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Zinc-complex photoinitiators and applications therefor 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C08F-002/50
  • G03F-007/079
출원번호 US-0884896 (2001-06-19)
발명자 / 주소
  • Ronald Sinclair Nohr
  • John G. MacDonald
출원인 / 주소
  • Kimberly-Clark Worldwide, Inc.
대리인 / 주소
    Kilpatrick Stockton LLP
인용정보 피인용 횟수 : 24  인용 특허 : 229

초록

The present invention is directed to energy-efficient, photoinitiators having the general formula: [EQU1]wherein Z each independently represent [EQU2]wherein R1, R2, R3, R4, R5, R6, R7, R8 are as defined in claim 1, and wherein R9 represents (R10)2O or (R10)3N; wherein R10 represents H or an alkyl g

대표청구항

1. A photoinitiator having the general formula: [EQU19]wherein Z each independently represents [EQU20]wherein R1, R2, R3 and R4 each independently represent hydrogen, an alkyl group having from one to six carbon atoms, an alkoxy group having from one to six carbon atoms, or a halogen-substituted alk

이 특허에 인용된 특허 (229)

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  147. Kawabata Masami (Suita JPX) Kimoto Koichi (Hirakata JPX) Takimoto Yasuyuki (Takatsuki JPX), Photopolymerizable composition containing a certain xanthene or thioxanthene dyestuff.
  148. McGinniss Vincent D. (Delaware OH) Schwerzel Robert E. (Powell OH), Photopolymerizable composition containing a photosensitive donor and photoinitiating acceptor.
  149. Via Francis A. (Yorktown Hts. NY), Photopolymerizable composition stabilized with nitrogen-containing aromatic compounds.
  150. Hasegawa Eiichi (Asaka JPX) Yazawa Kenichiro (Asaka JPX) Tanaka Shigeo (Asaka JPX) Murata Masataka (Asaka JPX) Takahashi Yohonosuke (Asaka JPX), Photopolymerizable composition with epoxy stabilizers.
  151. Kondoh Syunichi (Asaka JPX) Matsufuji Akihiro (Asaka JPX) Umehara Akira (Asaka JPX), Photopolymerizable compositions.
  152. Specht Donald P. (Rochester NY) Houle Conrad G. (Webster NY) Farid Samir Y. (Rochester NY), Photopolymerizable compositions featuring novel co-initiators.
  153. Kondoh Syunichi (Asaka JPX) Matsufuji Akihiro (Asaka JPX) Ohara Yuji (Asaka JPX) Umehara Akira (Asaka JPX), Photopolymerizable compositions having combined photoinitiators.
  154. Rosen George (Wayne NJ), Photopolymerizable compounds and compositions comprising the product of the reaction of a hydroxy-containing ester and a.
  155. Rosen George (Wayne NJ), Photopolymerizable compounds and compositions comprising the product of the reaction of a monomeric ester and a polycarb.
  156. Zertani Rudolf (Mainz-Bretzenheim DEX) Mohr Dieter (Budenheim DEX) Rode Klaus (Suzano-SP DEX) Frass Werner (Wiesbaden-Naurod DEX) Joerg Klaus (Ingelheim DEX), Photopolymerizable mixture and recording material prepared therefrom, having a photoinitiating set of compounds which gi.
  157. Bean Anthony J. (East Rutherford NJ), Photopolymerization co-initiator systems.
  158. Martan Michael (Skokie IL), Photopolymerization using an alpha-aminoacetophenone.
  159. Nohr Ronald Sinclair ; MacDonald John Gavin, Photoreactor composition containing an arylketoalkene wavelength-specific sensitizer.
  160. Okazaki Masaki (Kanagawa JPX) Ikegawa Akihiko (Kanagawa JPX) Takei Haruo (Kanagawa JPX), Photoresponsive material.
  161. Kawamura Kouichi (Shizuoka JPX) Matsumoto Hirotaka (Shizuoka JPX) Yamaguchi Jun (Shizuoka JPX), Photosensitive composition and photopolymerizable composition employing the same.
