$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Dual cassette load lock 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B65G-049/05
출원번호 US-0813480 (1997-03-07)
발명자 / 주소
  • Masato M. Toshima
  • Phil M. Salzman
  • Steven C. Murdoch
  • Cheng Wang
  • Mark A. Stenholm
  • James Howard
  • Leonard Hall
  • David Cheng
출원인 / 주소
  • Applied Materials, Inc.
대리인 / 주소
    Dugan & Dugan LLP
인용정보 피인용 횟수 : 31  인용 특허 : 15

초록

A workpiece loading interface is included within a workpiece processing system which processes workpieces, typically wafers, in a vacuum. The workpiece loading interface includes two separate chambers. Each chamber may be separately pumped down. Thus, while a first cassette of wafers, from a first c

대표청구항

1. In a workpiece processing system comprising multiple vacuum processing chambers coupled to a central chamber, a method for loading workpieces into the central chamber, comprising the steps of:providing dual workpiece load/unload chambers coupled to the central chamber, each having an opening for

이 특허에 인용된 특허 (15)

  1. Brown ; Jr. William W. (Milton NY) Dahlke Gerhard P. (Fishkill NY) Lupul Francis T. (LaGrangeville NY), Apparatus for removably mounting and supplying mechanical and electrical energy to a vacuum chamber substrate holder.
  2. Gallego JosM. (Ormskirk GB2), Apparatus for the deposition of multi-layer coatings.
  3. Petz Andreas (Bruchkoebel DEX) Costescu Dan (Hainburg DEX), Apparatus on the carousel principle for the coating of substrates.
  4. Dozier Alfred R. (9075 Meadowrun Way San Diego CA 92129), Chemical vapor deposition reactor.
  5. Wurst Manfred P. (Stuttgart DEX) Simon Rudolf (Korntal-Muenchingen DEX) Kahlden Thomas V. (Stuttgart DEX), Container for the handling of semiconductor devices and process for particle-free transfer.
  6. Asakawa Teruo (Yamanashi JPX) Ohsawa Tetsu (Kofu JPX), Handling apparatus for transferring carriers and a method of transferring carriers.
  7. Lazzari Jean-Pierre (Corenc FRX) Cortial Henri (Sassenage FRX), Installation for the storage and transfer of objects in a very clean atmosphere.
  8. Davis Cecil J. (Greenville TX) Matthews Robert (Plano TX) Bowling Robert A. (Garland TX), Integrated circuit processing system.
  9. Maydan Dan (Los Altos Hills CA) Somekh Sasson (Redwood City CA) Wang David N. (Cupertino CA) Cheng David (San Jose CA) Toshima Masato (San Jose CA) Harari Isaac (Mountain View CA) Hoppe Peter D. (Sun, Multi-chamber integrated process system.
  10. Davis Cecil J. (Greenville TX) Jucha Rhett B. (Celeste TX), Processing apparatus and method.
  11. Maher Joseph A. (South Hamilton MA) Vowles E. John (Goffstown NH) Napoli Joseph D. (Winham NH) Zafiropoulo Arthur W. (Manchester MA) Miller Mark W. (Burlington MA), Quad processor.
  12. Hutchinson Martin A. (Santa Clara CA), Sputter module for modular wafer processing machine.
  13. Stonestreet Paul (Cowfold GB2) Allum Clive (Crawley GB2) Webber Bert (Crawley GB2) Cooke Richard (West Worthing GB2) Robinson Frederick J. L. (Crawley GB2) Wauk ; II Michael T. (Haywards Heath GB2), Systems and methods for wafer handling in semiconductor process equipment.
  14. Wagner Rudolf (Fontnas CHX) Martin Bader (Balzers LIX) Eberhard Moll (Schellenberg LIX) Zanardo Renzo (Balzers LIX) Van Agtmaal J. G. (Hilversum NLX), Vacuum apparatus.
  15. Layman Frederick P. (Fremont CA) Hobson Phillip M. (Los Altos CA) Dick Paul H. (San Jose CA), Valve incorporating wafer handling arm.

이 특허를 인용한 특허 (31)

  1. Yokomizo,Kenji, Apparatus and method of securing a workpiece during high-pressure processing.
  2. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of a workpiece.
  3. Gwehenberger, Juergen, Carousel carrier for a vacuum treatment installation.
  4. Mazzocco, John J.; Ng, Edward; MacLeod, Douglas; Phillips, David; Majumdar, Ayan; Hudgens, Jeffrey C., Carrier adapter insert apparatus and carrier adapter insert detection methods.
  5. Jones,William Dale, Control of fluid flow in the processing of an object with a fluid.
  6. Sheydayi,Alexei; Sutton,Thomas, Gate valve for plus-atmospheric pressure semiconductor process vessels.
  7. Jones, William D., High pressure fourier transform infrared cell.
  8. Biberger,Maximilian A.; Layman,Frederick Paul; Sutton,Thomas Robert, High pressure processing chamber for semiconductor substrate.
  9. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  10. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  11. Sheydayi,Alexei, Method and apparatus for clamping a substrate in a high pressure processing system.
  12. Goshi,Gentaro, Method and apparatus for cooling motor bearings of a high pressure pump.
  13. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method and apparatus for supercritical processing of multiple workpieces.
  14. Parent,Wayne M.; Goshi,Gentaro, Method and system for cooling a pump.
  15. Parent,Wayne M., Method and system for determining flow conditions in a high pressure processing system.
  16. Parent, Wayne M.; Geshell, Dan R., Method and system for passivating a processing chamber.
  17. Hansen,Brandon; Lowe,Marie, Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid.
  18. Kawamura,Kohei; Asano,Akira; Miyatani,Koutarou; Hillman,Joseph T.; Palmer,Bentley, Method for supercritical carbon dioxide processing of fluoro-carbon films.
  19. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method for supercritical processing of multiple workpieces.
  20. Biberger,Maximilian Albert; Layman,Frederick Paul; Sutton,Thomas Robert, Method of supercritical processing of a workpiece.
  21. Shah, Vinay; Elliott, Martin R.; Hudgens, Jeffrey C.; Englhardt, Eric Andrew, Methods and apparatus for identifying small lot size substrate carriers.
  22. Ku, Shao-Yen; Chen, Ming-Jung; Chung, Tzu Yang; Tseng, Chi-Yun; Chuang, Rui-Ping, Methods for transporting wafers between wafer holders and chambers.
  23. Sheydayi,Alexei, Non-contact shuttle valve for flow diversion in high pressure systems.
  24. Sheydayi,Alexei, Pressure energized pressure vessel opening and closing device and method of providing therefor.
  25. Wuester,Christopher D., Process flow thermocouple.
  26. Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.
  27. Koshti, Sushant S.; Hruzek, Dean C.; Majumdar, Ayan; Menk, John C.; Lee, Helder T.; Patil, Sangram; Rajaram, Sanjay; Baumgarten, Douglas; Merry, Nir, Substrate processing systems, apparatus, and methods with factory interface environmental controls.
  28. Gale,Glenn; Hillman,Joseph T.; Jacobson,Gunilla; Palmer,Bentley, System and method for processing a substrate using supercritical carbon dioxide processing.
  29. Jacobson,Gunilla; Yellowaga,Deborah, Treatment of a dielectric layer using supercritical CO.
  30. Kevwitch, Robert, Treatment of substrate using functionalizing agent in supercritical carbon dioxide.
  31. Sheydayi,Alexei, Vacuum chuck utilizing sintered material and method of providing thereof.
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로