초록 ▼

A method for forming an indium oxide film on an electrically conductive substrate by immersing the substrate and a counter electrode in an aqueous solution containing at least nitrate and indium ions and flowing an electric current between the substrate and the counter electrode thereby causing indi

A method for forming an indium oxide film on an electrically conductive substrate by immersing the substrate and a counter electrode in an aqueous solution containing at least nitrate and indium ions and flowing an electric current between the substrate and the counter electrode thereby causing indium oxide film formation on the substrate is provided. A substrate for a semiconductor element and a photovoltaic element produced using the film forming method are also provided An aqueous solution for the formation of an indium oxide film by an electroless deposition process, containing at least nitrate and indium ions and tartrate is also disclosed. A film-forming method for the formation of an indium oxide film on a substrate by an electroless deposition process, using the aqueous solution, and a substrate for a semiconductor element and a photovoltaic element produced using the film forming method are further provided.

대표청구항

1. An aqueous solution for the formation of an indium oxide film by electroless deposition, said aqueous solution containing at least nitrate ion at a concentration of 0.001 to 0.5 mol/l, indium ion at a concentration of 0.001 to 0.5 mol/l, and tartrate at a concentration of 0.001 to 0.1 mol/l.

1. An aqueous solution for the formation of an indium oxide film by electroless deposition, said aqueous solution containing at least nitrate ion at a concentration of 0.001 to 0.5 mol/l, indium ion at a concentration of 0.001 to 0.5 mol/l, and tartrate at a concentration of 0.001 to 0.1 mol/l.