadim Yevgenyevich; Jeunink, Andre Bernardus; Wuister, Sander Frederik; Kruijt-Stegeman, Yvonne Wendela, Imprint lithography.
  74. Den Boef, Arie Jeffrey; Jeunink, Andre Bernardus; Vermeulen, Johannes Petrus Martinus Bernardus; Smits, Pascal Antonius; Wuister, Sander Frederik; Kruijt-Stegeman, Yvonne Wendela; De Schiffart, Catharinus, Imprint lithography.
  75. Den Boef, Arie Jeffrey; Jeunink, Andre Bernardus; Wuister, Sander Frederik; Kruijt-Stegeman, Yvonne Wendela, Imprint lithography.
  76. Den Boef, Arie Jeffrey; Jeunink, Andre Bernardus; Wuister, Sander Frederik; Kruijt-Stegeman, Yvonne Wendela, Imprint lithography.
  77. Dijksman, Johan Frederik; Wismans, Antonius Johannes Joseph; Pierik, Anke; Vernhout, Martin Maurice; Wuister, Sander Frederik; Kruijt-Stegeman, Yvonne Wendela, Imprint lithography.
  78. Kolesnychenko, Aleksey Yurievich; Van Santen, Helmar; Kruijt-Stegeman, Yvonne, Imprint lithography.
  79. Kolesnychenko, Aleksey Yurievich; Van Santen, Helmar; Kruijt-Stegeman, Yvonne, Imprint lithography.
  80. Kolesnychenko, Aleksey Yurievich; Van Santen, Helmar; Kruijt-Stegeman, Yvonne Wendela, Imprint lithography.
  81. Kolesnychenko, Aleksey Yurievich; Van Santen, Helmar; Kruijt-Stegeman, Yvonne Wendela, Imprint lithography.
  82. Kruijt Stegeman, Yvonne Wendela; Knaapen, Raymond Jacobus; Dijksman, Johan Frederik; Krastev, Krassimir Todorov; Wuister, Sander Frederik; Kolesnychenko, Aleksey Yurievich; Van Der Mast, Karel Diederick; Simon, Klaus, Imprint lithography.
  83. Kruijt Stegeman,Yvonne Wendela; Kolesnychenko,Aleksey Yurievich; Loopstra,Erik Roelof; Dijksman,Johan Frederik; Van Santen,Helmar; Wuister,Sander Frederik, Imprint lithography.
  84. Kruijt-Stegeman, Yvonne Wendela; Den Boef, Arie Jeffrey; Jeunink, Andre Bernardus, Imprint lithography.
  85. Kruijt-Stegeman, Yvonne Wendela; Den Boef, Arie Jeffrey; Jeunink, Andre Bernardus, Imprint lithography.
  86. Kruijt-Stegeman, Yvonne Wendela; Dijksman, Johan Frederik; Kolesnychenko, Aleksey Yurievich; Van Der Mast, Karel Diederick; Simon, Klaus; Knaapen, Raymond Jacobus Wilhelmus; Krastev, Krassimir Todorov; Wuister, Sander Frederik, Imprint lithography.
  87. Kruijt-Stegeman, Yvonne Wendela; Dijksman, Johan Frederik; Kolesnychenko, Aleksey Yurievich; Van Der Mast, Karel Diederick; Simon, Klaus; Knaapen, Raymond Jacobus; Krastev, Krassimir Todorov; Wuister, Sander Frederik, Imprint lithography.
  88. Kruijt-Stegeman, Yvonne Wendela; Dijksman, Johan Frederik; Kolesnychenko, Aleksey Yurievich; Van Der Mast, Karel Diederick; Simon, Klaus; Knaapen, Raymond Jacobus; Krastev, Krassimir Todorov; Wuister, Sander Frederik, Imprint lithography.
  89. Kruijt-Stegeman, Yvonne Wendela; Jeunink, Andre Bernardus; Vermeulen, Johannes Petrus Martinus Bernardus; Wuister, Sander Frederik; Lafarre, Raymond Wilhelmus Louis; De Schiffart, Catharinus; Jansen, Norbert Erwin Therenzo, Imprint lithography.
  90. Kruijt-Stegeman, Yvonne Wendela; Knaapen, Raymond Jacobus Wilhelmus; Dijksman, Johan Frederik; Wuister, Sander Frederik; Schram, Ivar; LaFarre, Raymond Wilhelmus Louis, Imprint lithography.
  91. Kruijt-Stegeman, Yvonne Wendela; Knaapen, Raymond Jacobus Wilhelmus; Dijksman, Johan Frederik; Wuister, Sander Frederik; Schram, Ivar; Lafarre, Raymond Wilhelmus Louis, Imprint lithography.
  92. Kruijt-Stegeman, Yvonne Wendela; Wilhelmus Knaapen, Raymond Jacobus; Lafarre, Raymond Wilhelmus Louis, Imprint lithography.
  93. Lammers, Jeroen Herman; Wuister, Sander Frederik; Koole, Roelof, Imprint lithography.
  94. Lof,Joeri, Imprint lithography.
  95. Meijer, Peter Bartus Leonard; Kolesnychenko, Aleksey Yurievich, Imprint lithography.
  96. Meijer, Peter Bartus Leonard; Kolesnychenko, Aleksey Yurievich, Imprint lithography.
  97. Schram, Ivar; Dijksman, Johan Frederik; Wuister, Sander Frederik; Kruijt-Stegeman, Yvonne Wendela; Lammers, Jeroen Herman; Schroeders, Richard Joseph Marinus, Imprint lithography.
