[특허]Vacuum processing apparatus and operating method therefor

[미국특허] Vacuum processing apparatus and operating method therefor 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	F26B-005/04
출원번호	US-0766587 (2001-01-23)
우선권정보	JP-2-225321 (1990-08-29)
발명자 / 주소	Shigekazu Kato JP Kouji Nishihata JP Tsunehiko Tsubone JP Atsushi Itou JP
출원인 / 주소	Hitachi, Ltd. JP
대리인 / 주소	Antonelli, Terry, Stout & Kraus, LLP
인용정보	피인용 횟수 : 0 인용 특허 : 46

초록 ▼

This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple. Furthermore, the dummy substrates used for dry cleaning and the substrates to be processed do not coexist, contamination of the substrates to be processed due to dust and remaining gas can be prevented and the production yield can be high.

대표청구항 ▼

1. A method of using a conveyor system for processing substrates in plural vacuum processing chambers, the conveyor system including:a loader; a vacuum loader; and double lock chambers, having an loader side and a vacuum loader side, and having a gate valve for said loader side and another gate valve for said vacuum loader side, wherein said vacuum loader has (1) a transfer chamber connected to the double lock chambers via the another gate valve; (2) a conveyor structure; and (3) the plural vacuum processing chambers; the method comprising the steps of: (a) transferring selectively substrates to be processed, from said loader to either of said double lock chambers; (b) providing a vacuum in said either of the double lock chambers; (c) transferring substrates to be processed, one by one, from said either of the double lock chambers to at least one of said plural vacuum processing chambers, via said transfer chamber; (d) processing substrates in at least one of said plural vacuum processing chambers; and (e) after said processing, transferring processed substrates, one by one, from said at least one of said plural vacuum processing chambers to either of said double lock chambers, via said transfer chamber, wherein a surface of a substrate which is processed is maintained horizontal during transfer from said loader to said plural vacuum processing chambers, and said substrate is treated in said plural vacuum processing chambers with said surface thereof which is processed being oriented horizontally.

이 특허에 인용된 특허 (46) 인용/피인용 타임라인 분석

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A	생활필수품
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[미국특허] Vacuum processing apparatus and operating method therefor 원문보기