이 특허에 인용된 특허 (25) 인용/피인용 타임라인 분석

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2. Say James ; Tomasco Michael F. ; Heller Adam ; Gal Yoram,ILX ; Aria Behrad ; Heller Ephraim ; Plante Phillip John ; Vreeke Mark S. ; Friedman Keith A. ; Colman Fredric C., Analyte monitoring device and methods of use.

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4. McCormick Fred B. (Maplewood MN) Gladfelter Wayne L. (St. Paul MN) Senzaki Yoshihide (Minneapolis MN), Chemical vapor deposition of iron, ruthenium, and osmium.

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5. Summerfelt Scott R., Conductive exotic-nitride barrier layer for high-dielectric-constant material electrodes.

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7. Zheng Jian-Ping ; Jow T. Richard, Electrode materials from hydrous metal and/or hydrous mixed metal oxides.

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8. Oda Hitoshi,JPX, Electron beam apparatus and method of driving the same.

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9. Tsukada Kiyotaka (Gifu JPX) Noda Yukihiro (Gifu JPX), Electronic circuit substrate.

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10. Saia Richard Joseph ; Durocher Kevin Matthew ; Cole Herbert Stanley, Flexible interconnect film including resistor and capacitor layers.

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11. Emesh Ismail T. (Cumberland CAX) McDonald David R. (Ottawa CAX), Formation of ruthenium oxide for integrated circuits.

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12. Takahashi Yasuo,JPX ; Miura Naoko,JPX, Manufacturing method for electron-emitting device, electron source, and image-forming apparatus.

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13. Maruyama Shigenobu,JPX ; Hongo Mikio,JPX ; Todoroki Satoru,JPX ; Okunaka Masaaki,JPX ; Matsuzaki Hideo,JPX ; Ninomiya Takanori,JPX ; Yoshimura Kazushi,JPX ; Ito Fumikazu,JPX, Method and apparatus for inspection and correction of wiring of electronic circuit and for manufacture thereof.

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14. Ellis Marion Edmond ; Bowles Philip Harbaugh ; Mobley Washington Morris, Method of forming ruthenium-based thick-film resistors.

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15. Nishimura Michiyo,JPX ; Nomura Ichiro,JPX ; Banno Yoshikazu,JPX ; Tsukamoto Takeo,JPX ; Miyata Hirokatsu,JPX ; Takada Kazuhiro,JPX, Method of manufacturing electron-emitting device, electron source and image-forming apparatus.

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16. Mori Hiroaki (Kyoto JPX) Yonezawa Masao (Kyoto JPX), Method of manufacturing thick-film circuit component.

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17. Vaartstra Brian A. ; Marsh Eugene P., Methods for preparing ruthenium metal films.

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18. Ogata Tomohiko,JPX ; Masaki Takaki,JPX ; Iguchi Yuichiro,JPX ; Tanaka Tuyosi,JPX ; Iwanaga Keiji,JPX, Photosensitive ceramic green sheet, ceramic package, and process for producing the same.

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19. Graetzel Michael (c/o Ecole Polytechnique Federale Lausanne 33 ; avenue de Cour CH-1015 Lausanne CHX) Kalyanasundaram Kuppuswamy (Chavannes CHX) Duonghong Dung (Lausanne CHX) Neumann-Spallart Michael, Product intended to be used as a photocatalyst, method for the preparation of such product and utilization of such produ.

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20. Vaartstra Brian A. ; Marsh Eugene P., Ruthenium silicide diffusion barrier layers and methods of forming same.

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21. Nasby Robert D., Semiconductor diode with external field modulation.

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22. Yamada Akira,JPX ; Sato Takehiko,JPX ; Honda Toshihisa,JPX ; Umemura Toshio,JPX ; Uchikawa Fusaoki,JPX, Temperature-measuring-resistor, manufacturing method therefor, ray detecting element using the same.

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23. Oka Kengo,JPX ; Nagasaka Takashi,JPX, Thick film circuit board and method of forming wire bonding electrode thereon.

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24. Ohkubo Toshio (Tokyo JPX) Kajiwara Yuji (Tokyo JPX) Itano Tsutomu (Tokyo JPX), Thick-film thermal printing head and method of manufacturing the same.

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25. Fukushima Noburu,JPX ; Kawakubo Takashi,JPX ; Shimizu Tatsuo,JPX, Thin film capacitor with electrodes having a perovskite structure and a metallic conductivity.

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이 특허를 인용한 특허 (2) 인용/피인용 타임라인 분석

1. Malhotra,Sandra G.; Deligianni,Hariklia; Rossnagel,Stephen M.; Shao,Xiaoyan; Tai,Tsong Lin; van der Straten,Oscar, Method for direct electroplating of copper onto a non-copper plateable layer.

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2. Felthouse, Timothy R.; Bino, Abraham, Ruthenium oxide catalysts for conversion of sulfur dioxide to sulfur trioxide.

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