  98. Simon, Klaus, Imprint lithography.
  99. Simon, Klaus, Imprint lithography.
  100. Simon, Klaus, Imprint lithography.
  101. Simon, Klaus, Imprint lithography.
  102. Simon, Klaus, Imprint lithography.
  103. Simon, Klaus, Imprint lithography.
  104. Simon, Klaus, Imprint lithography.
  105. Simon, Klaus, Imprint lithography.
  106. Simon, Klaus; Van Der Mast, Karel Diederick; Dijksman, Johan Frederik, Imprint lithography.
  107. Van Santen, Helmar; Kolesnychenko, Aleksey Yurievich, Imprint lithography.
  108. Van Santen, Helmar; Kolesnychenko, Aleksey Yurievich; Kruijt Stegeman, Yvonne Wendela, Imprint lithography.
  109. Van Santen, Helmar; Kolesnychenko, Aleksey Yurievich; Kruijt-Stegeman, Yvonne Wendela, Imprint lithography.
  110. Van Santen,Helmar; Kolesnychenko,Aleksey Yurievich, Imprint lithography.
  111. Van Santen,Helmar; Kolesnychenko,Aleksey Yurievich; Neijzen,Jacobus Hermanus Maria; Verstegen,Emile, Imprint lithography.
  112. Verschuuren, Marcus Antonius; Wuister, Sander Frederik, Imprint lithography.
  113. Wuister, Sander Frederik, Imprint lithography.
  114. Wuister, Sander Frederik; Banine, Vadim Yevgenyevich, Imprint lithography.
  115. Wuister, Sander Frederik; Banine, Vadim Yevgenyevich; Den Boef, Arie Jeffrey; Kruijt-Stegeman, Yvonne Wendela; Rakhimova, Tatyana Viktorovna; Lopaev, Dmitriy Viktorovich; Glushkov, Denis Alexandrovich; Yakunin, Andrei Mikhailovich; Koole, Roelof, Imprint lithography.
  116. Wuister, Sander Frederik; Den Boef, Arie Jeffrey; Kruijt-Stegeman, Yvonne Wendela, Imprint lithography.
  117. Wuister, Sander Frederik; Dijksman, Johan Frederik; Kruijt-Stegeman, Yvonne Wendela; Schram, Ivar; Lammers, Jeroen Herman; Schroeders, Richard Joseph Marinus, Imprint lithography.
  118. Wuister, Sander Frederik; Kolesnychenko, Aleksey Yurievich; Dijksman, Johan Frederik; Kruijt-Stegeman, Yvonne Wendela; Schram, Ivar, Imprint lithography.
  119. Dijksman, Johan Frederik; Pierik, Anke; Wuister, Sander Frederik; Koole, Roelof, Imprint lithography alignment method and apparatus.
  120. De Schiffart, Catharinus; Jeunink, Andre Bernardus; Vermeulen, Johannes Petrus Martinus Bernardus; Wuister, Sander Frederik; Kruijt-Stegeman, Yvonne Wendela; Jansen, Norbert Erwin Therenzo, Imprint lithography apparatus.
  121. Jeunink, Andre Bernardus; Banine, Vadim Yevgenyevich; Butler, Hans; Van Der Pasch, Engelbertus Antonius Fransiscus; Vermeulen, Johannes Petrus Martinus Bernardus; Kruijt-Stegeman, Yvonne Wendela, Imprint lithography apparatus.
  122. Vermeulen, Johannes Petrus Martinus Bernardus; Jeunink, Andre Bernardus; Kruijt-Stegeman, Yvonne Wendela, Imprint lithography apparatus.
  123. Iosad, Nikolay; Maury, Pascale Anne, Imprint lithography apparatus and method.
  124. Koole, Roelof; Wuister, Sander Frederik, Imprint lithography apparatus and method.
  125. Koole, Roelof; Wuister, Sander Frederik, Imprint lithography apparatus and method.
  126. Lammers, Jeroen Herman; Wuister, Sander Frederik; Kruijt-Stegeman, Yvonne Wendela; Koole, Roelof, Imprint lithography apparatus and method.
  127. Wuister, Sander Frederik, Imprint lithography apparatus and method.
  128. Kruijt Stegeman,Yvonne Wendela; Kolensnychenko,Aleksey Yurievich; Van Santen,Helmar; Loopstra,Erik Roelof, Imprint lithography including alignment.
  129. Kruijt-Stegeman, Yvonne Wendela; Jeunink, Andre Bernardus; Vermeulen, Johannes Petrus Martinus Bernardus, Imprint lithography method.
  130. Wuister, Sander Frederik; Den Boef, Arie Jeffrey, Imprint lithography method.
  131. Xu, Frank Y.; Lad, Pankaj B.; McMackin, Ian Matthew; Truskett, Van Nguyen; Fletcher, Edward Brian, Imprint lithography method.
  132. Xu, Frank Y.; McMackin, Ian Matthew; Lad, Pankaj B., Imprint lithography method.
  133. Dijksman, Johan Frederik; Den Boef, Arie Jeffrey; Wuister, Sander Frederik; Van Der Mark, Martinus Bernardus, Imprint lithography method and apparatus.
  134. Loopstra, Erik Roelof; Kolesnychenko, Aleksey Yurievich; Van Santen, Helmar, Imprint lithography method and apparatus.
  135. Wuister, Sander Frederik; Banine, Vadim Yevgenyevich; Dijksman, Johan Frederik; Kruijt-Stegeman, Yvonne Wendela; Lammers, Jeroen Herman; Koole, Roelof, Imprint lithography method and apparatus.
  136. Wuister, Sander Frederik; Banine, Vadim Yevgenyevich; Dijksman, Johan Frederik; Kruijt-Stegeman, Yvonne Wendela; Lammers, Jeroen Herman; Koole, Roelof, Imprint lithography method and apparatus.
  137. Wuister, Sander Frederik; Dijksman, Johan Frederik; Kruijt-Stegeman, Yvonne Wendela; Lammers, Jeroen Herman; Van Der Tempel, Leendert, Imprint lithography method and apparatus.
  138. Van Der Mark, Martinus Bernardus; Banine, Vadim Yevgenyevich; Jeunink, Andre Bernardus; Dijksman, Johan Frederik; Wuister, Sander Frederik; Peeters, Emiel Andreas Godefridus; Klootwijk, Johan Hendrik; Koole, Roelof; Van Heesch, Christianus Martinus; Mauczok, Ruediger Guenter; Giesbers, Jacobus Bernardus, Imprint lithography method and imprintable medium.
