초록 ▼

A microneedle array is manufactured using a mold preparation procedure that begins by placing an optical mask over a layer of PMMA material, exposing the PMMA material to x-rays, then developing using a photoresist process. The remaining PMMA material is then electroplated with metal. Once the metal

A microneedle array is manufactured using a mold preparation procedure that begins by placing an optical mask over a layer of PMMA material, exposing the PMMA material to x-rays, then developing using a photoresist process. The remaining PMMA material is then electroplated with metal. Once the metal has reached an appropriate thickness, it is detached to become a metal mold that is used in a microembossing procedure, in which the metal mold is pressed against a heated layer of plastic material. Once the mold is pressed down to its proper distance, the plastic material is cooled until solidified, and the mold is then detached, thereby leaving behind an array of microneedles.

대표청구항 ▼

1. A method of preparing a mold for manufacturing a microneedle array, comprising:providing a photoresist material, in contact with a temporary substrate; placing a mask layer upon said photoresist material, said mask layer having a predetermined pattern, at least a portion of said mask layer compri

1. A method of preparing a mold for manufacturing a microneedle array, comprising:providing a photoresist material, in contact with a temporary substrate; placing a mask layer upon said photoresist material, said mask layer having a predetermined pattern, at least a portion of said mask layer comprising a material that prevents high energy radiation from passing therethrough; exposing said combination photoresist material/mask layer to high energy radiation; removing said mask layer, and chemically developing exposed portions of said photo-resist material, thereby removing portions of the photoresist material and leaving behind a pattern of said photoresist material that represents a three-dimensional structure emulating a plurality of microneedles that are to be later formed; electroplating said patterned photoresist material with a metallic substance; and detaching said metallic substance from said patterned photoresist material, said metallic substance thereby forming a microneedle array mold; wherein said mask layer comprises gold.