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Method for treating a substrate with heat sensitive agents 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23G-001/02
출원번호 US-0312775 (1999-05-14)
발명자 / 주소
  • Steven L. Nelson
  • Kurt K. Christenson
출원인 / 주소
  • FSI International, Inc.
대리인 / 주소
    Kagan Binder, PLLC
인용정보 피인용 횟수 : 17  인용 특허 : 58

초록 ▼

The present invention provides a method for treating a substrate, or a plurality of substrates, so that the treatment thereof is enhanced. In particular, the method includes the steps of causing a heated liquid to contact the substrate(s) and causing a processing liquid to contact the substrate(s).

대표청구항 ▼

1. A method of treating a substrate comprising the steps ofcausing a heated liquid to contact the substrate in a manner effective to heat at least a portion of the substrate; and causing a processing liquid to contact the heated substrate, wherein the processing liquid comprises a heat sensitive age

이 특허에 인용된 특허 (58)

  1. Bergman Eric J. ; Hess Mignon P., Apparatus and method for processing the surface of a workpiece with ozone.
    상세보기
  2. Bergman Eric J. ; Hess Mignon P., Apparatus and method for processing the surface of a workpiece with ozone.
    상세보기
  3. Ury Michael G. (Bethesda MD) Matthews John C. (Gaithersburg MD) Rounds Stuart N. (Germantown MD), Apparatus for photoresist stripping.
    상세보기
  4. Matthews Robert Roger, Apparatus for the treatment of semiconductor wafers in a fluid.
    상세보기
  5. Mashimo Noriyoshi (Tokyo JPX) Okumura Katsuya (Yokohama JPX), Arrangement for cleaning semiconductor wafers using mixer.
    상세보기
  6. Aigo Seiichiro (3-15-13 ; Negishi ; Daito-ku Tokyo JPX), Bubbler device for washing semiconductor materials.
    상세보기
  7. Nakajima Kazuo (Shiga-ken JPX) Tanaka Katsunori (Shiga-ken JPX), Chemical agent producing device and method thereof.
    상세보기
  8. Louthan Rector P. (Bartlesville OK), Combination reaction vessel and aspirator-mixer.
    상세보기
  9. Rees Darci L. (4431 Jay St. Duluth MN 55802) George Michael (4431 Jay St. Duluth MN 55802), Continuous process and apparatus for generation of ozone for industrial application with cryogenic refrigeration.
    상세보기
  10. Page John K. R. (Camberley GBX) Kalthod Dilip G. (St. Louis MO), Control of dissolved gases in liquids.
    상세보기
  11. Schick Robert P. (Amherst NY), Cooling water ozonation system.
    상세보기
  12. Jackson David P. (Saugus CA), Dense fluid photochemical process for substrate treatment.
    상세보기
  13. Yoneda Kenji,JPX, Equipment for cleaning, etching and drying semiconductor wafer and its using method.
    상세보기
  14. Wiesmann Rudolf (Gossau CHX), Equipment for gassing a liquid and process for operating the equipment.
    상세보기
  15. Ohno, Reiko; Matsuoka, Terumi, Film removing method and film removing agent.
    상세보기
  16. Park Jin Y. (Moscow ID), Fine line pattern formation by aerosol centrifuge etching technique.
    상세보기
  17. Reid Philip L. (Rte. 2 ; Box 422 Duncan SC 29334), Gas humidification apparatus.
    상세보기
  18. Tremont Peter L. (Spring TX) Ackermann Arthur J. (Kirkwood MO), Integrated circuit manufacturing process.
    상세보기
  19. Clark R. Scot (Fallbrook CA) Baird Stephen S. (Vista CA) Hoffman Joe G. (Cardiff-By-The-Sea CA), Manufacture of high precision electronic components with ultra-high purity liquids.
    상세보기
  20. Clark R. Scot ; Baird Stephen S. ; Hoffman Joe G., Manufacture of high precision electronic components with ultra-high purity liquids.
    상세보기
  21. Murphy Oliver J. (Bryan TX) Hitchens G. Duncan (Bryan TX), Method and apparatus for electrochemical production of ozone.
    상세보기
  22. Omi Tadahiro (Miyagi JPX) Shimada Makoto (Tokyo JPX) Sawamoto Isao (Kanagawa JPX), Method and apparatus for sterilization of and treatment with ozonized water.
    상세보기
  23. Johnson Dennis E. J. (1025 Garfield Ave. Aurora IL 60506), Method and device for in-line mass dispersion transfer of a gas flow into a liquid flow.
    상세보기
  24. Inoue Makoto (Yokohama JPX), Method for manufacturing an oxide of semiconductor.
    상세보기
  25. Matthews John C. (Gaithersburg MD) Wooten Robert D. (Rockville MD) Ferris David S. (Washington DC) Rounds Stuart N. (Germantown MD), Method for photoresist stripping using reverse flow.
    상세보기
