초록 ▼

The invention discloses a pumping device by non-vaporizable getter to create a very high vacuum in a chamber defined by a metal wall capable of releasing gas at its surface, characterized in that it comprises a thin layer of non-vaporizable getter coated on at least almost the whole metal wall surfa

The invention discloses a pumping device by non-vaporizable getter to create a very high vacuum in a chamber defined by a metal wall capable of releasing gas at its surface, characterized in that it comprises a thin layer of non-vaporizable getter coated on at least almost the whole metal wall surface defining the chamber.

대표청구항 ▼

1. A process for using a non-evaporable getter to create, due to a getter function, a very high vacuum in a chamber defined by a metal wall capable of releasing gas at a surface thereof, said non-evaporable getter being deposited on at least a majority of said chamber wall surface, the process compr

1. A process for using a non-evaporable getter to create, due to a getter function, a very high vacuum in a chamber defined by a metal wall capable of releasing gas at a surface thereof, said non-evaporable getter being deposited on at least a majority of said chamber wall surface, the process comprising:(a) cleaning the chamber; (b) placing in the chamber a cathode sputtering device capable of coating the chamber; (c) creating .a vacuum in the chamber and dehydrating the chamber; (d) depositing a thin screen coating of a non-evaporable getter by cathode sputtering on said majority of said chamber wall surface; (e) reestablishing atmospheric pressure in the chamber and removing the deposition device from the chamber; (f) assembling said chamber with a vacuum system; (g) making a vacuum with said vacuum system;, (h) dehydrating said vacuum system at a given temperature while maintaining said chamber at a temperature lower than a temperature of activation of said non-evaporable getter; (i) stopping said dehydrating of said vacuum system, and simultaneously raising the temperature in said chamber up to said activation temperature; (j) maintaining said activation temperature for a predetermined period suitable for cleansing said non-evaporable getter coating; and (k) lowering the temperature in said chamber to room temperature.