  139. GanapathiSubramanian, Mahadevan; Choi, Byung-Jin; Meissl, Mario Johannes, Imprint lithography system and method.
  140. Sreenivasan,Sidlgata V.; Choi,Byung Jin; Colburn,Matthew E.; Bailey,Todd C., Imprint lithography system to produce light to impinge upon and polymerize a liquid in superimposition with template overlay marks.
  141. Schmid, Gerard M.; Resnick, Douglas J.; Sreenivasan, Sidlgata V.; Xu, Frank Y., Imprint lithography template.
  142. Wuister, Sander Frederik; Kruijt-Stegeman, Yvonne Wendela, Imprint lithography template.
  143. Bailey,Todd C.; Choi,Byung Jin; Colburn,Matthew E.; Sreenivasan,Sidlgata V.; Willson,Carlton G.; Ekerdt,John G., Imprint lithography template having a feature size under 250 nm.
  144. Sreenivasan,Sidlgata V.; Schumaker,Philip D., Imprint lithography template having opaque alignment marks.
  145. McMackin,Ian M.; Lad,Pankaj B.; Truskett,Van N., Imprint lithography template to facilitate control of liquid movement.
  146. Seki, Junichi; Majima, Masao; Suehira, Nobuhito, Imprint method and process for producing a chip that change a relative position between a member to be processed and a support portion.
  147. Okushima, Shingo; Seki, Junichi; Ono, Haruhito; Nakatsuji, Nao; Terasaki, Atsunori, Imprint method for imprinting a pattern of a mold onto a resin material of a substrate and related substrate processing method.
  148. Seki, Junichi; Suehira, Nobuhito, Imprint method, imprint apparatus, and process for producing chip.
  149. Seki, Junichi; Suehira, Nobuhito, Imprint method, imprint apparatus, and process for producing chip.
  150. Sunaga, Tadahiro; Oda, Takashi; Onishi, Hitoshi, Imprint product and method for producing the same.
  151. Liu, Weijun; Stachowiak, Timothy Brian; DeYoung, James P.; Khusnatdinov, Niyaz, Imprint resist and substrate pretreatment for reducing fill time in nanoimprint lithography.
  152. Lee,Heon, Imprint stamp.
  153. Heidari, Babak; Beck, Marc; Keil, Matthias, Imprint stamp comprising cyclic olefin copolymer.
  154. Terada, Shoichi; Kimura, Yoshio; Kitano, Takahiro, Imprint system for performing a treatment on a template.
  155. Dijksman, Johan Frederik; Pierik, Anke; Vernhout, Martin Maurice; Wuister, Sander Frederik; Kruijt-Stegeman, Yvonne Wendela; Schram, Ivar, Imprintable medium dispenser.
  156. Savoy, Steve M.; John, Jeremy J.; Mitchell, Daniel R.; McAleer, Michael K., Imprinted semiconductor multiplex detection array.
  157. Sreenivasan, Sidlgata V.; Choi, Byung-Jin, Imprinting of partial fields at the edge of the wafer.
  158. Den Boef, Arie Jeffrey; Banine, Vadim Yevgenyevich; Wuister, Sander Frederik; Scaccabarozzi, Luigi, Inspection method and apparatus.
  159. Wuister, Sander Frederik, Inspection method and apparatus.
  160. Koole, Roelof, Inspection method for imprint lithography and apparatus therefor.
  161. Nimmakayala,Pawan Kumar; Rafferty,Tom H.; Aghili,Alireza; Choi,Byung Jin; Schumaker,Philip D.; Babbs,Daniel A., Interferometric analysis for the manufacture of nano-scale devices.
  162. Nimmakayala, Pawan Kumar; Rafferty, Tom H.; Aghili, Alireza; Choi, Byung Jin; Schumaker, Philip D.; Babbs, Daniel A.; Truskett, Van N., Interferometric analysis method for the manufacture of nano-scale devices.
  163. Nimmakayala, Pawan Kumar; Rafferty, Tom H.; Aghili, Alireza; Choi, Byung-Jin; Schumaker, Philip D.; Babbs, Daniel A.; Truskett, Van Nguyen, Interferometric analysis method for the manufacture of nano-scale devices.
  164. DeSimone, Joseph M.; Denison Rothrock, Ginger; Maynor, Benjamin W.; Rolland, Jason P., Isolated and fixed micro and nano structures and methods thereof.
  165. DeSimone, Joseph M.; Rothrock, Ginger Denison; Maynor, Benjamin W.; Rolland, Jason P., Isolated and fixed micro and nano structures and methods thereof.
  166. Street,Robert A.; Wong,William S.; Salleo,Alberto; Chabinyc,Michael L., Large area electronic device with high and low resolution patterned film features.
  167. Sreenivasan, Sidlgata V.; Singhal, Shrawan; Choi, Byung Jin; McMackin, Ian Matthew, Large area roll-to-roll imprint lithography.
  168. Schram, Ivar; Dijksman, Johan Frederik; Wuister, Sander Frederik; Kruijt-Stegeman, Yvonne Wendela; Lammers, Jeroen Herman; Schroeders, Richard Joseph Marinus, Lithography meandering order.
  169. Koevoets, Adrianus Hendrik; Renkens, Michael Jozef Mathijs; Wuister, Sander Frederik, Lithography method and apparatus.
  170. Chen, Wei; Harkness, Brian Robert; Sudbury-Holtschlag, Joan; Petroff, Lenin James, Lithography processes using phase change compositions.
  171. Xu, Frank Y.; Chun, Jun Sung; Watts, Michael P. C., Low-K dielectric functional imprinting materials.
  172. Nimmakayala,Pawan K.; Sreenivasan,Sidlgata V.; Choi,Byung Jin; Cherala,Anshuman, Magnification correction employing out-of-plane distortion of a substrate.
