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Perimeter wafer lifting 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B23Q-007/00
출원번호 US-0944255 (2001-08-30)
발명자 / 주소
  • Eric H. Lenz
출원인 / 주소
  • Lam Research Corporation
대리인 / 주소
    Beyer Weaver & Thomas, LLP
인용정보 피인용 횟수 : 53  인용 특허 : 9

초록 ▼

The invention relates to an apparatus for lifting a substrate from a surface of a chuck subsequent to a processing step. The apparatus includes a perimeter pin for lifting the substrate from the surface of the chuck to a first position wherein the substrate is disposed on the perimeter pin during li

대표청구항 ▼

1. A method of removing a substrate from a surface of a work piece holder in a substrate process chamber, said method comprising:producing a holding force between said substrate and said surface during processing; breaking said holding force by lifting said substrate away from said surface to a firs

이 특허에 인용된 특허 (9)

  1. Takizawa Takeshi (Kunitachi JPX), Apparatus and method for supporting a substrate.
    상세보기
  2. Harashima Keiichi (Tokyo JPX) Akimoto Takeshi (Tokyo JPX), Electrostatic chuck with mechanism for lifting up the peripheral of a substrate.
    상세보기
  3. Aoyama Masaaki (Kanagawa JPX) Kimura Keiichi (Kanagawa JPX), Holding apparatus for holding an article such as a semiconductor wafer.
    상세보기
  4. Osada Tomoaki (Tokyo JPX) Shirai Yasuyuki (Tokyo JPX), Mechanism and method for mechanically removing a substrate.
    상세보기
  5. Yang Renyi, Method for use in bonding a chip to a substrate.
    상세보기
  6. Lenz Eric H., Perimeter wafer lifting.
    상세보기
  7. Sumnitsch Franz,ATX, Rotary chuck including pins for lifting wafers.
    상세보기
  8. Takabayashi Yukio,JPX, Substrate holding system and exposure apparatus using the same.
    상세보기
  9. Getchel Paul A. ; Cole ; Sr. Kenneth M. ; Lyden Henry A. ; Stone William M. ; Lopez Robert ; Schey Thomas ; Butcher Dana G., Workpiece chuck.
    상세보기

이 특허를 인용한 특허 (53)