  26. Kashiwase Masaharu (Okayama JPX) Matsuoka Terumi (Okayama JPX), Method for removing organic film.
    상세보기
  27. Goffredo Daniel L. (Riverton NJ) Shakely Conrad Dale (Spring Mills PA), Method for treatment fluid application and removal.
    상세보기
  28. Aoki Hidemitsu (Tokyo JPX) Morita Makoto (Tokyo JPX) Tsuji Mikio (Tokyo JPX), Method for wet processing of a semiconductor substrate.
    상세보기
  29. Brock James R. (Austin TX) Trachtenberg Isaac (Austin TX), Method of aerosol jet etching.
    상세보기
  30. Nagahiro Jinzo (54-24 ; Wakamiya 2-chome Nakano-ku ; Tokyo JPX) Higuchi Ken (Saitama JPX) Ohama Yasunori (Saitama JPX), Method of and apparatus for producing a high concentration ozone water solution.
    상세보기
  31. Koizumi Kootaroo (Kodaira JPX) Tsunekawa Sukeyoshi (Tokorozawa JPX) Kawasumi Kenichi (Oume JPX) Kimura Takeshi (Higashimurayama JPX) Funatsu Keisuke (Hamura JPX), Method of and apparatus for removing an organic film.
    상세보기
  32. Pittner Gregory A. (Yorba Linda CA) Crabtree Larry L. (Lincolnshire IL), Method of preferentially removing oxygen from ozonated water.
    상세보기
  33. Ikeda Akira (Hyogo JPX) Nakatsugawa Naoki (Hyogo JPX) Yoshimura Yumiko (Hyogo JPX) Tanimura Yasuhiro (Hyogo JPX) Ezaki Kenji (Hyogo JPX), Microorganism removing method.
    상세보기
  34. Carter Lawrence E. ; Nelson Steven L., Organic removal process.
    상세보기
  35. Bullock Donald (31 Logging Hill Rd. Concord NH 03301), Oxidation saturation device.
    상세보기
  36. Frosch Robert A. Administrator of the National Aeronautics and Space Administration ; with respect to an invention of ( Duarte CA) Humphrey Marshall F. (Duarte CA) French Kenneth R. (La Canada CA) Ho, Ozonation of cooling tower waters.
    상세보기
  37. Wasinger Eric (551 Boyd St. Wichita KS 67212) Hall David (Auburn AL 36830), Ozone decolorization of garments.
    상세보기
  38. Wong Sik-Lam ; Shea James Howard, Ozone generator with enhanced output.
    상세보기
  39. Sawamoto Isao (Kanagawa JPX), Ozone water treatment method and apparatus.
    상세보기
  40. Schellenberger Wilhelm,DEX ; Herrmannsdorfer Dieter,DEX, Procedure for the drying of silicon.
    상세보기
  41. Schwarzl Karl (Mitterndorf-Traukirchen AUX), Process and an arrangement for preparing ozonic gases and solutions.
    상세보기
  42. Sawamoto Isao (Kanagawa JPX) Nishiki Yoshinori (Kanagawa JPX), Process and apparatus for producing high concentrating ozone water.
    상세보기
  43. Matthews Robert R. (Richmond CA), Process and apparatus for the treatment of semiconductor wafers in a fluid.
    상세보기
  44. Damann Franz-Josef (21 ; Dammstrasse D-4791 Lichtenau-Henglarn DEX), Process and device for the dissolution of gas in liquid.
    상세보기
  45. Sugino Rinshi (Atsugi JPX) Ito Takashi (Kawasaki JPX), Process for cleaning surface of semiconductor substrate.
    상세보기
  46. Lampert Ingolf (Burghausen DEX) Gratzl Christa (Neuotting DEX), Process for the wet-chemical surface treatment of semiconductor wafers.
    상세보기
  47. Ross ; Edward A., Saturated liquid/vapor generating and dispensing.
    상세보기
  48. Ross Edward Alan (Willowdale CA), Saturated liquid/vapor generating and dispensing.
    상세보기
  49. Kodera Masako (Matsudo JPX) Watanabe Tohru (Yokohama JPX) Okumura Katsuya (Yokohama JPX), Semiconductor wafer carrier having a dust cover.
    상세보기
  50. Mann Reginald (19 Heath Road Glossop ; Derbyshire SK13 9AY GB2), Separation of gaseous mixtures.
    상세보기
  51. Molinaro James S. (Coplay PA), Sparger plate for ozone gas diffusion.
    상세보기
  52. Liu Benjamin Y. H. (North Oaks MN) Ahn Kang H. (Minneapolis MN), System for surface and fluid cleaning.
    상세보기
  53. Nelson Steven L. ; Christenson Kurt K., System to increase the quantity of dissolved gas in a liquid and to maintain the increased quantity of dissolved gas in.
    상세보기
  54. Faivre Michel,FRX ; Martin Nathalie,FRX ; Boisdon Vincent,FRX, Unit for the treatment of water by ozonization, and a corresponding installation for the production of ozonized water.
    상세보기
  55. Partus Fred P. (Cobbs County GA), Vapor delivery control system and method.
    상세보기
  56. Partus Fred P. (Atlanta GA), Vapor delivery system and method.
    상세보기
  57. Moy, Timothy Y., Vapor generator and its use in generating vapors in a pressurized gas.
    상세보기
  58. McMenamin Joseph C. (Fresno CA), Vapor mass flow control system.
    상세보기