  173. Xu, Frank Y.; Watts, Michael P. C.; Stacey, Nicholas A., Materials for imprint lithography.
  174. Beck, Marc, Means for transferring a pattern to an object.
  175. Rogers, John A.; Cao, Qing; Alam, Muhammad; Pimparkar, Ninad, Medium scale carbon nanotube thin film integrated circuits on flexible plastic substrates.
  176. Kuroda,Ryo; Inao,Yasuhisa, Method and apparatus for detecting relative positional deviation between two objects.
  177. Bloess,Harald; Wellhausen,Uwe; Reinig,Peter; Weidner,Peter; Guittet,Pierre Yves; Mantz,Ulrich, Method and apparatus for measuring a surface profile of a sample.
  178. Choi, Byung-Jin; Sreenivasan, Sidlgata V., Method and system for double-sided patterning of substrates.
  179. McMackin,Ian M.; Schumaker,Phillip D.; Choi,Byung Jin; Sreenivasan,Sidlgata V.; Watts,Michael P. C., Method and system to measure characteristics of a film disposed on a substrate.
  180. Xu, Frank Y., Method for adhering materials together.
  181. Xu, Frank; McMackin, Ian; Lad, PanKaj B.; Watts, Michael P. C., Method for controlling distribution of fluid components on a body.
  182. Schumaker, Philip D., Method for detecting a particle in a nanoimprint lithography system.
  183. Choi, Byung J.; Sreenivasan, Sidlgata V., Method for determining characteristics of substrate employing fluid geometries.
  184. Choi, Byung-Jin; GanapathiSubramanian, Mahadevan; Choi, Yeong-jun; Meissl, Mario J., Method for expelling gas positioned between a substrate and a mold.
  185. Choi, Byung-Jin; Sreenivasan, Sidlgata V.; McMackin, Ian M.; Lad, Pankaj B., Method for expelling gas positioned between a substrate and a mold.
  186. Choi, Byung-Jin; Sreenivasan, Sidlgata V.; McMackin, Ian Matthew; Lad, Pankaj B., Method for expelling gas positioned between a substrate and a mold.
  187. Nam, Yeon Heui; Kim, Jin Wuk, Method for fabricating an LCD device.
  188. Watts,Michael P. C.; Sreenivasan,Sidlgata V., Method for fabricating bulbous-shaped vias.
  189. Willson, Carlton Grant; Sreenivasan, Sidlgata V.; Bonnecaze, Roger T., Method for fabricating nanoscale patterns in light curable compositions using an electric field.
  190. McMackin, Ian M.; Lad, Pankaj B.; Truskett, Van N., Method for fast filling of templates for imprint lithography using on template dispense.
  191. Jackson, Warren; Taussig, Carl; Mei, Ping, Method for forming an electronic device.
  192. Beck, Marc; Heidari, Babak; Bolmsjö, Erik; Theander, Erik, Method for imprint lithography at constant temperature.
  193. Sreenivasan, Sidlgata V.; Bonnecaze, Roger T.; Willson, Carlton Grant, Method for imprint lithography using an electric field.
  194. Xu, Frank Y.; Sreenivasan, Sidlgata V.; Fletcher, Edward Brian, Method for imprint lithography utilizing an adhesion primer layer.
  195. Terasaki, Atsunori; Seki, Junichi; Tanaka, Ichiro, Method for manufacturing semiconductor device by using dual damascene process and method for manufacturing article having communicating hole.
  196. Terasaki,Atsunori; Seki,Junichi; Tanaka,Ichiro, Method for manufacturing semiconductor device by using dual damascene process and method for manufacturing article having communicating hole.
  197. Sato, Tamaki, Method for manufacturing structure.
  198. Choi, Byung J.; Voisin, Ronald D.; Sreenivasan, Sidlgata V.; Watts, Michael P. C.; Willson, C. Grant; Schumaker, Norman E.; Meissl, Mario J., Method for modulating shapes of substrates.
  199. Choi, Byung-Jin; Sreenivasan, Sidlgata V.; Willson, Carlton Grant; Colburn, Mattherw E.; Bailey, Todd C.; Ekerdt, John G., Method of automatic fluid dispensing for imprint lithography processes.
  200. Sreenivasan,Sidlgata V.; Xu,Frank Y., Method of compensating for a volumetric shrinkage of a material disposed upon a substrate to form a substantially planar structure therefrom.
  201. Sreenivasan, Sidlgata V.; McMackin, Ian M.; Melliar-Smith, Christopher Mark; Choi, Byung-Jin, Method of concurrently patterning a substrate having a plurality of fields and a plurality of alignment marks.
  202. LaBrake,Dwayne L., Method of controlling the critical dimension of structures formed on a substrate.
  203. McMackin, Ian M.; Stacey, Nicholas A.; Babbs, Daniel A.; Voth, Duane J.; Watts, Mathew P. C.; Truskett, Van N.; Xu, Frank Y.; Voisin, Ronald D.; Lad, Pankaj B., Method of creating a turbulent flow of fluid between a mold and a substrate.
  204. Sreenivasan,Sidlgata V.; Choi,Byung Jin; Colburn,Matthew E.; Bailey,Todd C., Method of determining alignment of a template and a substrate having a liquid disposed therebetween.
  205. Dijksman, Johan Frederik; Pierik, Anke; Vernhout, Martin Maurice; Wuister, Sander Frederik; Kruijt-Stegeman, Yvonne Wendela; Schram, Ivar, Method of dispensing imprintable medium.
  206. Sreenivasan,Sidlgata V., Method of forming a recessed structure employing a reverse tone process.
  207. Vidusek,David A.; Sreenivasan,Sidlgata V.; Wang,David C., Method of forming an in-situ recessed structure.
  208. Sreenivasan,Sidlgata V., Method of forming stepped structures employing imprint lithography.
  209. Miller,Michael N.; Stacey,Nicholas A., Method of patterning surfaces while providing greater control of recess anisotropy.