  162. Koibuchi Shigeru (Hitachi JPX) Isobe Asao (Hitachi JPX) Makino Daisuke (Mito JPX), Photosensitive composition with 4-azido-2′-methoxychalcone.
  163. Iwasaki Masayuki (both of ; Shizuoka JPX) Nagashima Akira (both of ; Shizuoka JPX) Sato Shigeru (Odawara JPX), Photosensitive compositions.
  164. Kohara Hidekatsu (Kanagawa JPX), Photosensitive compositions and a method of patterning using the same.
  165. Iwasaki Masayuki (Minami-ashigara JPX) Sato Shigeru (Minami-ashigara JPX) Inoue Yasuo (Shizuoka JPX) Nagashima Akira (Shizuoka JPX), Photosensitive compositions containing 2-halomethyl-5-vinyl-1,3,4-oxadiazoles as free radical progenitors.
  166. Robillard Jean J. A. (Limerick IEX), Photosensitive compositions for direct positive color photography.
  167. Masukawa Toyoaki (Hino JPX) Ishikawa Wataru (Hachioji JPX) Okaniwa Kenichiro (Hino JPX) Yamashita Kiyoshi (Hino JPX), Photosensitive compound and photosensitive material containing it.
  168. Robillard Jean J. (El Paso TX), Photosensitive elements based on polymeric matrices of diacetylenes and spiropyrans and the use thereof as coatings to p.
  169. Gehlhaus Jergen (Heppenheim DEX) Kieser Manfred (Darmstadt DEX), Photosensitive hydroxyalkylphenones.
  170. Gehlhaus Jrgen (Heppenheim DEX) Kieser Manfred (Darmstadt DEX), Photosensitive hydroxyalkylphenones.
  171. Gehlhaus Juergen (Heppenheim DEX) Kieser Manfred (Darmstadt DEX), Photosensitive hydroxylalkylphenones.
  172. Streeper ; Richard D., Photosensitive imageable composition containing a hexaaromaticbimidazole, a leuco dye and an oxygen-sensitizing compoun.
  173. Tsunoda Takahiro (Funabashi JPX) Yamaoka Tsuguo (Funabashi JPX) Tamura Sinji (Suita JPX), Photosensitive material.
  174. Roman ; Alain ; Sachetto ; Jean-Pierre ; Wust ; Manfred ; Cuccolo ; Serg io, Photosensitive material containing 2,3-di(2,3-diiodopropoxy)-propyl cellulose and uses thereof.
  175. Tachikawa Hiromichi (Asaka JPX) Takahashi Yohnosuke (Asaka JPX) Shinozaki Fumiaki (Asaka JPX) Ikeda Tomoaki (Asaka JPX), Photosensitive members and a process for forming patterns using the same.
  176. Nagashima Akira (Shizuoka JPX) Sato Shigeru (Odawara JPX), Photosensitive resin composition.
  177. Hashimoto Matsuo (Tano) Futamura Nobuyuki (Maebashi) Yoda Sumio (Takasaki) Saiki Yoshifumi (Maebashi JPX), Photosensitive resin composition and color filter comprising a polymer dyeable with an anionic dye, an azide compound an.
  178. Sano Takezo (Takatsuki JA) Uemura Yukikazu (Amagasaki JA) Furuta Akihiro (Takatsuki JA), Photosensitive resin composition containing pullulan or esters thereof.
  179. Sher Frank T. (St. Paul MN) Whitcomb David R. (St. Paul MN), Photosensitive thermally developed compositions.
  180. Goman Peter M. (San Diego CA) Sirdesai Sunil (San Diego CA), Phototranschromic ink.
  181. Nohr Ronald Sinclair ; MacDonald John Gavin, Polymer film, nonwoven web and fibers containing a photoreactor composition.
  182. Dueber Thomas E. (Wilmington DE) Monroe Bruce M. (Wilmington DE), Polymeric sensitizers for photopolymer composition.
  183. Green George E. (Cherry Hinton GB2), Polymerisable esters derived from a phenolic unsaturated ketone.
  184. Green ; George Edward, Polymerizable esters.
  185. Green George E. (Cherry Hinton GB2), Polymerizable esters derived from a glycidyl ether of a phenolic unsaturated ketone.
