초록 ▼

The present invention is directed to an apparatus and method for flow regulation of planarization fluids to a semiconductor wafer planarization machine. In one embodiment, the regulating system includes a fluid storage tank with an acoustic fluid level sensor. The storage tank is connected to a flui

The present invention is directed to an apparatus and method for flow regulation of planarization fluids to a semiconductor wafer planarization machine. In one embodiment, the regulating system includes a fluid storage tank with an acoustic fluid level sensor. The storage tank is connected to a fluid delivery line that delivers planarization fluid to the storage tank through a flow control valve and delivers a regulated flow of planarization fluid to a planarization machine through a flow sensor. A gas supply system is connected to the storage tank to provide system pressurization. Regulation of the fluid flow is achieved by a control system in which the flow sensor and the acoustic fluid level sensor comprise feedback elements in a closed feedback system to independently control the pressure in the storage tank and the fluid admitted by the control valve. In an alternate embodiment, the fluid level sensor is comprised of capacitive proximity sensors located outside the wall of the storage tank. In another embodiment, the fluid level sensor is replaced by a buoyant float that can seat in the upper or lower ends of the storage tank and a differential pressure sensor that senses differences in storage tank pressure when the float is seated in either of these locations to indicate full or empty tank conditions. In still another aspect, two or more regulators may be joined in a parallel flow arrangement in order to achieve precise point-of-use mixing of multi-component planarization fluids.

대표청구항 ▼

1. A system for regulating the flow of a planarization fluid, comprising:a fluid supply dispenser adapted to contain the planarization fluid; a fluid regulating device adapted to receive an input stream of the planarization fluid from the fluid supply dispenser and to release an output stream of the

1. A system for regulating the flow of a planarization fluid, comprising:a fluid supply dispenser adapted to contain the planarization fluid; a fluid regulating device adapted to receive an input stream of the planarization fluid from the fluid supply dispenser and to release an output stream of the fluid to a semiconductor wafer planarization machine and having an internal volume capable of accumulating a volume of fluid, the fluid regulating device further including a fluid sensing system adapted to sense fluid motion and fluid accumulation within the regulating device and a fluid command system adapted to control the flow of fluid from the regulating device; and a control system coupled to the fluid sensing system and the fluid command system which is configured to receive control inputs from the fluid sensing system and transmit control outputs to the fluid command system to automatically and continuously control the delivery of planarization fluid to a semiconductor wafer planarization machine.