  210. Sreenivasan,Sidlgata V., Method of planarizing a semiconductor substrate with an etching chemistry.
  211. Xu, Frank Y.; Lad, Pankaj B.; McMackin, Ian M.; Truskett, Van N.; Fletcher, Edward B., Method of providing desirable wetting and release characteristics between a mold and a polymerizable composition.
  212. Rubin, Daniel I., Method of reducing pattern distortions during imprint lithography processes.
  213. Choi, Byung Jin; Cherala, Anshuman; Babbs, Daniel A., Method of retaining a substrate to a wafer chuck.
  214. Sreenivasan, Sidlgata V.; Watts, Michael P. C., Method to arrange features on a substrate to replicate features having minimal dimensional variability.
  215. Choi, Yeong-Jun; Choi, Byung-Jin, Method to control an atmosphere between a body and a substrate.
  216. Choi,Byung Jin; Xu,Frank Y.; Stacey,Nicholas A.; Truskett,Van Xuan Hong; Watts,Michael P. C., Method to reduce adhesion between a conformable region and a pattern of a mold.
  217. Truskett,Van N.; Mackay,Christopher J.; Choi,B. Jin, Method to reduce adhesion between a polymerizable layer and a substrate employing a fluorine-containing layer.
  218. Meissl, Mario J.; Choi, Byung J.; Babbs, Daniel; Bailey, Hillman L., Method, system and holder for transferring templates during imprint lithography processes.
  219. de Graff, Bassel; Arora, William J.; Callsen, Gilman; Ghaffari, Roozbeh, Methods and applications of non-planar imaging arrays.
  220. Nuzzo, Ralph G.; Rogers, John A.; Menard, Etienne; Lee, Keon Jae; Khang, Dahl-Young; Sun, Yugang; Meitl, Matthew; Zhu, Zhengtao, Methods and devices for fabricating and assembling printable semiconductor elements.
  221. Nuzzo, Ralph G.; Rogers, John A.; Menard, Etienne; Lee, Keon Jae; Khang, Dahl-Young; Sun, Yugang; Meitl, Matthew; Zhu, Zhengtao, Methods and devices for fabricating and assembling printable semiconductor elements.
  222. Nuzzo, Ralph G.; Rogers, John A.; Menard, Etienne; Lee, Keon Jae; Khang, Dahl-Young; Sun, Yugang; Meitl, Matthew; Zhu, Zhengtao, Methods and devices for fabricating and assembling printable semiconductor elements.
  223. Nuzzo, Ralph G.; Rogers, John A.; Menard, Etienne; Lee, Keon Jae; Khang, Dahl-Young; Sun, Yugang; Meitl, Matthew; Zhu, Zhengtao, Methods and devices for fabricating and assembling printable semiconductor elements.
  224. Nuzzo, Ralph G.; Rogers, John A.; Menard, Etienne; Lee, Keon Jae; Khang, Dahl-Young; Sun, Yugang; Meitl, Matthew; Zhu, Zhengtao, Methods and devices for fabricating and assembling printable semiconductor elements.
  225. Nuzzo, Ralph G.; Rogers, John A.; Menard, Etienne; Lee, Keon Jae; Khang, Dahl-Young; Sun, Yugang; Meitl, Matthew; Zhu, Zhengtao, Methods and devices for fabricating and assembling printable semiconductor elements.
  226. DeSimone, Joseph M.; Rolland, Jason P.; Rothrock, Ginger M. Denison; Resnick, Paul, Methods and materials for fabricating microfluidic devices.
  227. DeSimone, Joseph M.; Rolland, Jason P.; Rothrock, Ginger M. Denison; Resnick, Paul, Methods and materials for fabricating microfluidic devices.
  228. Nilsson, Jakob; Keil, Matthias; Ring, Johan; Heidari, Babak, Methods and processes for modifying polymer material surface interactions.
  229. DeSimone, Joseph M.; Rolland, Jason P.; Maynor, Benjamin W.; Euliss, Larkin E.; Rothrock, Ginger Denison; Dennis, Ansley E.; Samulski, Edward T.; Samulski, R. Jude, Methods for fabricating isolated micro- and nano-structures using soft or imprint lithography.
  230. DeSimone, Joseph M.; Rolland, Jason P.; Maynor, Benjamin W.; Euliss, Larken E.; Rothrock, Ginger Denison; Dennis, Ansley E.; Samulski, Edward T.; Samulski, R. Jude, Methods for fabricating isolated micro- or nano-structures using soft or imprint lithography.
  231. DeSimone, Joseph M.; Rolland, Jason P.; Maynor, Benjamin W.; Euliss, Larken E.; Rothrock, Ginger Denison; Dennis, Ansley E.; Samulski, Edward T.; Samulski, R. Jude, Methods for fabricating isolated micro- or nano-structures using soft or imprint lithography.
  232. DeSimone, Joseph M.; Rolland, Jason P.; Maynor, Benjamin W.; Euliss, Larken E.; Rothrock, Ginger Denison; Dennis, Ansley E; Samulski, Edward T.; Samulski, R. Jude, Methods for fabricating isolated micro-and nano-structures using soft or imprint lithography.
  233. Xu,Frank Y.; Stacey,Nicholas E.; Watts,Michael P. C.; Thompson,Ecron D., Methods for fabricating patterned features utilizing imprint lithography.
  234. Choi, Byung J.; Colburn, Matthew; Sreenivasan, S. V.; Willson, C. Grant; Bailey, Todd; Ekerdt, John, Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography.
  235. Voisin,Ronald D., Methods of inspecting a lithography template.
  236. Cao, Han; Deshpande, Parikshit A.; Austin, Michael D.; Boyce-Jacino, Michael, Methods of macromolecular analysis using nanochannel arrays.
  237. Rogers, John A.; Kocabas, Coskun; Shim, Moonsub; Kang, Seong Jun; Park, Jang-Ung, Methods of making spatially aligned nanotubes and nanotube arrays.
