초록 ▼

A magnetic drive system for moving a substrate transfer shuttle along a linear path between chambers in a semiconductor fabrication apparatus. A rack with rack magnets is secured to the shuttle, and a rotatable pinion with pinion magnets is positioned adjacent the rack so that the pinion magnets can

A magnetic drive system for moving a substrate transfer shuttle along a linear path between chambers in a semiconductor fabrication apparatus. A rack with rack magnets is secured to the shuttle, and a rotatable pinion with pinion magnets is positioned adjacent the rack so that the pinion magnets can magnetically engage the rack magnets. Thus, rotation of the pinion will cause the shuttle to move along the linear path. The magnets may be oriented with a helix angle between their primary axis and the axis of rotation of the pinion. One rack and one pinion are located on each side of the shuttle. A set of lower guide rollers supports the shuttle, and a set of upper guide rollers prevents the shuttle from lifting off the lower guide rollers.

대표청구항 ▼

1. An apparatus for performing a thin film fabrication process on a substrate, comprising:a processing chamber; a load lock chamber in communication with the processing chamber; a valve disposed between the processing chamber and the load lock chamber; a substrate support movable along a path betwee

1. An apparatus for performing a thin film fabrication process on a substrate, comprising:a processing chamber; a load lock chamber in communication with the processing chamber; a valve disposed between the processing chamber and the load lock chamber; a substrate support movable along a path between the processing chamber and the load lock chamber, wherein the substrate support is disposable within the load lock chamber while the valve is closed and processing occurs in the processing chamber; and a magnetic drive including a first magnetic surface on the movable substrate support to generate a first magnetic field and a plurality of movable second magnetic surfaces disposed outside and in a fixed position relative to the processing chamber and the load lock chamber to generate. a plurality of second magnetic fields, the first magnetic field magnetically engageable with the plurality of second magnetic fields so that movement of the plurality of second magnetic fields causes the substrate support to move along the path, wherein the plurality of movable second magnetic surfaces rotate about one or more shafts positioned orthogonal to the path and fixed relative thereto.