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[미국특허] Apparatus and method for conditioning a fixed abrasive polishing pad in a chemical mechanical planarization process 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B24B-053/00
출원번호 US-0607895 (2000-06-30)
발명자 / 주소
  • Mike Ravkin
  • Katrina Mikhaylich
  • Don E. Anderson
출원인 / 주소
  • Lam Research Corporation
대리인 / 주소
    Brinks Hofer Gilson & Lione
인용정보 피인용 횟수 : 37  인용 특허 : 34

초록 ▼

A method and apparatus for conditioning a fixed abrasive polishing pad used in chemical mechanical planarization of semiconductor wafers is described. The apparatus includes a conditioning member formed from glass, at least one collimated hole structure located within the conditioning member, wherei

대표청구항 ▼

1. An apparatus for conditioning a fixed abrasive polishing pad used in chemical mechanical planarization of semiconductor wafers, the apparatus comprising:a fixed abrasive polishing pad; a conditioning member formed from glass positioned adjacent the fixed abrasive polishing pad and adapted to enga

이 특허에 인용된 특허 (34) 인용/피인용 타임라인 분석

  1. Rutherford Denise R. (Stillwater MN) Goetz Douglas P. (St. Paul MN) Thomas Cristina U. (Woodbury MN) Webb Richard J. (Inver Grove Heights MN) Bruxvoort Wesley J. (Woodbury MN) Buhler James D. (Shring, Abrasive construction for semiconductor wafer modification.
    상세보기
  2. Southwick Scott A., Apparatus and method for refurbishing fixed-abrasive polishing pads used in chemical-mechanical planarization of semicon.
    상세보기
  3. Hoshizaki Jon A. ; Williams Roger O. ; Buhler James D. ; Reichel Charles A. ; Hollywood William K. ; De Geus Richard ; Lee Lawrence L., Apparatus for chemical mechanical polishing.
    상세보기
  4. Kreager Douglas P. ; Lee Junedong, Apparatus for conditioning polishing pads.
    상세보기
  5. Phillips James D. (Posen MI), Apparatus for trueing CBN abrasive belts and grinding wheels.
    상세보기
  6. Lund Douglas E. (13304 Purple Sage Dallas TX 75240), Automatic chemical and mechanical polishing system for semiconductor wafers.
    상세보기
  7. Smith Robert K. (52 Drayton Street Bowden ; 5007 AUX), Belt cleaner.
    상세보기
  8. Mohr Larry D. (5936 S. Dorsey La. Tempe AZ 85282), Belt cleaning apparatus.
    상세보기
  9. Somekh Sasson, Chemical mechanical polishing with multiple polishing pads.
    상세보기
  10. Birang Manoocher ; Prince John, End effector for pad conditioning.
    상세보기
  11. Talieh Homayoun (Santa Clara County CA) Weldon David Edwin (Santa Cruz County CA), Linear polisher and method for semiconductor wafer planarization.
    상세보기
  12. Trojan Daniel R. ; Lee Lawrence L., Low profile, low hysteresis force feedback gimbal system for chemical mechanical polishing.
    상세보기
  13. Pant Anil K. ; Young Douglas W. ; Breivogel Joseph R. ; Volodarski Konstantin ; Volfovski Leon, Method and apparatus for aligning and tensioning a pad/belt used in linear planarization for chemical mechanical polishi.
    상세보기
  14. Labunsky Michael ; Huynh Tac ; Meyer Anthony ; Nagengast Andrew ; Travis Glenn W., Method and apparatus for conditioning a polishing pad used in chemical mechanical planarization.
    상세보기