  238. Voisin,Ronald D., Methods of manufacturing a lithography template.
  239. Miller, Michael N.; Xu, Frank Y.; Stacey, Nicholas A., Micro-conformal templates for nanoimprint lithography.
  240. McMackin,Ian M.; Lad,Pankaj B., Moat system for an imprint lithography template.
  241. Terasaki, Atsunori; Seki, Junichi; Suehira, Nobuhito; Ina, Hideki; Okushima, Shingo, Mold, imprint method, and process for producing a chip.
  242. Terasaki,Atsunori; Seki,Junichi; Suehira,Nobuhito; Ina,Hideki; Okushima,Shingo, Mold, imprint method, and process for producing chip.
  243. Liu, Weijun; Xu, Frank Y., Nano-imprint lithography stack with enhanced adhesion between silicon-containing and non-silicon containing layers.
  244. Menezes, Marlon, Nano-imprint lithography templates.
  245. Ellenson,James E.; Hostetler,Timothy S.; Tong,William M., Nano-imprinted photonic crystal waveguide.
  246. Austin, Robert H.; Yu, Zhaoning; Tegenfeldt, Jonas O.; Chou, Stephen Y.; Cao, Han, Nanochannel arrays and their preparation and use for high throughput macromolecular analysis.
  247. Austin, Robert H.; Yu, Zhaoning; Tegenfeldt, Jonas O.; Chou, Stephen Y.; Cao, Han, Nanochannel arrays and their preparation and use for high throughput macromolecular analysis.
  248. Austin, Robert H.; Yu, Zhaoning; Tegenfeldt, Jonas O.; Chou, Stephen Y.; Cao, Han, Nanochannel arrays and their preparation and use for high throughput macromolecular analysis.
  249. Austin, Robert H; Yu, Zhaoning; Tegenfeldt, Jonas O; Chou, Stephen Y; Cao, Han, Nanochannel arrays and their preparation and use for high throughput macromolecular analysis.
  250. Chou, Stephen Y.; Cao, Han; Austin, Robert H.; Yu, Zhaoning; Tegenfeldt, Jonas O., Nanochannel arrays and their preparation and use for high throughput macromolecular analysis.
  251. Berggren, Karl K.; Harrer, Stefan; Salvatore, Giovanni A.; Yang, Joel K., Nanotemplate arbitrary-imprint lithography.
  252. Rogers, John A., Optical component array having adjustable curvature.
  253. Rogers, John; Nuzzo, Ralph; Meitl, Matthew; Menard, Etienne; Baca, Alfred J.; Motala, Michael; Ahn, Jong-Hyun; Park, Sang-II; Yu, Chang-Jae; Ko, Heung-Cho; Stoykovich, Mark; Yoon, Jongseung, Optical systems fabricated by printing-based assembly.
  254. Rogers, John; Nuzzo, Ralph; Meitl, Matthew; Menard, Etienne; Baca, Alfred J.; Motala, Michael; Ahn, Jong-Hyun; Park, Sang-Il; Yu, Chang-Jae; Ko, Heung Cho; Stoykovich, Mark; Yoon, Jongseung, Optical systems fabricated by printing-based assembly.
  255. Rogers, John; Nuzzo, Ralph; Meitl, Matthew; Menard, Etienne; Baca, Alfred; Motala, Michael; Ahn, Jong-Hyun; Park, Sang-Il; Yu, Chang-Jae; Ko, Heung Cho; Stoykovich, Mark; Yoon, Jongseung, Optical systems fabricated by printing-based assembly.
  256. Rogers, John; Nuzzo, Ralph; Meitl, Matthew; Menard, Etienne; Baca, Alfred; Motala, Michael; Ahn, Jong-Hyun; Park, Sang-Il; Yu, Chang-Jae; Ko, Heung Cho; Stoykovich, Mark; Yoon, Jongseung, Optical systems fabricated by printing-based assembly.
  257. Heidari, Babak; Löfstrand, Anette; Bolmsjö, Erik; Theander, Erik; Beck, Marc, Pattern replication with intermediate stamp.
  258. Sreenivasan, Sidlgata V., Pattern reversal employing thick residual layers.
  259. Tokita, Toshinobu; Ota, Hirohisa; Kawakami, Eigo; Kasumi, Kazuyuki; Nakamura, Takashi, Pattern transferring mold, pattern transferring apparatus and device manufacturing method using the same.
  260. Sreenivasan, Sidlgata V.; Schumaker, Philip D., Patterning a plurality of fields on a substrate to compensate for differing evaporation times.
  261. Stacey,Nicholas A.; Sreenivasan,Sidlgata V.; Miller,Michael N., Patterning substrates employing multi-film layers defining etch-differential interfaces.
  262. Choi, Byung-Jin; Sreenivasan, Sidlgata V., Patterning substrates employing multiple chucks.
  263. Kawaguchi, Yasuhide; Asakawa, Akihiko, Photocurable composition, micropattern-formed product and its production process.
  264. DeSimone, Joseph M.; Rolland, Jason P.; Quake, Stephen R.; Schorzman, Derek A.; Yarbrough, Jason; Van Dam, Michael, Photocurable perfluoropolyethers for use as novel materials in microfluidic devices.
  265. Xu, Frank Y.; Liu, Weijun; Fletcher, Edward Brian; Sreenivasan, Sidlgata V.; Choi, Byung Jin; Khusnatdinov, Niyaz; Cherala, Anshuman; Selinidis, Kosta S., Porous template and imprinting stack for nano-imprint lithography.
  266. Sreenivasan,Sidlgata V., Positive tone bi-layer imprint lithography method.
  267. Sreenivasan, Sidlgata V., Positive tone bi-layer method.
  268. Nuzzo, Ralph G.; Rogers, John A.; Menard, Etienne; Lee, Keon Jae; Khang, Dahl-Young; Sun, Yugang; Meitl, Matthew; Zhu, Zhengtao; Ko, Heung Cho; Mack, Shawn, Printable semiconductor structures and related methods of making and assembling.
