$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Substrate fixturing device 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • A47G-019/08
출원번호 US-0226194 (1999-01-07)
발명자 / 주소
  • Hooshang Jahani
  • Scott R. Bruner
  • Peter F. Smith
출원인 / 주소
  • Tooltek Engineering Corporation
대리인 / 주소
    Burns Doane Swecker & Mathis LLP
인용정보 피인용 횟수 : 11  인용 특허 : 43

초록

A fixturing device which supports a substrate or a plurality of substrates in a vertical orientation during cleaning, drying, and coating processing steps while minimizing the contact surfaces between the fixture and each substrate so that a maximum of the substrate surface is exposed. The fixturing

대표청구항

1. A combination of a substrate and a substrate holder, the substrate holder comprising:a mandrel having a slotted portion and a mounting portion; and a plurality of substrate support slots perpendicular to an axis extending longitudinally along a length of said mandrel, each of the substrate suppor

이 특허에 인용된 특허 (43)

  1. Coberly Robert A. (Alta Loma CA) Beck Mark J. (Cucamonga CA) Azlin Dan S. (Brea CA) Gifford Karl J. (Nashville TN), Apparatus for cleaning rinsing and drying substrates.
  2. Lewis Paul E. (San Jose CA), Apparatus for evaporatively coating objects with a predetermined thickness profile.
  3. Dalencon Andre (Paris FR), Basket for handling machine parts.
  4. Mhlfriedal Eberhard (Maulbronn DEX) Kbelbeck Armin (Bensheim DEX) Gerisch Torsten (Karlsruhe DEX) Appich Karl (Sternenfels DEX) Szekeresch Jakob (Pforzheim DEX) Kallis Martin (Mhlacker DEX), Capillary device for lacquering or coating plates or disks.
  5. Swain Eugene A. (Webster NY) Schmitt Peter J. (Ontario NY), Chuck assembly having a controlled vent.
  6. Dodds John Joseph, Coated conduit outlet fitting and method and apparatus for forming a coated conduit outlet fitting.
  7. Watanabe Masaru,JPX, Coating device and a method ofcoating.
  8. Thomas Mark S. (Williamson NY) Fox Ronald E. (Penn Yan NY) Petropoulos Mark C. (Ontario NY) Pietrzykowski ; Jr. Stanley J. (Rochester NY), Dip coating method having intermediate bead drying step.
  9. Akagawa Minoru (Fremont CA), Disk guide for a disk handling system.
  10. Mortensen Roger L. (Victoria MN), Disk processing cassette.
  11. Hooper ; Joel R., Magnetic holding apparatus and methods of constructing and utilizing same.
  12. Tam Johann (Santa Clara CA), Method and apparatus for drying wafers.
  13. Thebault Jacques (Bordeaux FRX) Laxague Michel (Bordeaux FRX) Rey Jacques (Merignac FRX) Delaval Rodolphe (St. Martin au Laert FRX) Palavit Gerard (Douai FRX), Method for applying an anti-oxidative coating on brake disks of a carbon-containing composite material.
  14. Chambers John S. (Rochester NY) Godlove Ronald E. (Bergen NY) Yuh Huoy-Jen (Pittsford NY) Leenhouts Timothy J. (Fairport NY) Forgit Rachael A. (Rochester NY) Cosgrove Robert T. (Rochester NY), Method for handling and dipping flexible belts using a spring and shaft assembly.
  15. Shank Brian E. (Rothsville PA) Shaubach Robert M. (Lititz PA), Polished surface capillary grooves.
  16. Schuster Johann (Emmerting DEX) Mller Horst (Emmerting DEX) Vorbuchner Helmut (Burghausen DEX) Maier Anton (Burghausen DEX) Pradl Ferdinand (Burghausen DEX), Process for preparing hydrophobic particulate solids containing Si-OH groups and a process for using the same.
  17. Allen Ronald (San Jose CA) Chen Tu (Saratoga CA), Robotic disk handler system.
