초록 ▼

A Method for Improving the efficiency of a silicon purification process is by controlling the temperature and composition of the effluent to a feedstock recovery composition and temperature, rapidly quenching the effluent at or near the recovery composition, separating the gases from the liquids, se

A Method for Improving the efficiency of a silicon purification process is by controlling the temperature and composition of the effluent to a feedstock recovery composition and temperature, rapidly quenching the effluent at or near the recovery composition, separating the gases from the liquids, sending the gases to conventional hydrogen recovery and recycle facilities, separating the hydrohalosilanes from silicon tetrahalide, returning the hydrohalosilanes to the inlet of the deposition reactor, using all or some of the silicon tetrahalide to control the composition and temperature of the effluent and separately heating the hydrogen and any silicon tetrahalide returned to the decomposition reactor to a temperature greater than 400 C. and separately injecting them into the decomposition reactor.

대표청구항 ▼

1. A method for improving the efficiency of a silicon purification process comprising:providing a silicon deposition reactor; feeding a first source gas containing one or more hydrohalosilanes into the silicon deposition reactor; producing a deposit of silicon and a first effluent gas having less hy

1. A method for improving the efficiency of a silicon purification process comprising:providing a silicon deposition reactor; feeding a first source gas containing one or more hydrohalosilanes into the silicon deposition reactor; producing a deposit of silicon and a first effluent gas having less hydrohalosilanes than the first source gas; feeding said first effluent gas to a recovery reactor; controlling the first effluent gas temperature to a range of 800-1100.degree. C.; causing a change in composition to a second effluent gas containing more hydrohalosilanes than the first effluent gas; and rapidly quenching the second effluent gas to a temperature of less than 400.degree. C. to essentially maintain the hydrohalosilanes.