초록

A barrier layer for a silicon containing substrate which inhibits the formation of gaseous species of silicon when exposed to a high temperature aqueous environment comprises a barium-strontium alumino silicate.

대표청구항 ▼

1. A method for preparing an article comprising the steps of:providing a substrate comprising silicon; and applying a gaseous species of Si inhibiting barrier layer to the substrate wherein the barrier layer has a crystallographic structure which is at least 5.0% by volume celsian and inhibits the f

1. A method for preparing an article comprising the steps of:providing a substrate comprising silicon; and applying a gaseous species of Si inhibiting barrier layer to the substrate wherein the barrier layer has a crystallographic structure which is at least 5.0% by volume celsian and inhibits the formation of a gaseous species of Si when the article is exposed to a high temperature, aqueous environment and wherein the coefficient of thermal expansion of the barrier layer is within .+-.3.0 ppm/.degree. C. the coefficient of thermal expansion of the substrate.