초록 ▼

A method of cleaning substrates is provided. Prior to, during or prior to and during a cleaning process, fluid is applied to a substrate surface to form a fluid film thereon. Ice crystals are introduced into the fluid film on the substrate surface. The ice crystals have a temperature that is lower t

A method of cleaning substrates is provided. Prior to, during or prior to and during a cleaning process, fluid is applied to a substrate surface to form a fluid film thereon. Ice crystals are introduced into the fluid film on the substrate surface. The ice crystals have a temperature that is lower than the temperature of the fluid such that the fluid changes the ice crystals into a gaseous state to form a pulse generated in the fluid film. The depth of penetration of the ice crystals into the fluid film is controlled such that the ice crystals do not strike the substrate surface. The substrate surface is cleaned with the pulse.

대표청구항 ▼

1. A method of cleaning substrates, comprising the steps of:prior to, during, or prior to and during a cleaning process, applying fluid onto a substrate surface to form a fluid film thereon; introducing ice crystals into said fluid film on said substrate surface, wherein said fluid has a first tempe

1. A method of cleaning substrates, comprising the steps of:prior to, during, or prior to and during a cleaning process, applying fluid onto a substrate surface to form a fluid film thereon; introducing ice crystals into said fluid film on said substrate surface, wherein said fluid has a first temperature, and wherein said ice crystals have a second temperature that is lower than said first temperature of said fluid such that said fluid changes said ice crystals into a gaseous state to form a pulse generated in said fluid film; controlling a depth of penetration of said ice crystals into said fluid film such that said ice crystals do not strike said substrate surface; and cleaning said substrate surface with said pulse.