  15. Breivogel Joseph R. (Aloha OR) Price Matthew J. (Portland OR) Barns Christopher E. (Portland OR), Method and apparatus for conditioning a semiconductor polishing pad.
    상세보기
  16. Cadien Kenneth C. (Portland OR) Yau Leopoldo D. (Portland OR), Method and apparatus for conditioning of chemical-mechanical polishing pads.
    상세보기
  17. Robinson Karl M., Method and apparatus for conditioning polishing pads used in mechanical and chemical-mechanical planarization of substra.
    상세보기
  18. Ravkin Michael A. ; Ravkin Ilya A. ; Verhovsky Yuli, Method and apparatus for improved conditioning of polishing pads.
    상세보기
  19. Lankford David, Method and apparatus for planarizing microelectronic substrates and conditioning planarizing media.
    상세보기
  20. Hoshizaki Jon A. ; Williams Roger O. ; Buhler James D. ; Reichel Charles A. ; Hollywood William K. ; de Geus Richard ; Lee Lawrence L., Method for chemical mechanical polishing.
    상세보기
  21. Mattingly Wayne A. (Rio Rancho NM) Morimoto Seiichi (Beaverton OR) Preston Spencer E. (Portland OR), Method for conditioning the surface of a polishing pad.
    상세보기
  22. Meikle Scott G. (Boise ID) Marty Lucky F. (Scottsdale AZ), Method for selectively reconditioning a polishing pad used in chemical-mechanical planarization of semiconductor wafers.
    상세보기
  23. Bruxvoort Wesley J. ; Culler Scott R. ; Ho Kwok-Lun ; Kaisaki David A. ; Kessel Carl R. ; Klun Thomas P. ; Kranz Heather K. ; Messner Robert P. ; Webb Richard J. ; Williams Julia P., Method of modifying an exposed surface of a semiconductor wafer.
    상세보기
  24. Gill Gerald L., Pad conditioner.
    상세보기
  25. Baldy Andr (Seyssins FRX) Barrois Grard (Le Fontanil FRX) Blanc Henri (Saint Julien de Ratz FRX) Dominiak Marcel (Grenoble FRX), Polishing machine having a taut microabrasive strip and an improved wafer support head.
    상세보기
  26. Talieh Homayoun (San Jose CA) Weldon David E. (Los Gatos CA), Polishing pad cluster for polishing a semiconductor wafer.
    상세보기
  27. Appel Andrew T. (Dallas TX) Chisholm Michael F. (Plano TX), Semiconductor substrate conditioning head having a plurality of geometries formed in a surface thereof for pad condition.
    상세보기
  28. Pant Anil K. ; Breivogel Joseph R. ; Young Douglas W. ; Jairath Rahul ; Engdahl Erik H., Sensors for a linear polisher.
    상세보기
  29. Leach Michael A. (Bristol VT) Paulsen James K. (Jericho VT) Machesney Brian J. (Burlington VT) Venditti Daniel J. (Essex Junction VT) Whitaker Christopher R. (Jericho VT), System for mechanical planarization.
    상세보기
  30. Mogi Katsumi (Omiya JPX) Endo Osamu (Omiya JPX), Truing apparatus for wafer polishing pad.
    상세보기
  31. Klievoneit Harold R. (Phoenix AZ) Smith Arthur A. (Tucson AZ), Wafer grinder.
    상세보기
  32. Talieh Homayoun (San Jose CA) Weldon David E. (Los Gatos CA) Nagorski Boguslaw A. (San Jose CA), Wafer polishing machine with fluid bearings.
    상세보기
  33. Weldon David E. (Los Gatos CA) Nagorski Boguslaw A. (San Jose CA) Talieh Homayoun (San Jose CA), Wafer polishing machine with fluid bearings and drive systems.
    상세보기
  34. Simpson Steven C. (Kansas City MO) Witt Ronald D. (Kansas City MO) Volkland Gregory E. (Merriam KS), Wide belt sander cleaning device.
    상세보기