  269. Nuzzo, Ralph G.; Rogers, John A.; Menard, Etienne; Lee, Keon Jae; Khang, Dahl-Young; Sun, Yugang; Meitl, Matthew; Zhu, Zhengtao; Ko, Heung Cho; Mack, Shawn, Printable semiconductor structures and related methods of making and assembling.
  270. Nuzzo, Ralph G.; Rogers, John A.; Menard, Etienne; Lee, Keon Jae; Khang, Dahl-Young; Sun, Yugang; Meitl, Matthew; Zhu, Zhengtao; Ko, Heung Cho; Mack, Shawn, Printable semiconductor structures and related methods of making and assembling.
  271. Rogers, John A.; Kim, Tae Ho; Choi, Won Mook; Kim, Dae Hyeong; Meitl, Matthew; Menard, Etienne; Carlisle, John, Printable, flexible and stretchable diamond for thermal management.
  272. Rogers, John A.; Nuzzo, Ralph; Kim, Hoon-sik; Brueckner, Eric; Park, Sang Il; Kim, Rak Hwan, Printed assemblies of ultrathin, microscale inorganic light emitting diodes for deformable and semitransparent displays.
  273. Rogers, John A.; Nuzzo, Ralph; Kim, Hoon-sik; Brueckner, Eric; Park, Sang Il; Kim, Rak Hwan, Printed assemblies of ultrathin, microscale inorganic light emitting diodes for deformable and semitransparent displays.
  274. Simon, Klaus, Printing apparatus and device manufacturing method.
  275. Simon, Klaus, Printing apparatus and device manufacturing method.
  276. Keil, Matthias; Nilsson, Jakob; Ring, Johan; Heidari, Babak, Process and method for modifying polymer film surface interaction.
  277. Terasaki, Atsunori; Seki, Junichi; Suehira, Nobuhito; Ina, Hideki; Okushima, Shingo, Process for producing a chip using a mold.
  278. Terasaki, Atsunori; Seki, Junichi; Suehira, Nobuhito; Ina, Hideki; Okushima, Shingo, Process for producing a chip using a mold.
  279. DiPietro, Richard Anthony; Hart, Mark Whitney; Houle, Frances Anne; Ito, Hiroshi, Processes and materials for step and flash imprint lithography.
  280. DiPietro,Richard Anthony; Hart,Mark Whitney; Houle,Frances Anne; Ito,Hiroshi, Processes and materials for step and flash imprint lithography.
  281. Kasumi, Kazuyuki; Ota, Hirohisa; Kawakami, Eigo; Nakamura, Takashi; Tokita, Toshinobu, Processing apparatus.
  282. Kasumi,Kazuyuki; Ota,Hirohisa; Kawakami,Eigo; Nakamura,Takashi; Tokita,Toshinobu, Processing apparatus.
  283. Tokita, Toshinobu; Ota, Hirohisa; Kawakami, Eigo; Nakamura, Takashi; Kasumi, Kazuyuki, Processing apparatus.
  284. Seki, Junichi; Majima, Masao; Suehira, Nobuhito, Processing apparatus, processing method, and process for producing chip.
  285. Tokita, Toshinobu; Ota, Hirohisa; Kawakami, Eigo; Kasumi, Kazuyuki, Processing method.
  286. Ghaffari, Roozbeh; Schlatka, Benjamin; Callsen, Gilman; de Graff, Bassel, Protective cases with integrated electronics.
  287. Xu, Frank Y.; Liu, Weijun, Release agent partition control in imprint lithography.
  288. Chou, Stephen Y., Release surfaces, particularly for use in nanoimprint lithography.
  289. Choi,Byung Jin; Sreenivasan,Sidlgata V.; Johnson,Stephen C., Remote center compliant flexure device.
  290. Stachowiak, Timothy Brian; Liu, Weijun; Khusnatdinov, Niyaz; Ye, Zhengmao; Ito, Toshiki, Removing substrate pretreatment compositions in nanoimprint lithography.
  291. Jones, Christopher Ellis; Khusnatdinov, Niyaz; Johnson, Stephen C.; Schumaker, Philip D.; Lad, Pankaj B., Residual layer thickness measurement and correction.
  292. Sreenivasan,Sidlgata V.; Stacey,Nicholas A., Reverse tone patterning on surfaces having planarity perturbations.
  293. Watts,Michael P. C.; McMackin,Ian, Scatterometry alignment for imprint lithography.
  294. Schmid, Gerard M.; Stacey, Nicholas A; Resnick, Douglas J.; Voisin, Ronald D.; Myron, Lawrence J., Self-aligned process for fabricating imprint templates containing variously etched features.
  295. Stasiak,James; Peters,Kevin, Sensor produced using imprint lithography.
  296. Lee,Heon, Silicon carbide imprint stamp.
  297. McMackin,Ian M.; Stacey,Nicholas A.; Babbs,Daniel A.; Voth,Duane J.; Watts,Michael P. C.; Truskett,Van N.; Xu,Frank Y.; Voisin,Ronald D.; Lad,Pankaj B., Single phase fluid imprint lithography method.
  298. Xu, Frank Y.; Khusnatdinov, Niyaz, Single phase fluid imprint lithography method.
  299. Liu, Weijun; Xu, Frank Y.; Fletcher, Edward Brian, Solvent-assisted layer formation for imprint lithography.
  300. Houle, Frances Anne; Ito, Hiroshi, Stabilization of vinyl ether materials.
  301. Houle,Frances Anne; Ito,Hiroshi, Stabilization of vinyl ether materials.
  302. Willson, Carlton Grant; Colburn, Matthew Earl, Step and flash imprint lithography.
  303. Sreenivasan, Sidlgata V.; Choi, Byung J.; Schumaker, Norman E.; Voisin, Ronald D.; Watts, Michael P. C.; Meissl, Mario J., Step and repeat imprint lithography processes.
