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Apparatus for measuring pedestal and substrate temperature in a semiconductor wafer processing system 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01K-001/14
  • G01K-001/16
  • G01K-011/20
  • G02B-006/122
  • G02B-006/36
  • H01J-063/04
출원번호 US-0513726 (2000-02-24)
발명자 / 주소
  • Kadthala R. Narendrnath
  • Liang-Guo Wang
  • Shamouil Shamouilian
  • Paul E. Luscher
  • Hamid Noorbakhsh
출원인 / 주소
  • Applied Materials Inc.
대리인 / 주소
    Moser Patterson Sheridan
인용정보 피인용 횟수 : 33  인용 특허 : 15

초록 ▼

Apparatus for measuring wafer support assembly temperature in a semiconductor wafer processing system. The apparatus is a modular plug that is mounted to the support assembly. The plug contains a photoluminescent material that exhibits a decay in luminescence after an excitement which is indicative

대표청구항 ▼

1. Apparatus for measuring temperature at a pedestal disposed in a semiconductor wafer processing system comprising:a removable temperature dependent plug adapted to be disposed within the pedestal, said plug having a bore extending partially through said plug and terminating with a distal end; a ph

이 특허에 인용된 특허 (15)

  1. Jensen Earl M. (Sunnyvale CA), Apparatus and method for measuring temperatures at a plurality of locations using luminescent-type temperature sensors w.
    상세보기
  2. Kumar Ajay ; Chinn Jeffrey ; Deshmukh Shashank C. ; Jiang Weinan ; Duda Brian ; Guenther Rolf ; Minaee Bruce ; Mombelli Marco ; Wiltse Mark, Apparatus for measuring pedestal temperature in a semiconductor wafer processing system.
    상세보기
  3. Hosokawa Akihiro (San Jose CA), Apparatus for measuring temperature of wafer.
    상세보기
  4. Wooten David ; Krein Bruce ; Shi Jianou, Contact temperature probe with unrestrained orientation.
    상세보기
  5. Husain Anwar ; Noorbakhsh Hamid, Controlling the temperature of a wafer by varying the pressure of gas between the underside of the wafer and the chuck.
    상세보기
  6. Alain George (#2 ; 4035 Ogden Rd. Calgary ; Alberta CAX T2G 4N9), Fluid temperature indicator.
    상세보기
  7. Hawkins Mark Richard ; Vyne Robert Michael ; van der Jeugd Cornelius Alexander, Method and system for adjusting semiconductor processing equipment.
    상세보기
  8. Jensen Earl M. (Sunnyvale CA) Sun Mei H. (Los Altos CA) Vecht David L. (San Jose CA) Melen Robert E. (Saratoga CA), Modular luminescence-based measuring system using fast digital signal processing.
    상세보기
  9. Dumoulin Charles Lucian ; Watkins Ronald Dean ; Darrow Robert David ; Souza Steven Peter, Optical coupling for invasive devices.
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  10. Baldock Michael B.,CAX ; Provencal Louis R.,CAX, Retractable thermowell.
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  11. Furuya Kunihiro,JPX ; Yonezawa Toshihiro,JPX ; Inoue Ken,JPX ; Nakagomi Yoichi,JPX, Semiconductor wafer holder with spring-mounted temperature measurement apparatus disposed therein.
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  12. Witonsky Robert J. ; Scarantino John W., Shielding method for microwave heating of infant formulate to a safe and uniform temperature.
    상세보기
  13. Lauf Robert J. ; Bible Don W. ; Sohns Carl W., Temperature measuring device.
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  14. Yam Mark ; Peuse Bruce W., Temperature probe with fiber optic core.
    상세보기
  15. Gilman Dale M. (Clawson MI) Ngo Lang So (Dearborn MI), Temperature sensing system for an internal combustion engine.
    상세보기

이 특허를 인용한 특허 (33)