이 특허를 인용한 특허 (37) 인용/피인용 타임라인 분석

  1. Celikkaya,Ahmet; Anderson,Thomas J., AIO-LaO-YO-MgO ceramics, and methods of making the same.
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  2. Rosenflanz, Anatoly Z., Abrasive particles and methods of making and using the same.
    상세보기
  3. Rosenflanz,Anatoly Z.; Celikkaya,Ahmet; Anderson,Thomas J., Abrasive particles, abrasive articles, and methods of making and using the same.
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  4. Rosenflanz,Anatoly Z.; Celikkaya,Ahmet; Anderson,Thomas J., Abrasive particles, and methods of making and using the same.
    상세보기
  5. Rosenflanz,Anatoly Z., AlO-YO-ZrO/HfOmaterials, and methods of making and using the same.
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  6. Rosenflanz, Anatoly Z., AlO-rare earth oxide-ZrO/HfOmaterials, and methods of making and using the same.
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  7. Rosenflanz, Anatoly Z.; Celikkaya, Ahmet; Anderson, Thomas J., Ceramic fibers and composites comprising same.
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  8. Rosenflanz, Anatoly Z.; Endres, Berkan K.; Anderson, Thomas J., Ceramic materials and methods of making and using the same.
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  9. Rosenflanz,Anatoly Z., Ceramic materials, abrasive particles, abrasive articles, and methods of making and using the same.
    상세보기
  10. Rosenflanz,Anatoly Z.; Schardt,Craig R., Ceramics comprising AIO, YO, ZrOand/or HfO, and NbOand/or TaOand methods of making the same.
    상세보기
  11. Rosenflanz,Anatoly Z.; Schardt,Craig R., Ceramics comprising AlO, REO, ZrOand/or HfO, and NbOand/or TaOand methods of making the same.
    상세보기
  12. Rosenflanz,Anatoly Z.; Schardt,Craig R., Ceramics comprising AlO, REO, ZrOand/or HfO, and NbOand/or TaOand methods of making the same.
    상세보기
  13. Rosenflanz,Anatoly Z.; Schardt,Craig R., Ceramics comprising AlO, YO, ZrOand/or HfO, and NbOand/or TaOand methods of making the same.
    상세보기
  14. Rosenflanz,Anatoly Z.; Endres,Berkan K.; Anderson,Thomas J., Ceramics, and methods of making and using the same.
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  15. Endres,Berkan K.; Anderson,Thomas J.; Rosenflanz,Anatoly Z., Composite articles and methods of making the same.
    상세보기
  16. Butterfield,Paul D.; Chen,Liang Yuh; Hu,Yongqi; Manens,Antoine P.; Mavliev,Rashid; Tsai,Stan D.; Liu,Feng Q.; Wadensweiler,Ralph, Conductive polishing article for electrochemical mechanical polishing.
    상세보기
  17. Butterfield,Paul; Chen,Liang Yuh; Hu,Yongqi; Manens,Antoine; Mavliev,Rashid; Tsai,Stan, Contacts for electrochemical processing.
    상세보기
  18. Rosenflanz,Anatoly Z., Glass-ceramics.
    상세보기
  19. Gagliardi,John J.; Rueb,Chris J., In situ activation of a three-dimensional fixed abrasive article.
    상세보기
  20. Rosenflanz, Anatoly Z., Metal oxide ceramic and method of making articles therewith.
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  21. Renteln, Peter; Jensen, Alan J.; Lamb, David S., Method and apparatus for conditioning fixed-abrasive polishing pads.
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  22. Jensen, Alan J.; Stella, Mario; Zhao, Eugene; Renteln, Peter; Farber, Jeffrey, Method and apparatus for controlling CMP pad surface finish.
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  23. Jensen, Alan J.; Stella, Mario; Zhao, Eugene; Renteln, Peter; Farber, Jeffrey, Method and apparatus for controlling CMP pad surface finish.
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  24. Boyd, John M., Method and apparatus for fixed-abrasive substrate manufacturing and wafer polishing in a single process path.
    상세보기
  25. Rosenflanz, Anatoly Z.; Celikkaya, Ahmet; Anderson, Thomas J., Method of making amorphous and ceramics via melt spinning.
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  26. Rosenflanz,Anatoly Z.; Celikkaya,Ahmet; Anderson,Thomas J., Method of making amorphous materials and ceramics.
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  27. Rosenflanz, Anatoly Z., Method of making ceramic articles.
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  28. Celikkaya,Ahmet; Anderson,Thomas J., Methods of making AlO-SiOceramics.
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  29. Celikkaya,Ahmet; Anderson,Thomas J., Methods of making AlO-SiOceramics.
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  30. Celikkaya, Ahmet; Anderson, Thomas J., Methods of making ceramic particles.
    상세보기
  31. Gotkis, Yehiel; Charatan, Robert, Multiple-conditioning member device for chemical mechanical planarization conditioning.
    상세보기
  32. Rosenflanz,Anatoly Z.; Celikkaya,Ahmet; Anderson,Thomas J., Plasma spraying.
    상세보기
  33. Hishiki,Seigo, Polishing pad.
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  34. Kiermasz, Adrian, Polishing pad conditioning and polishing liquid dispersal system.
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  35. Charatan, Robert, Polishing pad conditioning system.
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  36. Towery, Daniel Lynne, Static pad conditioner.
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  37. Towery,Daniel Lynne, Static pad conditioner.
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