이 특허를 인용한 특허 (17)

  1. Christenson, Kurt Karl; Hanestad, Ronald J.; Ruether, Patricia Ann; Wagener, Thomas J., Apparatus for removing material from one or more substrates.
    상세보기
  2. Sapra, Sanjeev; Chen, Cheng-Shun; Tsai, Hung-Ming; Yang, Sheng-Wei, Methods of forming bulb-shaped trenches in silicon.
    상세보기
  3. Bergman,Eric J., Process and apparatus for treating a workpiece with gases.
    상세보기
  4. Nelson, Steven L., Process for increasing the hydrophilicity of silicon surfaces following HF treatment.
    상세보기
  5. Lauerhaas, Jeffrey M., Process for removing carbon material from substrates.
    상세보기
  6. Christenson, Kurt Karl; Hanestad, Ronald J.; Ruether, Patricia Ann; Wagener, Thomas J., Process for removing material from substrates.
    상세보기
  7. Christenson, Kurt Karl; Hanestad, Ronald J.; Ruether, Patricia Ann; Wagener, Thomas J., Process for removing material from substrates.
    상세보기
  8. Ratkovich, Anthony S.; Butterbaugh, Jeffery W.; Becker, David Scott, Process for selectively removing nitride from substrates.
    상세보기
  9. Christenson, Kurt K.; DeKraker, David, Process for treatment of semiconductor wafer using water vapor containing environment.
    상세보기
  10. DeKraker, David; Butterbaugh, Jeffery W.; Williamson, Richard E., Process for treatment of substrates with water vapor or steam.
    상세보기
  11. DeKraker, David; Butterbaugh, Jeffery W.; Williamson, Richard E., Process for treatment of substrates with water vapor or steam.
    상세보기
  12. Bergman,Eric J., Processing a workpiece using water, a base, and ozone.
    상세보기
  13. Verhaverbeke,Steven, Rotational thermophoretic drying.
    상세보기
  14. Gilton, Terry L.; Li, Li, Semiconductor fabrication methods and apparatus.
    상세보기
  15. Davis, Jeffry A.; Dolechek, Kert L.; Curtis, Gary L., Semiconductor wafer processing apparatus.
    상세보기
  16. Takemura, Makoto; Fukuda, Yasuo; Souda, Kazuaki; Iwahashi, Junichiro; Okuda, Koichi, Semiconductor wafer treatment method and apparatus therefor.
    상세보기
  17. Bergman,Eric J.; Gebhart,Thomas Maximilian, System and methods for polishing a wafer.
    상세보기

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