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Replicating a nanoscale pattern 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B29D-011/00
출원번호 US-0441915 (1999-11-17)
발명자 / 주소
  • Nick J. Visovsky
  • David D. Wang
출원인 / 주소
  • Corning Incorporated
대리인 / 주소
    Peter Rogalskyj
인용정보 피인용 횟수 : 122  인용 특허 : 5

초록

A method of replicating a nanoscale pattern which comprises forming the pattern on the outer surface of a cylindrical roller, providing a surface upon which the pattern is to be replicated, and transferring the nanoscale pattern from the cylindrical roller onto the surface to provide at least one re

대표청구항

1. A method of producing a metal nanoscale pattern on a glass substrate which comprises:providing a patterned nanoscale mold; providing a cylindrical roller having a deformable coating on the surface thereof; using the patterned mold to form the pattern in the deformable coating on the outer surface

이 특허에 인용된 특허 (5)

  1. Kumar Amit (Sacramento CA) Whitesides George M. (Newton MA), Formation of microstamped patterns on surfaces and derivative articles.
  2. Ferrante Ronald A. (Ridgecrest CA), Method of making near infrared polarizers.
  3. Kuwabara Kazuhiro (Hitachi JPX) Mori Yuji (Hitachi JPX) Mikami Yoshiro (Hitachi JPX), Method of manufacturing a thin-film pattern on a substrate.
  4. Haisma Jan (Eindhoven NLX) Verheijen Martinus (Eindhoven NLX) Schrama Johannes T. (Eindhoven NLX), Method of providing a patterned relief of cured photoresist on a flat substrate surface and device for carrying out such.
  5. Chou Stephen Y., Nanoimprint lithography.

이 특허를 인용한 특허 (122)

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