  186. Martic Peter A. (Rochester NY) Skochdopole Todd R. (Rochester NY), Polyolefin composition containing optical brighteners having reduced migration.
  187. Derick Burton N. (Mineralwells WV) Moynihan Robert E. (Lowell OH) Wolfe Jon W. (Matthews NC), Polyvinyl butyral ink formulation.
  188. Shelnut James (Carmel NY) Golda Eugene (Monsey NY) Wilkes Alan (Brewster NY) Shimazu Ken-ichi (Briarcliff Manor NY), Positive acting composition yielding pre-development high visibility image after radiation exposure comprising radiation.
  189. Aoai Toshiaki (Shizuoka JPX) Nagano Teruo (Odawara JPX), Positive working photosensitive composition.
  190. Preuss, Reinhard; Grutze, Joachim; Beck, Ulrich; Pantke, Hellmuth; Vogel, Karl, Process for improving the light fastness of polyamide dyeings with copper complexes of schiff bases or ortho-hydroxy benzophenone.
  191. Reinert Gerhard (Allschwil CHX) Huber-Emden Helmut (Schnenbuch CHX) Back Gerhard (Lrrach DEX), Process for photochemical stabilization of non-dyed and dyed polyamide fibre material and mixtures thereof.
  192. Blaser Hans-Ulrich (Ettingen CHX) Reinehr Dieter (Kandern DEX) Spencer Alwyn (Basel CHX), Process for the preparation of alkenylbenzenecarboxylic acid derivatives and alkenylnaphthalenecarboxylic acid derivativ.
  193. Irving Edward (Burwell GB2) Smith Terence J. (Royston GB2), Process for the production images using sequentially gaseous polymerizing agents and photocuring.
  194. Banks Christopher P. (Saffron Walden GB2) Irving Edward (Burwell GB2), Process for the production of images.
  195. Irving Edward (Burwell GB2) Smith Terence J. (Royston GB2), Process for the production of images using sequentially liquid polymerizing compositions and photocuring.
  196. Rutsch Werner (Fribourg CHX) Kirchmayr Rudolf (Aesch CHX) Hsler Rinaldo (Basel CHX) Dietliker Kurt (Fribourg CHX), Propionphenone derivatives as photoinitiators for photopolymerization.
  197. Lee San A. (Crystal Lake IL) Ellerstein Stuart M. (Barrington IL), Radiation curable coating for photographic laminate.
  198. Wade John R. (Otley GBX) Potts Rodney M. (Leeds GBX) Pratt Michael J. (Menston GBX), Radiation sensitive plates.
  199. Mee John D. (Rochester NY), Radiation-cleavable nondiffusible compounds and photographic elements and processes employing them.
  200. Blum Rainer (Ludwigshafen DEX) Rehmer Gerd (Beindersheim DEX) Schupp Hans (Worms DEX), Radiation-sensitive mixture and use thereof.
  201. Blum Rainer (Ludwigshafen DEX) Rehmer Gerd (Beindersheim DEX) Schupp Hans (Worms DEX), Radiation-sensitive mixture and use thereof.
  202. Ishikawa Shun-ichi (Shizuoka JPX) Imagawa Tadao (Shizuoka JPX) Maeda Minoru (Shizuoka JPX) Shinozaki Fumiaki (Shizuoka JPX), Recording materials containing photopolymerizable composition and component capable of causing a color reaction in micro.
  203. Via Francis A. (Yorktown Heights NY), Sensitization of glyoxylate photoinitiators.
  204. Felder Louis (Basel CHX) Kirchmayr Rudolf (Aesch CHX) Hsler Rinaldo (Binningen CHX), Sensitizers for photopolymerization.
  205. Felder Louis (Basel CHX) Kirchmayr Rudolf (Aesch CHX) Hsler Rinaldo (Binningen CHX), Sensitizers for photopolymerization.
  206. Lin Samuel Q. S. (Fort Lee NJ) Jacobine Anthony F. (Meriden CT), Siloxane polyphotoinitiators of the substituted acetophenone type.