  304. Sreenivasan,Sidlgata V.; Choi,Byung J.; Schumaker,Norman E.; Voisin,Ronald D.; Watts,Michael P. C.; Meissl,Mario J., Step and repeat imprint lithography processes.
  305. Sreenivasan, Sidlgata V.; Watts, Michael P. C.; Choi, Byung Jin; Meissl, Mario J.; Schumaker, Norman E.; Voisin, Ronald D., Step and repeat imprint lithography systems.
  306. Rogers, John A.; Huang, Yonggang; Ko, Heung Cho; Stoykovich, Mark; Choi, Won Mook; Song, Jizhou; Ahn, Jong Hyun; Kim, Dae Hyeong, Stretchable and foldable electronic devices.
  307. Rogers, John A; Huang, Yonggang; Ko, Heung Cho; Stoykovich, Mark; Choi, Won Mook; Song, Jizhou; Ahn, Jong Hyun; Kim, Dae Hyeong, Stretchable and foldable electronic devices.
  308. Rogers, John A; Huang, Yonggang; Ko, Heung Cho; Stoykovich, Mark; Choi, Won Mook; Song, Jizhou; Ahn, Jong Hyun; Kim, Dae Hyeong, Stretchable and foldable electronic devices.
  309. Rogers, John A.; Khang, Dahl-Young; Sun, Yugang; Menard, Etienne, Stretchable form of single crystal silicon for high performance electronics on rubber substrates.
  310. Rogers, John A.; Khang, Dahl-Young; Sun, Yugang; Menard, Etienne, Stretchable form of single crystal silicon for high performance electronics on rubber substrates.
  311. Rogers, John A.; Khang, Dahl-Young; Sun, Yugang; Menard, Etienne, Stretchable form of single crystal silicon for high performance electronics on rubber substrates.
  312. Rogers, John A.; Khang, Dahl-Young; Sun, Yugang; Menard, Etienne, Stretchable form of single crystal silicon for high performance electronics on rubber substrates.
  313. Rogers, John A.; Khang, Dahl-Young; Sun, Yugang; Menard, Etienne, Stretchable form of single crystal silicon for high performance electronics on rubber substrates.
  314. Heidari,Babak, Substrate for and a process in connection with the product of structures.
  315. Fairbairn, Kevin P.; Barnes, Michael S.; Bluck, Terry; Xu, Ren; Liu, Charles; Kerns, Ralph, System and method for commercial fabrication of patterned media.
  316. Barnes, Michael S.; Bluck, Terry, System and method for dual-sided sputter etch of substrates.
  317. Barnes, Michael S.; Bluck, Terry, System and method for dual-sided sputter etch of substrates.
  318. Shackleton,Steven C.; McMackin,Ian M.; Lad,Pankaj B.; Truskett,Van N., System for controlling a volume of material on a mold.
  319. McMackin,Ian M.; Stacey,Nicholas A.; Babbs,Daniel A.; Voth,Duane J.; Watts,Mathew P. C.; Truskett,Van N.; Xu,Frank Y.; Voisin,Ronald D.; Lad,Pankaj B., System for creating a turbulent flow of fluid between a mold and a substrate.
  320. Choi,Byung J.; Sreenivasan,Sidlgata V., System for determining characteristics of substrates employing fluid geometries.
  321. Watts,Michael P. C.; Choi,Byung Jin; Sreenivasan,Sidlgata V., System for dispensing liquids.
  322. Schumaker, Philip D.; Fancello, Angelo; Kim, Jae H.; Choi, Byung-Jin; Babbs, Daniel A., System to transfer a template transfer body between a motion stage and a docking plate.
  323. Choi,Byung Jin; Sreenivasan,Sidlgata V.; Meissl,Mario J., Systems for magnification and distortion correction for imprint lithography processes.
  324. De Graff, Bassel; Ghaffari, Roozbeh; Arora, William J., Systems, methods, and devices having stretchable integrated circuitry for sensing and delivering therapy.
  325. de Graff, Bassel; Ghaffari, Roozbeh; Arora, William J., Systems, methods, and devices having stretchable integrated circuitry for sensing and delivering therapy.
  326. Ghaffari, Roozbeh; de Graff, Bassel; Callsen, Gilman; Arora, William J.; Schlatka, Benjamin; Kuznetsov, Eugene, Systems, methods, and devices using stretchable or flexible electronics for medical applications.
  327. GanapathiSubramanian, Mahadevan; Choi, Byung-Jin; Miller, Michael N.; Stacey, Nicholas A., Technique for separating a mold from solidified imprinting material.
  328. Bailey, Todd; Choi, Byung J.; Colburn, Matthew; Sreenivasan, S. V.; Willson, C. Grant; Ekerdt, John, Template for room temperature, low pressure micro-and nano-imprint lithography.
  329. Selinidis, Kosta S.; Choi, Byung-Jin; Schmid, Gerard M.; Thompson, Ecron D.; McMackin, Ian Matthew, Template having alignment marks formed of contrast material.
  330. Sreenivasan, Sidlgata V.; Schumaker, Philip D.; McMackin, Ian M., Tessellated patterns in imprint lithography.
  331. Rogers, John A.; Kim, Hoon-Sik; Huang, Yonggang, Thermally managed LED arrays assembled by printing.
  332. Saito,Wataru; Yamashita,Yudai, Thin film transistor and method for manufacturing the same.
  333. Rogers, John A.; Omenetto, Fiorenzo G.; Hwang, Suk-Won; Tao, Hu; Kim, Dae-Hyeong; Kaplan, David, Transient devices designed to undergo programmable transformations.
  334. Rogers, John A.; Kim, Rak-Hwan; Kim, Dae-Hyeong; Kaplan, David L.; Omenetto, Fiorenzo G., Waterproof stretchable optoelectronics.
  335. Polito, Benjamin F.; Gates, Holly G.; Sachs, Emanuel M., Wedge imprint patterning of irregular surface.
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