  1. Caldwell,Brian Neal; Jeffer,Raymond Walter; Kindt,Louis M., Adaptive electrostatic pin chuck.
    상세보기
  2. Yokomizo,Kenji, Apparatus and method of securing a workpiece during high-pressure processing.
    상세보기
  3. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of a workpiece.
    상세보기
  4. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of multiple workpieces.
    상세보기
  5. Bettencourt, Gregory R.; Bhattacharyya, Gautam; Eng., Simon Gosselin; Chao, Sandy; de la Llera, Anthony; Mankidy, Pratik, Clamped monolithic showerhead electrode.
    상세보기
  6. Patrick, Roger; Bettencourt, Gregory R.; Kellogg, Michael C., Clamped monolithic showerhead electrode.
    상세보기
  7. Patrick, Roger; Bettencourt, Gregory R.; Kellogg, Michael C., Clamped monolithic showerhead electrode.
    상세보기
  8. Patrick, Roger; Bettencourt, Gregory R.; Kellogg, Michael C., Clamped monolithic showerhead electrode.
    상세보기
  9. Kadkhodayan, Babak; Dhindsa, Rajinder; de la Llera, Anthony; Kellogg, Michael C., Clamped showerhead electrode assembly.
    상세보기
  10. Kadkhodayan, Babak; Dhindsa, Rajinder; de la Llera, Anthony; Kellogg, Michael C., Clamped showerhead electrode assembly.
    상세보기
  11. Jones,William Dale, Control of fluid flow in the processing of an object with a fluid.
    상세보기
  12. Chen, Hsiang-Hung, Device and method for picking up optical elements.
    상세보기
  13. de la Llera, Anthony; Mankidy, Pratik, Edge-clamped and mechanically fastened inner electrode of showerhead electrode assembly.
    상세보기
  14. de la Llera, Anthony; Mankidy, Pratik, Edge-clamped and mechanically fastened inner electrode of showerhead electrode assembly.
    상세보기
  15. Bettencourt, Gregory R.; Bhattacharyya, Gautam; Eng, Simon Gosselin; Chao, Sandy, Gasket with positioning feature for clamped monolithic showerhead electrode.
    상세보기
  16. Bettencourt, Gregory R.; Bhattacharyya, Gautam; Gosselin, Simon; Chao, Sandy, Gasket with positioning feature for clamped monolithic showerhead electrode.
    상세보기
  17. Sheydayi,Alexei; Sutton,Thomas, Gate valve for plus-atmospheric pressure semiconductor process vessels.
    상세보기
  18. Fischer,Andreas, Heat transfer system for improved semiconductor processing uniformity.
    상세보기
  19. Sutton, Thomas R.; Biberger, Maximilan A., High pressure compatible vacuum chuck for semiconductor wafer including lift mechanism.
    상세보기
  20. Jones, William D., High pressure fourier transform infrared cell.
    상세보기
  21. Biberger, Maximilian A.; Layman, Frederick Paul; Sutton, Thomas Robert, High pressure processing chamber for semiconductor substrate.
    상세보기
  22. Biberger,Maximilian A.; Layman,Frederick Paul; Sutton,Thomas Robert, High pressure processing chamber for semiconductor substrate.
    상세보기
  23. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
    상세보기
  24. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
    상세보기
  25. Kelekar, Rajesh, Internal rinsing in touchless interstitial processing.
    상세보기
  26. Willwerth, Michael D.; Palagashvili, David, Low force substrate lift.
    상세보기
  27. Sheydayi,Alexei, Method and apparatus for clamping a substrate in a high pressure processing system.
    상세보기
  28. Goshi,Gentaro, Method and apparatus for cooling motor bearings of a high pressure pump.
    상세보기
  29. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method and apparatus for supercritical processing of multiple workpieces.
    상세보기
  30. Parent,Wayne M.; Goshi,Gentaro, Method and system for cooling a pump.
    상세보기
  31. Parent,Wayne M., Method and system for determining flow conditions in a high pressure processing system.
    상세보기
  32. Parent, Wayne M.; Geshell, Dan R., Method and system for passivating a processing chamber.
    상세보기
  33. Hansen,Brandon; Lowe,Marie, Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid.
    상세보기
  34. Kawamura,Kohei; Asano,Akira; Miyatani,Koutarou; Hillman,Joseph T.; Palmer,Bentley, Method for supercritical carbon dioxide processing of fluoro-carbon films.
    상세보기
  35. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method for supercritical processing of multiple workpieces.
    상세보기
  36. Biberger,Maximilian Albert; Layman,Frederick Paul; Sutton,Thomas Robert, Method of supercritical processing of a workpiece.
    상세보기
  37. Sheydayi,Alexei, Non-contact shuttle valve for flow diversion in high pressure systems.
    상세보기
  38. Green, Revvie A., Piezoelectric wafer clamping system.
    상세보기
  39. Okita, Shogo; Asakura, Hiromi; Watanabe, Syouzou; Wada, Toshihiro; Okune, Mitsuhiro; Hiroshima, Mitsuru, Plasma processing apparatus and plasma processing method.
    상세보기
  40. Lee, William Davis, Platen with multiple shaped grounding structures.
    상세보기
  41. Sheydayi,Alexei, Pressure energized pressure vessel opening and closing device and method of providing therefor.
    상세보기
  42. Wuester,Christopher D., Process flow thermocouple.
    상세보기
  43. Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.
    상세보기
  44. Kadkhodayan, Babak; Dhindsa, Rajinder; de la Llera, Anthony; Kellogg, Michael C., Showerhead electrode.
    상세보기
  45. de la Llera, Anthony; Mankidy, Pratik; Kellogg, Michael C.; Dhindsa, Rajinder, Showerhead electrode.
    상세보기
  46. Kadkhodayan, Babak; de la Llera, Anthony, Showerhead electrode with centering feature.
    상세보기
  47. Yudovsky, Joseph, Spring-loaded pins for susceptor assembly and processing methods using same.
    상세보기
  48. Sahoda, Tsutomu; Shimai, Futoshi; Sato, Akihiko, Substrate processing system, carrying device and coating device.
    상세보기
  49. Sahoda, Tsutomu; Shimai, Futoshi; Sato, Akihiko, Substrate processing system, carrying device, and coating device.
    상세보기
  50. Gale,Glenn; Hillman,Joseph T.; Jacobson,Gunilla; Palmer,Bentley, System and method for processing a substrate using supercritical carbon dioxide processing.
    상세보기
  51. Jacobson,Gunilla; Yellowaga,Deborah, Treatment of a dielectric layer using supercritical CO.
    상세보기
  52. Kevwitch, Robert, Treatment of substrate using functionalizing agent in supercritical carbon dioxide.
    상세보기
  53. Sheydayi,Alexei, Vacuum chuck utilizing sintered material and method of providing thereof.
    상세보기

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