  207. Wickramanayake Palitha (Corvallis OR) Moffatt John R. (Corvallis OR), Solubilization of water-insoluble dyes via microemulsions for bleedless, non-threading, high print quality inks for ther.
  208. Sanders James F. (St. Joseph Township ; St. Croix County WI) Olson David B. (Marine on St. Croix MN), Spectral sensitizing dyes in photopolymerizable systems.
  209. Davis Gary C. (Albany NY), Spin castable mixtures useful for making deep-UV contrast enhancement layers.
  210. Geisler Thomas C. (Cottage Grove MN), Stabilizer for electron doner-acceptor carbonless copying systems.
  211. Edwards Brooks (Cambridge MA) Juo Rouh-Rong (Alston MA), Synthesis of mercaptaryl or hydroxyaryl enol ether alkali metal salts.
  212. Mullis Kary B. (La Jolla CA), System for the visualization of exposure to ultraviolet radiation.
  213. Wright Bradford B. (North St. Paul MN) DeVoe Robert J. (St. Paul MN), Tethered sulfonium salt photoinitiators for free radical polymerization.
  214. Helland Randall H. (Maplewood MN) Tiers George V. D. (St. Paul MN) Stevenson Dian E. (Sawbridgeworth GB2), Thermal dye bleach construction sensitive to ultraviolet radiation.
  215. Ellis Ernest W. (Carlisle MA), Thermal imaging method.
  216. Sher Frank T. (St. Paul MN) Rossman Mitchell A. (St. Paul MN), Thermally developable light sensitive imageable layers containing photobleachable dyes.
  217. Rossman Mitchell A. (Minneapolis MN) Sher Frank T. (St. Paul MN), Thermally developable light-sensitive layers containing photobleachable sensitizers.
  218. Miyagawa Masashi (Kawasaki JPX) Takenouchi Masanori (Atsugi JPX) Ohkuma Norio (Machida JPX), Transfer recording medium comprising a layer changing its transferability when provided with light and heat.
  219. Iiyama Kiyotaka (Mishima JPX) Inaba Norihiko (Numazu JPX), Two-color thermosensitive recording adhesive label.
  220. Iiyama Kiyotaka (Mishima JPX) Inaba Norihiko (Numazu JPX), Two-color thermosensitive recording label.
  221. Audett Jay D. (Brown Deer WI) McElrath Kenneth O. (Waterloo BEX), UV/EB curable copolymers for lithographic and corrosion-resistant coating applications.
  222. McCarty ; William H., Ultraviolet curable aqueous coatings.
  223. Doi Alfred (19471 Sierra Chula Rd. Irvine CA 92715), Ultraviolet protective overcoat for application to heat sensitive record materials.
  224. Felder Louis (Basel CHX) Kirchmayr Rudolf (Aesch CHX) Hsler (Binningen CHX), Use of aromatic-aliphatic ketones as photo sensitizers.
  225. Kaufmann Rainer (Witts Allee 32 D-2000 Hamburg 55 DEX) Herrnring Gnther (Pinndiek 13 D-2081 Alvesloe DEX), Use of solids as antiblocking additives for marker liquids.
  226. Adams Diane L. (Lancaster PA) Ehrhart Wendell A. (Red Lion PA) Jones Donald (Leola PA), Water-borne, alkali-developable, photoresist coating compositions and their preparation.
  227. Sasago Masaru (Hirakata JPX) Endo Masayuki (Izumi JPX) Takeyama Kenichi (Osaka JPX) Nomura Noboru (Toyonaka JPX), Water-soluble photopolymer and method of forming pattern by use of the same.
  228. Bauer Wolfgang (Maintal DEX) Nagl Gert (Niederdorfelden DEX) Steckelberg Willi (Hofheim/Ts DEX) Ritter Josef (Bad Soden DEX) Mauelshagen Wilhelm (Bad Camberg DEX), Water-soluble sulphur dyes, their preparation and use.
  229. Hindagolla Suraj L. (Corvallis OR) Thierheimer ; Jr. Charles L. (Corvallis OR) Skene John M. (Lake Oswego OR), Waterfastness of DB-168 ink by cation substitution.

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