초록 ▼

An interconnection structure preferably including one or more conductors that have a central region filled with an insulator, and a method of fabricating such an interconnection structure for preferably making an electrical connection to the conductor(s). The method preferably includes the steps of

An interconnection structure preferably including one or more conductors that have a central region filled with an insulator, and a method of fabricating such an interconnection structure for preferably making an electrical connection to the conductor(s). The method preferably includes the steps of depositing and patterning a first insulator over a substrate to form an aperture opening to the substrate; depositing and polishing a first conductor to leave the first conductor in the aperture; depositing and patterning a second insulator to form an opening through the second insulator and a recess in the aperture; depositing one or more second conductors to line the opening and the recess, and to form a central region of the interconnection structure; depositing a third insulator to at least partially fill the central region; and making an electrical connection to the second conductor(s).

대표청구항 ▼

1. A method of forming an interconnection structure, the method comprising the steps of:depositing and patterning a first insulator to form an aperture opening to a substrate; depositing a first conductor and polishing the first conductor, thereby leaving the first conductor in the aperture; deposit

1. A method of forming an interconnection structure, the method comprising the steps of:depositing and patterning a first insulator to form an aperture opening to a substrate; depositing a first conductor and polishing the first conductor, thereby leaving the first conductor in the aperture; depositing a second insulator and patterning the second insulator, the step of patterning the second insulator forming an opening through the second insulator and etching into the first conductor of the aperture, thereby forming a recess in the aperture; depositing at least one second conductor, thereby lining the opening through the second insulator and the recess in the aperture, and thereby forming a central region of the interconnection structure; depositing a third insulator, thereby at least partially filling the central region of the interconnection structure; and making an electrical connection to the at least one second conductor.