  18. Butler Robert M. (Tempe AZ), Semiconductor wafer transfer apparatus and method.
  19. Lee Steven N. (Irvine CA), Side lifting wafer boat assembly.
  20. Wu Hong Jen (Hsin chu TWX) Chen Taylor (Hsin chu TWX) Lai Jack (Hsin chu TWX) Chen I. I. (Hsin chu TWX), Single semiconductor wafer transfer method and manufacturing system.
  21. Haafkens Maarten H. (Deurne NLX) Sielcken Marinus O. (Eindhoven NLX), Substrate carrier.
  22. Belanger ; Jr. Thomas D. (Clarendon Hills IL), Substrate carrier device.
  23. Fujikawa Kazunori,JPX ; Yasui Kenji,JPX ; Nishizawa Hisao,JPX, Substrate holder.
  24. Hasegawa Norio,JPX, Support jig for thin circular objects.
  25. Kakizaki Takeyoshi,JPX ; Hyobu Yukihiro,JPX, Thin-plate supporting container.
  26. Worden Raymond D. (P. O. Box 36010 Houston TX 77036), Transfer device.
  27. Tanaka Takashi (Hadano JPX) Yoshikawa Jun (Sagamihara JPX) Toya Eiichi (Nishiokitama JPX) Kitazawa Atsuo (Nishiokitama JPX) Meguro Kazunori (Oomiya JPX) Nozawa Tatsuo (Nishiokitama JPX) Ishizuka Yuta, Vertical boat and a method for making the same.
  28. Koons John J. (Georgetown TX), Vertical boat for holding semiconductor wafers.
  29. Lee Eui-Wan (Eggertsville NY), Wafer boat.
  30. Lee Steven N. (Irvine CA), Wafer boat.
  31. Cota Marlo E. (Scottsdale AZ), Wafer carrier.
  32. Williams Randall S., Wafer carrier.
  33. Armstrong Richard J. (Phoenix AZ), Wafer carrier and method.
  34. Kudo Hideo (Fukushima JPX) Uchiyama Isao (Fukushima JPX), Wafer cleaning tank.
  35. Ohdate Mituo (Fukuoka JPX), Wafer hanger useful for thermally treating semiconductor wafers.
  36. Uchiyama Isao (Fukushima-ken JPX) Kudo Hideo (Fukushima-ken JPX), Wafer holder.
  37. Thompson Raymon F. (Kalispell MT) Owczarz Aleksander (Kalispell MT), Wafer holder with flexibly mounted gripping fingers.
  38. Mortensen Roger L. (Chanhassen MN), Wafer processing cassette.
  39. Mortensen Roger L. (Victoria MN), Wafer processing cassette.
  40. Han Suk-Bin,KRX, Wafer supporting and/or conveying apparatus.
  41. Hodos Julian (Howard Beach NY), Wafer transport module with rotatable and horizontally extendable wafer holder.
  42. Kijima Tetsuo (Tokyo JPX) Shinohara Seigo (Kanagawa-ken JPX) Yusa Sachiko (Gunma-ken JPX), Water repellent for window panes of automobiles and method of repelling water on the window panes.
  43. Mayer Alfred (Somerville NJ), Wettable carrier in gas drying system for wafers.

이 특허를 인용한 특허 (11)

  1. Niese,Matthias; Franzke,J철rg; Schweckendiek,J체rgen, Device for accomodating substrates.
  2. Abdul Rashid, Ahmad Faisul B. HJ.; Gregory, Landdell, Mandrel for substrate transport system with notch.
  3. Allen, Joseph, Manufacturing single-sided storage media.
  4. Chen, Jack, Method of making a high surface area electrode.
  5. Ettinger, Gary C.; Khau, Michael E.; Shin, Ho Seon, Methods and apparatus for drying a substrate.
  6. Loo, John, Semiconductor workpiece apparatus.
  7. Rebstock, Lutz, Substrate carrier having drip edge configurations.
  8. Nakashima, Mikio, Substrate processing apparatus.
  9. Guo, Xing-Cai; Marchon, Bruno, System, method and apparatus to prevent the formation of lubricant lines on magnetic media.
  10. Bonora, Anthony C., Workpiece structures and apparatus for accessing same.
  11. Bonora, Anthony C., Workpiece support structures and apparatus for accessing same.
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로