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Method and apparatus for vapor generation and film deposition 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-016/00
출원번호 US-0435515 (1999-11-08)
발명자 / 주소
  • James J. Sun
  • Benjamin Y. H. Liu
출원인 / 주소
  • MSP Corporation
대리인 / 주소
    Nickolas E. Westman
인용정보 피인용 횟수 : 28  인용 특허 : 14

초록

A vapor generator (19, 62) and connected chemical vapor deposition chamber (28) for providing a vapor for operations such as chemical vapor deposition has an atomizer (16, 16A, 38, 50) for forming an aerosol or droplet spray (36, 58, 74, 80) separate from a vaporization chamber (19, 62). The aerosol

대표청구항

1. A device to produce a source of a gas stream carrying a vapor of a selected reagent therein comprising an aerosol generator for generating an aerosol in a gas stream, the aerosol generator having a nozzle, a compressed gas source connected to discharge through the nozzle to form the gas stream, a

이 특허에 인용된 특허 (14)

  1. Ott Kevin C. (4745 Trinity Dr. Los Alamos NM 87544) Kodas Toivo T. (5200 Noreen Dr. NE. Albuquerque NM 87111), Aerosol chemical vapor deposition of metal oxide films.
  2. Kirlin Peter S. (Bethel CT) Binder Robin L. (Bethlehem CT) Gardiner Robin A. (Bethel CT) Buskirk Peter V. (Newtown CT) Zhang Jiming (Danbury CT) Stauf Gregory (New Milford CT), Apparatus for flash vaporization delivery of reagents.
  3. Sievers Robert E. (Boulder CO) Hansen Brian N. (Boulder CO), Chemical deposition methods using supercritical fluid solutions.
  4. Asaba Tetsuo (Odawara JPX) Makino Kenji (Yokohama JPX), Chemical vapor deposition method for forming a deposited film with the use of liquid raw material.
  5. Wernberg Alex A. (Rochester NY) Gysling Henry J. (Rochester NY), Chemical vapor deposition of metal oxide films.
  6. Wernberg Alex A. (Rochester NY) Gysling Henry J. (Rochester NY), Chemical vapor deposition of niobium and tantalum oxide films.
  7. Fukunaga Yukio,JPX ; Murakami Takeshi,JPX ; Ogure Naoaki,JPX ; Hongo Akihisa,JPX, Liquid material vaporizer apparatus and gas ejection device.
  8. Ewing James H. (Lexington MA), Liquid pump and vaporizer.
  9. Li Ting Kai ; Gurary Alexander I. ; Scott Dane C., Liquid vaporizer system and method.
  10. Vaartstra Brian A. ; Atwell David, Method and apparatus for vaporizing liquid precursors and system for using same.
  11. Wegrzyn James E. (173 Carlton Dr. East Shirley NY 11967), Particulate thin film fabrication process.
  12. Faust Horst (Wiesbaden DEX), Process for electrostatically coating a substrate using an aerosol.
  13. Wang Xingwu (Alfred NY), Process for preparing a coated substrate.
  14. Ewing James H. (Lexington MA), System for delivering and vaporizing liquid at a continuous and constant volumetric rate and pressure.

이 특허를 인용한 특허 (28)