  1. Sasaki, Yasuharu; Ueda, Takehiro; Okajo, Taketoshi; Oohashi, Kaoru, Apparatus and method for evaluating a substrate mounting device.
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  2. Gaff, Keith; Benjamin, Neil Martin Paul, Apparatus for determining a temperature of a substrate and methods therefor.
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  3. Gaff,Keith; Benjamin,Neil Martin Paul, Apparatus for determining a temperature of a substrate and methods therefor.
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  4. Johnson,Shane R.; Zhang,Yong Hang; Johnson,Wayne L., Apparatus for measuring temperatures of a wafer using specular reflection spectroscopy.
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  5. Barlett, Darryl; Wissman, Barry D.; Taylor, II, Charles A., Blackbody fitting for temperature determination.
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  6. Brillhart, Paul Lukas; Fovell, Richard; Tavassoli, Hamid; Buchberger, Jr., Douglas A.; Burns, Douglas H.; Bera, Kallol; Hoffman, Daniel J., Capacitively coupled plasma reactor having a cooled/heated wafer support with uniform temperature distribution.
    상세보기
  7. Buchberger, Jr., Douglas A.; Brillhart, Paul Lukas; Fovell, Richard; Tavassoli, Hamid; Burns, Douglas H.; Bera, Kallol; Hoffman, Daniel J., Capacitively coupled plasma reactor having very agile wafer temperature control.
    상세보기
  8. Buchberger, Jr., Douglas A.; Brillhart, Paul Lukas; Fovell, Richard; Tavassoli, Hamid; Burns, Douglas H.; Bera, Kallol; Hoffman, Daniel J.; Cowans, Kenneth W.; Cowans, William W.; Zubillaga, Glenn W.; Millan, Isaac, Capacitively coupled plasma reactor having very agile wafer temperature control.
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  9. Matyushkin, Alexander; Koosau, Dennis; Panagopoulos, Theodoros; Holland, John, Electrostatic chuck having a plurality of heater coils.
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  10. Gotthold,John P.; Stapleton,Terry M.; Champetier,Robert; Dang,Hung, In situ optical surface temperature measuring techniques and devices.
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  11. Gotthold,John P.; Stapleton,Terry M.; Champetier,Robert; Dang,Hung, In situ optical surface temperature measuring techniques and devices.
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  12. Cheramy, Severine, Integrated circuit and method for fabricating an integrated circuit equipped with a temperature probe.
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  13. Herchen,Harald, Method and apparatus for detecting substrate temperature in a track lithography tool.
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  14. Buchberger, Jr., Douglas A.; Brillhart, Paul Lukas; Fovell, Richard; Tavassoli, Hamid; Burns, Douglas H.; Bera, Kallol; Hoffman, Daniel J.; Cowans, Kenneth W.; Cowans, Williams W.; Zubillaga, Glenn W.; Millian, Isaac, Method for agile workpiece temperature control in a plasma reactor using a thermal model.
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  15. Brillhart, Paul Lukas; Fovell, Richard; Buchberger, Jr., Douglas A.; Burns, Douglas H.; Bera, Kallol; Hoffman, Daniel J., Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor.
    상세보기
  16. Brillhart, Paul Lukas; Fovell, Richard; Buchberger, Jr., Douglas A.; Burns, Douglas H.; Bera, Kallol; Hoffman, Daniel J.; Cowans, Kenneth W.; Cowans, William W.; Zubillaga, Glenn W.; Millan, Isaac, Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor.
    상세보기
  17. Brillhart, Paul Lukas; Fovell, Richard; Buchberger, Jr., Douglas A.; Burns, Douglas H.; Bera, Kallol; Hoffman, Daniel J.; Cowans, Kenneth W.; Cowans, William W.; Zubillaga, Glenn W.; Millan, Isaac, Method of operating a capacitively coupled plasma reactor with dual temperature control loops.
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  18. Buchberger, Jr., Douglas A.; Brillhart, Paul Lukas; Fovell, Richard; Burns, Douglas H.; Bera, Kallol; Hoffman, Daniel J.; Cowans, Kenneth W.; Cowans, William W.; Zubillaga, Glenn W.; Millan, Isaac, Method of processing a workpiece in a plasma reactor using feed forward thermal control.
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  19. Brillhart, Paul Lukas; Fovell, Richard; Buchberger, Jr., Douglas A.; Burns, Douglas H.; Bera, Kallol; Hoffman, Daniel J.; Cowans, Kenneth W.; Cowans, William W.; Zubillaga, Glenn W.; Millan, Isaac, Method of processing a workpiece in a plasma reactor using multiple zone feed forward thermal control.
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  20. Steger, Robert J., Methods and apparatus for in situ substrate temperature monitoring.
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  21. Tatum,Jim; Guenter,James K., Methods and apparatus for optical component identification.
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  22. Ty Tan, Michael Renne; Rosenberg, Paul Kessler; Kuo, Huel Pei, Optical interconnect.
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  23. Brown, Douglas; Meadows, Robert David; Tao, David; Koch, Mathias, Optical path improvement, focus length change compensation, and stray light reduction for temperature measurement system of RTP tool.
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  24. Brillhart, Paul Lukas; Fovell, Richard; Tavassoli, Hamid; Buchberger, Jr., Douglas A.; Burns, Douglas H.; Bera, Kallol; Hoffman, Daniel J., Plasma reactor with a multiple zone thermal control feed forward control apparatus.
    상세보기
  25. Brillhart, Paul Lukas; Fovell, Richard; Tavassoli, Hamid; Buchberger, Jr., Douglas A.; Burns, Douglas H.; Bera, Kallol; Hoffman, Daniel J.; Cowans, Kenneth W.; Cowans, William W.; Zubillaga, Glenn W.; Millan, Isaac, Plasma reactor with a multiple zone thermal control feed forward control apparatus.
    상세보기
  26. Buchberger, Jr., Douglas A.; Brillhart, Paul Lukas; Fovell, Richard; Tavassoli, Hamid; Burns, Douglas H.; Bera, Kallol; Hoffman, Daniel J., Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes.
    상세보기
  27. Buchberger, Jr., Douglas A.; Brillhart, Paul Lukas; Fovell, Richard; Tavassoli, Hamid; Burns, Douglas H.; Bera, Kallol; Hoffman, Daniel J.; Cowans, Kenneth W.; Cowans, William W.; Zubillaga, Glenn W.; Millan, Isaac, Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes.
    상세보기
  28. Buchberger, Jr., Douglas A.; Brillhart, Paul Lukas; Fovell, Richard; Tavassoli, Hamid; Burns, Douglas H.; Bera, Kallol; Hoffman, Daniel J.; Cowans, Kenneth W.; Cowans, William W.; Zubillaga, Glenn W.; Millan, Isaac, Plasma reactor with wafer backside thermal loop, two-phase internal pedestal thermal loop and a control processor governing both loops.
    상세보기
  29. Pape, Eric; Ehrlich, Darrell; Jing, Mike, Substrate holder having integrated temperature measurement electrical devices.
    상세보기
  30. Matyushkin, Alexander; Koosau, Dennis; Panagopoulos, Theodoros; Holland, John, Substrate support with electrostatic chuck having dual temperature zones.
    상세보기
  31. Rao, Shreesha Y., Substrate temperature monitoring.
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  32. Hashikura,Manabu; Nakata,Hirohiko; Natsuhara,Masuhiro; Kuibira,Akira, Temperature gauge and ceramic susceptor in which it is utilized.
    상세보기
  33. Comendant, Keith, Temperature probes having a thermally isolated tip.
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