  1. Dinh, Thuc M.; Ma, Yamin; Liu, Benjamin Y. H., Apparatus and method for vapor generation and film deposition.
  2. Oosterlaken, Theodorus G. M., Delivery of vapor precursor from solid source.
  3. Todd, Michael A; Raaijmakers, Ivo, Deposition from liquid sources.
  4. Todd,Michael A.; Raaijmakers,Ivo, Deposition from liquid sources.
  5. Uchida, Hiroto; Jinbo, Takehito; Masuda, Takeshi; Kajinuma, Masahiko; Yamada, Takakazu; Uematsu, Masaki; Suu, Koukou; Kimura, Isao, Film-forming apparatus and film-forming method.
  6. Iizuka,Hachishiro, Gas reaction system and semiconductor processing apparatus.
  7. Torkaman, Amir, High flow rate bubbler system and method.
  8. Zhao, Jun; Dornfest, Charles; Chang, Frank; Jin, Xiaoliang; Tang, Po, High temperature filter for CVD apparatus.
  9. Lin, Frank, Integrated processing system for forming an insulating layer of thin film transistor liquid crystal display.
  10. Hong, Sukwon; Tran, Toan; Mallick, Abhijit; Liang, Jingmei; Ingle, Nitin K., Low shrinkage dielectric films.
  11. Liu, Benjamin; Ma, Yamin; Dinh, Thuc, Method and apparatus for particle filtration and enhancing tool performance in film deposition.
  12. Gregg, John N.; Battle, Scott L.; Banton, Jeffrey I.; Naito, Donn K.; Laxman, Ravi, Method and apparatus to help promote contact of gas with vaporized material.
  13. Gregg, John N.; Battle, Scott L.; Banton, Jeffrey I.; Naito, Donn K.; Laxman, Ravi K., Method and apparatus to help promote contact of gas with vaporized material.
  14. Gregg, John N.; Battle, Scott L.; Banton, Jeffrey I.; Naito, Donn K.; Laxman, Ravi K., Method and apparatus to help promote contact of gas with vaporized material.
  15. Gregg, John N.; Battle, Scott L.; Banton, Jeffrey I.; Naito, Donn K.; Laxman, Ravi K., Method and apparatus to help promote contact of gas with vaporized material.
  16. Gregg, John N.; Battle, Scott L.; Banton, Jeffrey I.; Naito, Donn K.; Laxman, Ravi K., Method and apparatus to help promote contact of gas with vaporized material.
  17. Gregg, John N.; Battle, Scott L.; Banton, Jeffrey I.; Naito, Donn K.; Laxman, Ravi K., Method and apparatus to help promote contact of gas with vaporized material.
  18. Gregg,John N.; Battle,Scott L.; Banton,Jeffrey I.; Naito,Donn K.; Laxman,Ravi K., Method and apparatus to help promote contact of gas with vaporized material.
  19. Slevin, Damien; Laird, Brad; Bailey, Curtis; Li, Ming; Reddy, Sirish; Sims, James; Sabri, Mohamed; Sangplug, Saangrut, Method for supplying vaporized precursor.
  20. Jan Snijders, Gert; Raaijmakers, Ivo, Method for vaporizing non-gaseous precursor in a fluidized bed.
  21. Bencher, Christopher Dennis; Luo, Lee, Methods and devices to reduce defects in dielectric stack structures.
  22. Aitchison,Bradley J.; Maula,Jarmo; Leskinen,Hannu; Lang,Teemu; Kuosmanen,Pekka; H?rk?nen,Kari; Sonninen,Martti, Precursor material delivery system for atomic layer deposition.
  23. Slevin, Damien; Laird, Brad; Bailey, Curtis; Li, Ming; Reddy, Sirish; Sims, James; Sabri, Mohamed; Sangplug, Saangrut, Precursor vapor generation and delivery system with filters and filter monitoring system.
  24. Cleary, John M.; Arno, Jose I.; Hendrix, Bryan C.; Naito, Donn; Battle, Scott; Gregg, John N.; Wodjenski, Michael J.; Xu, Chongying, Solid precursor-based delivery of fluid utilizing controlled solids morphology.
  25. Buchanan, Daryl; Tariq, Faisal; Mei, Hai; Tison, Stuart, System and method for producing and delivering vapor.
  26. Tuominen, Marko; Shero, Eric; Verghese, Mohith, System for controlling the sublimation of reactants.
  27. Lyons, Christopher S.; Engle, Kent T.; Vanhoose, Steven R.; Spawn, Terence D.; Pieper, Joseph M.; Anderson, Edward J.; Stoss, Walter, Systems and methods for processing vapor.
  28. Iizuka, Hachishiro, Vaporizer and semiconductor processing apparatus.
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